Electrically conducting bonding connection
    32.
    发明授权
    Electrically conducting bonding connection 失效
    导电接合连接

    公开(公告)号:US07120033B2

    公开(公告)日:2006-10-10

    申请号:US10196027

    申请日:2002-07-16

    Abstract: An electrically conducting bonding connection (B) is produced between an electronic circuit (S) arranged on an electrically conducting support plate (1) and the support plate (1) by providing a hole (4, 5), into which an electrically conducting bonding element (2) with a bondable surface (3) is pressed in such a way that the support plate (1) and the bonding element (2) enter into an electrically conducting and frictional connection; the bonding connection is subsequently produced with the bonding element (2).

    Abstract translation: 在布置在导电支撑板(1)的电子电路(S)和支撑板(1)之间通过提供一个孔(4,5)而产生导电接合连接(B) 具有可粘合表面(3)的元件(2)以支撑板(1)和接合元件(2)进入导电和摩擦连接的方式被按压; 随后用接合元件(2)产生接合连接。

    Process for manufacturing a wiring board having a via
    34.
    发明申请
    Process for manufacturing a wiring board having a via 失效
    具有通路的布线基板的制造方法

    公开(公告)号:US20050048770A1

    公开(公告)日:2005-03-03

    申请号:US10914227

    申请日:2004-08-10

    Inventor: Naohiro Mashino

    Abstract: A process for manufacturing a wiring board comprising a substrate made of an insulation material and having first and second surfaces, first and second conductor patterns formed on the first and second surfaces, respectively, and a via conductor penetrating the substrate to electrically connect the first conductor pattern with the second conductor pattern; the process comprising the following steps of: forming the substrate with a through-hole penetrating thereto and defining openings at the first and second surfaces, respectively; plating the substrate with a metal so that a metal layer having a predetermined thickness is formed on the respective first and second surfaces of the substrate and the through-hole is substantially filled with the metal to be the via conductor; irradiating a laser beam, as a plurality of spots, around a metal-less portion of the plated metal, such as a dimple or seam, at positions corresponding to the openings of the through-hole, so that the a part of the plated metal melts to fill the metal-less portion with the molten metal.

    Abstract translation: 一种制造布线板的方法,包括由绝缘材料制成并具有第一和第二表面的基底,分别形成在第一和第二表面上的第一和第二导体图案,以及穿过基板的通孔导体,以将第一导体 图案与第二导体图案; 该方法包括以下步骤:用穿透其的通孔形成基底并分别在第一和第二表面处限定开口; 用金属电镀基板,使得在基板的相应的第一和第二表面上形成具有预定厚度的金属层,并且通孔基本上填充有作为通路导体的金属; 在对应于通孔的开口的位置处,将激光束作为多个点照射在电镀金属的无金属部分(例如凹坑或接缝)周围,使得电镀金属的一部分 熔化以用熔融金属填充无金属部分。

    Plastic land grid array (PLGA) module and printed wiring board (PWB) with enhanced contact metallurgy construction
    39.
    发明授权
    Plastic land grid array (PLGA) module and printed wiring board (PWB) with enhanced contact metallurgy construction 有权
    塑料焊盘阵列(PLGA)模块和印刷电路板(PWB),具有增强的接触式冶金结构

    公开(公告)号:US08212156B2

    公开(公告)日:2012-07-03

    申请号:US12146757

    申请日:2008-06-26

    Abstract: An enhanced contact metallurgy construction for plastic land grid array (PLGA) modules and printed wiring boards (PWBs). The PWB may, for example, have subcomposite laminate construction and/or a double-sided LGA site. A plurality of preform contacts are each respectively soldered to one of a plurality of metal pads on a PLGA module carrier and/or a PWB. Each of the preform contacts comprises a metal preform base (e.g., copper, nickel) soldered to one of the plurality of metal pads and an electrolytic noble metal plating (e.g., gold) over the metal preform base. An electrolytic non-noble metal underplating (e.g., nickel) may be interposed between the metal preform base and the electrolytic noble metal plating. In one embodiment, the electrolytic non-noble metal underplating is 80-400 microinches thick to provide an enhanced diffusion barrier, and the electrolytic noble metal plating is 30-60 microinches thick and incorporates one or more hardening agents to provide enhanced wear and corrosion resistance.

    Abstract translation: 用于塑料焊盘网格阵列(PLGA)模块和印刷电路板(PWB)的增强型接触式冶金结构。 PWB可以例如具有亚复合层压结构和/或双面LGA位点。 多个预成型件触点分别焊接到PLGA模块载体和/或PWB上的多个金属焊盘之一。 每个预成型件触点包括焊接到多个金属焊盘中的一个的金属预制棒基座(例如铜,镍)和在金属预制棒基部上的电解贵金属电镀(例如金)。 可以在金属预制棒基体和电解贵金属电镀之间插入底层电镀非贵金属(例如镍)。 在一个实施方案中,底镀电解非贵金属为80-400微英寸,以提供增强的扩散阻挡层,并且电解贵金属镀层为30-60微英寸,并且包含一种或多种硬化剂以提供增强的耐磨性和耐腐蚀性 。

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