Metal ion implantation apparatus
    41.
    发明授权
    Metal ion implantation apparatus 失效
    金属离子注入装置

    公开(公告)号:US4994164A

    公开(公告)日:1991-02-19

    申请号:US453032

    申请日:1989-12-11

    CPC classification number: H01J37/3171 H01J27/08 H01J37/08

    Abstract: A metallurgic implantation apparatus of metal ions having a large emitting surface, a considerable flux and a controllable implantation depth comprises within an implantation chamber held in vacuo at least one vacuum arc ion source (1, 2, 3, 4) from which the ions (5) are extracted and projected onto a target plate (9) by means of an extraction and focusing electrode (6,7) and of an acceleration electrode (8) polarized at a very high and at a low voltage, respectively. The target plate (9) bombarded by the projection of ions emits a flux of secondary electrons, which are repelled by a suppression electrode (10) polarized negatively with respect to the target plate connected to ground.

    Abstract translation: 具有大的发射表面,相当大的通量和可控的注入深度的金属离子的冶金注入装置包括在真空中保持真空电弧离子源(1,2,3,4)的注入室内,离子源( 5)通过提取和聚焦电极(6,7)和分别以非常高和低电压极化的加速电极(8)被提取并投影到目标板(9)上。 由离子投影轰击的目标板(9)发射二次电子束,其被相对于连接到地面的目标板负偏振的抑制电极(10)排斥。

    Multimode ionization source
    42.
    发明授权
    Multimode ionization source 失效
    多模电离源

    公开(公告)号:US4960991A

    公开(公告)日:1990-10-02

    申请号:US422936

    申请日:1989-10-17

    CPC classification number: H01J49/107 H01J27/08 H01J49/145

    Abstract: A multimode ionization source includes a resistive filament aligned with an exit cone orifice. The filament generates electrons that bombard molecules near the orifice. In electron impact mode, a pressure regulator selects a low pressure within an ionization chamber and gaseous analyte is injected through a gas inlet and ionized by electron bombardment. In chemical ionization mode, an intermediate pressure of reagent gas established; electrons ionize the reagent gas. Gaseous analyte is introduced is ionized by the reagent gas through chemical interaction. In thermospray mode, a high pressure is established and heated liquid analyte is introduced into the chamber as a spray which is ionized by ion evaporation; in a thermospray/chemical ionization submode, filament activation supplements ion evaporation. Ions produced in all modes can be directed to a mass analyzer for analysis.

    Ion-producing apparatus
    43.
    发明授权
    Ion-producing apparatus 失效
    离子产生装置

    公开(公告)号:US4749912A

    公开(公告)日:1988-06-07

    申请号:US54496

    申请日:1987-05-27

    CPC classification number: H01J27/08

    Abstract: An ion-producing apparatus comprises an electron-producing vessel having an electron-producing chamber, an ion-producing vessel having an ion-producing chamber communicating with the electron-producing chamber, a cathode provided at one end of the electron-producing vessel, an accelerating electrode provided within the ion-producing chamber, for allowing passage of electrons, an anode provided between the cathode and the accelerating electrode, and a power supply circuit for providing a potential difference between the cathode and the anode, thereby to produce electrons in the gap between the cathode and the anode. A vacuum pump is provided for evacuating gas from the ion-producing chamber. A partition is provided within the electron-producing vessel, between the cathode and the anode to divide the electron-producing vessel into a cathode-side chamber and an anode-side chamber, and hinders a gas flow from the cathode-side chamber to the anode-side chamber to apply a pressure difference between both chambers.

    Abstract translation: 离子产生装置包括具有电子产生室的电子产生容器,具有与电子产生室连通的离子产生室的离子产生容器,设置在电子产生容器的一端的阴极, 设置在离子产生室内的用于允许电子通过的加速电极,设置在阴极和加速电极之间的阳极,以及用于在阴极和阳极之间提供电位差的电源电路,从而在 阴极和阳极之间的间隙。 提供真空泵用于从离子产生室排出气体。 在电子产生容器内,在阴极和阳极之间设置隔板,以将电子产生容器分成阴极侧室和阳极侧室,并阻止气体从阴极侧室流向 阳极侧室,以在两个室之间施加压力差。

    Ion source for an ion implanter
    44.
    发明授权
    Ion source for an ion implanter 失效
    离子注入机的离子源

    公开(公告)号:US4719355A

    公开(公告)日:1988-01-12

    申请号:US850181

    申请日:1986-04-10

    CPC classification number: H01J27/022 H01J27/08 H01J37/08 H01J49/04

    Abstract: An ion source of a type used on ion implanters which includes a crucible having a hollow interior and a hole for providing fluid communication between the interior of and exterior to the crucible. A heater assembly is used for adjustably heating the crucible. The crucible hole is if fluid communication with a passageway down the crucible and with a vapor nozzle aperture. An arc chamber has an inlet positioned at the output of the vapor nozzle aperture. The material to be vaporized does not bond to the crucible interior when solidified from a liquid state.

    Abstract translation: 用于离子注入机的离子源,其包括具有中空内部的坩埚和用于在坩埚内部和外部之间提供流体连通的孔。 加热器组件用于可调节地加热坩埚。 坩埚孔如果与坩埚中的通道流体连通并且具有蒸汽喷嘴孔。 电弧室具有位于蒸气喷嘴孔的输出处的入口。 当从液体状态固化时,待蒸发的材料不结合到坩埚内部。

    Single grid focussed ion beam source
    45.
    发明授权
    Single grid focussed ion beam source 失效
    单网格聚焦离子束源

    公开(公告)号:US4538067A

    公开(公告)日:1985-08-27

    申请号:US448122

    申请日:1982-12-09

    CPC classification number: H01J27/022 C23C14/46 H01J27/08 H01J37/08 H01J37/3053

    Abstract: A technique for providing an ion beam of variable focussing (concentration) is described using a flexible grid for extracting and accelerating ions from an ion plasma. The grid is electrically conducting and will bow depending on a voltage difference between it and the ion plasma. This bowing of the grid from its initial planar configuration provides focussing of the ion beam. The amount of focussing depends upon the amount the grid is bowed, which in turn depends upon the voltage difference between it and the ion plasma. The same ion source/flexible grid combination can be used for different operations as for example, providing a collimated, low energy ion beam over a large area and then for providing a focussed ion beam of high energy onto a small area.

    Abstract translation: 使用用于从离子等离子体提取和加速离子的柔性栅格来描述用于提供可变聚焦(浓度)的离子束的技术。 电网是导电的,并且将根据其与离子等离子体之间的电压差而弯曲。 从其初始平面配置的栅格弯曲可以提供离子束的聚焦。 聚焦的量取决于栅格弯曲的量,其又取决于其与离子等离子体之间的电压差。 相同的离子源/柔性网格组合可以用于不同的操作,例如,在大面积上提供准直的低能量离子束,然后将高能量的聚焦离子束提供到小区域上。

    Ion source apparatus
    46.
    发明授权
    Ion source apparatus 失效
    离子源装置

    公开(公告)号:US4506160A

    公开(公告)日:1985-03-19

    申请号:US495536

    申请日:1983-05-17

    CPC classification number: H01J27/08

    Abstract: A gas is introduced into a discharge chamber of an ion source apparatus, and a gas discharge is performed between a thermionic cathode and an anode. Ions are extracted from the plasma formed in this gas discharge by a grid electrode. The thermionic cathode has a hollow cylindrical shape. A cathode chamber is defined by the thermionic cathode and a cylindrical partition wall supporting it. A columnar auxiliary electrode is coaxially inserted in the thermionic cathode. An A.C. voltage from a power source unit is supplied between the thermionic cathode and the auxiliary electrode such that effective power for keeping the thermionic cathode at a positive potential with respect to the auxiliary electrode is higher than that for keeping the auxiliary electrode at a positive potential with respect to the thermionic cathode.

    Abstract translation: 将气体引入离子源装置的放电室中,并且在热离子阴极和阳极之间进行气体放电。 从通过栅电极在该气体放电中形成的等离子体中提取离子。 热离子阴极具有中空圆柱形状。 阴极室由热离子阴极和支撑它的圆柱形分隔壁限定。 柱状辅助电极同轴插入热离子阴极。 来自电源单元的AC电压被提供在热离子阴极和辅助电极之间,使得将热离子阴极保持在相对于辅助电极的正电位的有效功率高于将辅助电极保持在正电位的有效功率 相对于热离子阴极。

    Method and apparatus for extracting well-formed, high current ion beams
from a plasma source
    47.
    发明授权
    Method and apparatus for extracting well-formed, high current ion beams from a plasma source 失效
    从等离子体源中提取形成良好的高电流离子束的方法和装置

    公开(公告)号:US3955091A

    公开(公告)日:1976-05-04

    申请号:US522796

    申请日:1974-11-11

    CPC classification number: H01J27/08

    Abstract: A well-formed ion beam having a high current is extracted from an ion plasma by a low perveance ion extraction system including focus and extraction electrodes, the extraction electrode having an ion exit aperture and being axially spaced from the focus electrode a distance of at least several times the diameter of the ion exit aperture. A voltage differential is applied between the electrodes to define a plasma sheath at the ion source aperture, and the ion beam is extracted from the plasma sheath.

    Abstract translation: 具有高电流的良好形成的离子束通过包括聚焦和提取电极的低通量离子提取系统从离子等离子体中提取,该提取电极具有离子出口孔,并且与聚焦电极轴向间隔至少一个距离 离子出口孔直径几倍。 在电极之间施加电压差以在离子源孔处限定等离子体护套,并且离子束从等离子体护套提取。

    Ion beam deflection system
    48.
    发明授权
    Ion beam deflection system 失效
    离子束偏转系统

    公开(公告)号:US3795833A

    公开(公告)日:1974-03-05

    申请号:US3795833D

    申请日:1972-05-25

    Inventor: KING H SCHNELKER D

    CPC classification number: F03H1/0043 G21K1/087 H01J27/08

    Abstract: The accel electrode in a Kaufman-type of electron bombardment ion thrustor is created by interengaging panels of insulative material. These panels are angularly related to each other to define the openings of the accel electrode. Conductive blades are installed in each opening for electrostatic deflection of the beamlet issuing therethrough.

    Abstract translation: Kaufman型电子轰击离子推进器中的加速电极是通过绝缘材料的相互接合的面板产生的。 这些面板彼此成角度地相关,以限定加速电极的开口。 导电叶片安装在每个开口中,用于通过其发出的小梁的静电偏转。

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