公开(公告)号：US20080023643A1

公开(公告)日：2008-01-31

申请号：US11880872

申请日：2007-07-23

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn Van Bruggen ,  Stijn Willem Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn Van Bruggen ,  Stijn Willem Steenbrink

IPC: G21K1/08

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US07087913B2

公开(公告)日：2006-08-08

申请号：US10696782

申请日：2003-10-29

Applicant: Richard David Goldberg ,  David George Armour ,  Christopher Burgess ,  Adrian J. Murrell

Inventor： Richard David Goldberg ,  David George Armour ,  Christopher Burgess ,  Adrian J. Murrell

IPC: H01J37/147 ,  H01J37/30

CPC classification number: H01J37/3171 ,  H01J37/12 ,  H01J2237/04756 ,  H01J2237/121 ,  H01J2237/31701

Abstract: Provided is an ion implanter having a deceleration lens assembly comprising a plurality of electrodes in which one or more of the apertures of the deceleration electrodes are shaped in a manner which can improve performance of the ion implanter. In one embodiment, an electrode aperture is generally elliptical in shape and conforms generally to the shape of the beam passing through the aperture. In another aspect, an axis segment extends 40% of the length of the aperture from the aperture center to an intermediate point at the end of the segment. The average width of the aperture measured at each point from the center to the intermediate point is substantially less than the maximum width of the aperture.

Abstract translation: 提供了具有减速透镜组件的离子注入机，该减速透镜组件包括多个电极，其中减速电极的一个或多个孔径以能够提高离子注入机的性能的方式成形。 在一个实施例中，电极孔的形状通常为椭圆形，并且通常符合通过孔的光束的形状。 在另一方面，轴线段将孔的长度的40％从孔中心延伸到段末端的中间点。 在从中心到中间点的每个点处测量的孔的平均宽度基本上小于孔的最大宽度。

公开(公告)号：US07045791B2

公开(公告)日：2006-05-16

申请号：US10239293

申请日：2001-03-19

Applicant: Gérard Benas-Sayag ,  Patrick Bouchet ,  Antoine Corbin ,  Pierre Sudraud

Inventor： Gérard Benas-Sayag ,  Patrick Bouchet ,  Antoine Corbin ,  Pierre Sudraud

IPC: G01N23/00 ,  H01J3/14

CPC classification number: H01J37/228 ,  G02B17/082 ,  H01J37/12 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/121 ,  H01J2237/2482 ,  H01J2237/31749

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Abstract translation: 本发明涉及一种用于生产聚焦粒子束的色谱柱，包括：将包括输出电极（130）的颗粒与用于允许通过粒子束（A）的输出孔（131）聚焦的装置（100）; 用于同时聚焦包括输出孔（230）的光束（F）的光学聚焦装置（200）。 本发明的特征在于，所述输出孔（230）对于光束（F）是透明的，而所述输出电极（130）由保持在所述孔（230）中的金属插入件（130）形成，并且与中心 孔（131）形成所述输出孔。

公开(公告)号：US20060097198A1

公开(公告)日：2006-05-11

申请号：US11295801

申请日：2005-12-06

Applicant: Gerard Benas-Sayag ,  Patrick Bouchet ,  Antoine Corbin ,  Pierre Sudraud

Inventor： Gerard Benas-Sayag ,  Patrick Bouchet ,  Antoine Corbin ,  Pierre Sudraud

IPC: G21K7/00 ,  H01J37/08

CPC classification number: H01J37/228 ,  G02B17/082 ,  H01J37/12 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/121 ,  H01J2237/2482 ,  H01J2237/31749

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Abstract translation: 本发明涉及一种用于生产聚焦粒子束的色谱柱，包括：将包括输出电极（130）的颗粒与用于允许通过粒子束（A）的输出孔（131）聚焦的装置（100）; 用于同时聚焦包括输出孔（230）的光束（F）的光学聚焦装置（200）。 本发明的特征在于，所述输出孔（230）对于光束（F）是透明的，而所述输出电极（130）由保持在所述孔（230）中的金属插入件（130）形成，并且与中心 孔（131）形成所述输出孔。

公开(公告)号：US06891168B2

公开(公告)日：2005-05-10

申请号：US10639741

申请日：2003-08-13

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: H01J37/12 ,  G21K1/08 ,  H01J37/14 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J37/305

CPC classification number: H01J37/141 ,  G21K1/08 ,  H01J37/12 ,  H01J37/14 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/121 ,  H01J2237/1504

Abstract: An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, S′ with respect to which the field source members 13 are symmetrically disposed. The field has a component which is displaceable in the x-direction. To provide such field, a pattern of source strengths according to the formula F1(x)=Fm(x)+Fc(x) is applied to the field source members, wherein Fm is a component which is substantially independent of the displacement x0 and Fc is a correction component which is dependent on x0.

Abstract translation: 提供了一种操纵至少一个带电粒子束的装置和方法。 该装置包括两排场源元件13，它们周期性地彼此间隔设置，使得存在对称S，S'的平面，场源元件13对称地设置对准面。 该场具有可在x方向上移位的分量。 为了提供这样的场，根据公式F 1（x）= F m（x）+ F c（x） x）被施加到场源成员，其中F m是基本上独立于位移x 0和F C 1的分量 取决于x <0>的校正分量。

公开(公告)号：US20030102436A1

公开(公告)日：2003-06-05

申请号：US10239293

申请日：2003-01-13

Inventor： Gerard Benas-Sayag ,  Patrick Bouchet ,  Antoine Corbin ,  Pierre Sudraud

IPC: H01J003/14

CPC classification number: H01J37/228 ,  G02B17/082 ,  H01J37/12 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/121 ,  H01J2237/2482 ,  H01J2237/31749

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterised in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said out-put orifice.

Abstract translation: 本发明涉及一种用于生产聚焦粒子束的色谱柱，包括：将包括输出电极（130）的颗粒与用于允许通过粒子束（A）的输出孔（131）聚焦的装置（100）; 用于同时聚焦包括输出孔（230）的光束（F）的光学聚焦装置（200）。 本发明的特征在于，所述输出孔（230）对于光束（F）是透明的，而所述输出电极（130）由保持在所述孔（230）中的金属插入件（130）形成，并且与中心 形成所述输出孔的孔（131）。

公开(公告)号：US20180061613A1

公开(公告)日：2018-03-01

申请号：US15683734

申请日：2017-08-22

Applicant: FEI Company

Inventor： Bohuslav Sed'a ,  Lubomír Tuma ,  Petr Hlavenka ,  Marek Uncovský ,  Radovan Vasina ,  Jan Trojek ,  Mostafa Maazouz

IPC: H01J37/26 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/261 ,  G21K7/00 ,  H01J37/12 ,  H01J37/1413 ,  H01J37/18 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/121 ,  H01J2237/1415 ,  H01J2237/188 ,  H01J2237/2605

Abstract: A charged-particle microscope having a vacuum chamber comprises a specimen holder, a particle-optical column, a detector and an exchangeable column extending element. The specimen holder is for holding a specimen. The particle-optical column is for producing and directing a beam of charged particles along an axis so as to irradiate the specimen. The column has a terminal pole piece at an extremity facing the specimen holder. The detector is for detecting a flux of radiation emanating from the specimen in response to irradiation by the beam. The exchangeable column extending element is magnetically mounted on the pole piece in a space between the pole piece and the specimen holder. Methods of using the microscope are also disclosed.

公开(公告)号：US09165744B2

公开(公告)日：2015-10-20

申请号：US13658990

申请日：2012-10-24

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang

IPC: H01J37/12 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/12 ,  H01J37/1474 ,  H01J37/3171 ,  H01J2237/121 ,  H01J2237/151

Abstract: An ion beam scanning assembly includes a set of scanning electrodes defining a gap to accept an ion beam and scan the ion beam in a first plane, and a multipole electrostatic lens system comprising a plurality of electrodes arranged along a portion of a path of travel of the ion beam bounded by the pair of scanning electrodes, the multipole electrostatic lens system configured to shape the ion beam in a direction perpendicular to the first plane.

Abstract translation: 离子束扫描组件包括一组扫描电极，其限定了间隙以接受离子束并在第一平面中扫描离子束;以及多极静电透镜系统，其包括多个电极，其沿着 所述离子束由所述一对扫描电极限定，所述多极静电透镜系统构造成在垂直于所述第一平面的方向上对所述离子束进行成形。

公开(公告)号：US08890094B2

公开(公告)日：2014-11-18

申请号：US14027697

申请日：2013-09-16

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Vincent Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/30 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/31774

Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.

Abstract translation: 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。

公开(公告)号：US08669534B2

公开(公告)日：2014-03-11

申请号：US12934966

申请日：2009-03-23

Applicant: Kenichi Obori ,  Koichi Matsumoto ,  Shogo Awata ,  Satoshi Ohashi ,  Kyoko Onoguchi

Inventor： Akira Onoguchi ,  Kenichi Obori ,  Koichi Matsumoto ,  Shogo Awata ,  Satoshi Ohashi

IPC: H01J37/12

CPC classification number: H01J37/12 ,  H01J2237/121 ,  H01J2237/28

Abstract: Provided is an electrostatic lens for charged particle radiation with a lens performance relatively comparable to that of a magnetic type lens. A plurality of electrodes arranged on the incident side of charged particles form a first electric field area, wherein orbit radii of the charged particles are reduced without exceeding, on the way, the initial orbit radii that are orbit radii at the incident time, and a second electric field area, wherein force in the direction advancing in parallel with a central axis is applied to the charged particles that have passed through the first electric field area. A plurality of electrodes arranged on the projection side form a third electric field area, wherein the orbit radii of the charged particles do not exceed the initial orbit radii on the way and are curved to intersect with a central axis at angles larger than orbit angles defined with respect to the central axis of when the charged particles are projected from the second electric field area.

Abstract translation: 提供一种用于带电粒子辐射的静电透镜，其具有与磁性透镜相当的透镜性能。 布置在带电粒子的入射侧的多个电极形成第一电场区域，其中带电粒子的轨道半径减小而不超过在入射时为轨道半径的初始轨道半径， 第二电场区域，其中在与中心轴平行的方向上的力施加到已经通过第一电场区域的带电粒子。 布置在投影侧的多个电极形成第三电场区域，其中带电粒子的轨道半径在途中不超过初始轨道半径，并且弯曲成与中心轴相交，角度大于所定义的轨道角度 相对于带电粒子从第二电场区域突出时的中心轴线。