公开(公告)号：US09690021B2

公开(公告)日：2017-06-27

申请号：US15026647

申请日：2014-10-03

Applicant: Transitions Optical, Inc.

Inventor： Joseph David Turpen ,  Cynthia Kutchko ,  Glen Todd Owens ,  Vitawat Lahsangah ,  Jerry L. Koenig, II

IPC: G02F1/03 ,  G02B5/23 ,  C08J7/04 ,  C08J7/12 ,  C09D175/06 ,  C09D5/32 ,  G02B1/14 ,  G02C7/10 ,  G02B5/22 ,  B29D11/00 ,  G03C1/73 ,  C08G18/62 ,  C08G18/78 ,  C08G18/80 ,  C08G18/81 ,  C08G18/22 ,  C08G18/28 ,  C08G18/40 ,  C08G18/44 ,  B05C11/08 ,  B05C11/10 ,  B05D3/14 ,  B05D7/00 ,  C09K9/02 ,  B05C5/02 ,  B05C13/00 ,  B05D1/00 ,  B05D3/00 ,  B05D3/02

CPC classification number: G02B5/223 ,  B05C5/02 ,  B05C11/08 ,  B05C11/1036 ,  B05C11/1039 ,  B05C13/00 ,  B05D1/005 ,  B05D3/007 ,  B05D3/0272 ,  B05D3/144 ,  B05D7/546 ,  B29D11/00884 ,  C08G18/227 ,  C08G18/289 ,  C08G18/4063 ,  C08G18/44 ,  C08G18/6225 ,  C08G18/7831 ,  C08G18/7837 ,  C08G18/807 ,  C08G18/8175 ,  C08J7/042 ,  C08J7/123 ,  C08J2369/00 ,  C08J2433/14 ,  C08J2475/06 ,  C09D5/32 ,  C09D175/06 ,  C09K9/02 ,  C09K2211/14 ,  G02B1/14 ,  G02B5/23 ,  G02C7/102 ,  G03C1/73

Abstract: A photochromic optical article is provided, which includes: an optical substrate; a photochromic layer over a surface of the optical substrate, wherein the photochromic layer includes a photochromic compound; and a protective layer over the photochromic layer, wherein the protective layer includes a matrix that includes residues of an ethylenically unsaturated radically polymerizable material that includes at least one allophanate group. A method of forming the photochromic optical article is also provided.

公开(公告)号：US09682398B2

公开(公告)日：2017-06-20

申请号：US13788573

申请日：2013-03-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Joseph M. Ranish ,  Kailash Patalay

IPC: B05C13/00 ,  H01L21/67 ,  H01L21/687 ,  C30B23/02 ,  C30B35/00

CPC classification number: B05C13/00 ,  C30B23/02 ,  C30B35/00 ,  H01L21/67115 ,  H01L21/68735

Abstract: Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus includes a process kit, the process kit comprising a first ring to support a substrate proximate a peripheral edge of the substrate; a second ring disposed about the first ring; and a path formed between the first and second rings that allows the first ring to rotate with respect to the second ring, wherein the path substantially prevents light from travelling between a first volume disposed below the first and second rings and a second volume disposed above the first and second rings.

公开(公告)号：US09662675B2

公开(公告)日：2017-05-30

申请号：US14448834

申请日：2014-07-31

Applicant: Illinois Tool Works Inc.

Inventor： Dennis G. Doyle

IPC: B05C13/00 ,  B05C9/02 ,  B05D1/00 ,  H05K13/00 ,  H05K13/04

CPC classification number: B05C13/00 ,  B05C9/02 ,  B05D1/00 ,  H05K13/0061 ,  H05K13/0469

Abstract: A dispenser includes a frame, a gantry system, a dispensing unit, a substrate support assembly, a transport system, and an inverter system coupled to the frame and in communication with the transport system. The inverter system is positioned outside the substrate support assembly and configured to rotate a substrate orientation between a first position in which a top surface of the substrate is in a dispense position and a second position in which a bottom surface of the substrate is in a dispense position. The inverter system includes a first driven assembly configured to engage one edge of the substrate and a second driven assembly configured to engage an opposite edge of the substrate. The first driven assembly and the second driven assembly are configured to drive a linear movement of the substrate.

公开(公告)号：US20170140929A1

公开(公告)日：2017-05-18

申请号：US15350150

申请日：2016-11-14

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kousuke YOSHIHARA ,  Takafumi NIWA

IPC: H01L21/02 ,  B05C13/00 ,  B05C9/12 ,  H01L21/687 ,  B05C11/08

CPC classification number: H01L21/02282 ,  B05C9/12 ,  B05C11/08 ,  B05C13/00 ,  G03F7/162 ,  G03F7/168 ,  H01L21/67028 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67253 ,  H01L21/68764

Abstract: A method of forming a coating film includes horizontally supporting a substrate, supplying a coating solution to a central portion of the substrate and spreading the coating solution by a centrifugal force by rotating the substrate at a first rotational speed, decreasing a speed of the substrate from the first rotational speed toward a second rotational speed and rotating the substrate at the second rotational speed to make a surface of a liquid film of the coating solution even, supplying a gas to a surface of the substrate when the substrate is rotated at the second rotational speed to reduce fluidity of the coating solution, and drying the surface of the substrate by rotating the substrate at a third rotational speed faster than the second rotational speed.

公开(公告)号：US09586226B2

公开(公告)日：2017-03-07

申请号：US14697370

申请日：2015-04-27

Applicant: Kateeva, Inc.

Inventor： Alexander Sou-Kang Ko ,  Justin Mauck ,  Eliyahu Vronsky ,  Conor F. Madigan ,  Eugene Rabinovich ,  Nahid Harjee ,  Christopher Buchner ,  Gregory Lewis

IPC: B05C13/00 ,  B05C5/00 ,  B05B15/06 ,  B05D3/06 ,  B05D3/02 ,  H01L51/00 ,  B41J3/407 ,  B05C15/00 ,  C23C14/00 ,  H01L21/67 ,  H01L21/677 ,  H01L21/683 ,  H01L23/532 ,  H05K3/00 ,  H01L21/48

CPC classification number: B05B15/60 ,  B05C13/00 ,  B05C15/00 ,  B05D3/0254 ,  B05D3/065 ,  B41J3/407 ,  C23C14/00 ,  H01L21/4867 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67196 ,  H01L21/67207 ,  H01L21/67248 ,  H01L21/67259 ,  H01L21/67276 ,  H01L21/67739 ,  H01L21/67748 ,  H01L21/6776 ,  H01L21/67784 ,  H01L21/67787 ,  H01L21/6838 ,  H01L23/5328 ,  H01L51/00 ,  H01L2924/0002 ,  H05K3/0091 ,  H01L2924/00

Abstract: A coating can be provided on a substrate. Fabrication of the coating can include forming a solid layer in a specified region of the substrate while supporting the substrate in a coating system using a gas cushion. For example, a liquid coating can be printed over the specified region while the substrate is supported by the gas cushion. The substrate can be held for a specified duration after the printing the patterned liquid. The substrate can be conveyed to a treatment zone while supported using the gas cushion. The liquid coating can be treated to provide the solid layer including continuing to support the substrate using the gas cushion.

Abstract translation: 可以在基板上设置涂层。 涂层的制造可以包括在衬底的特定区域中形成固体层，同时使用气垫将衬底支撑在涂覆系统中。 例如，当衬底被气垫支撑时，可以在指定区域上印刷液体涂层。 在印刷图案化液体之后，可以将衬底保持一段指定的时间。 在使用气垫支撑的同时，可以将基板输送到处理区域。 可以处理液体涂层以提供固体层，包括使用气垫继续支撑基底。

公开(公告)号：US20170050209A1

公开(公告)日：2017-02-23

申请号：US15343697

申请日：2016-11-04

Applicant: Caterpillar Inc.

Inventor： Joshua Fox ,  Yiyang Liew

IPC: B05C13/00 ,  B05C5/02

CPC classification number: B05C5/022 ,  B05C11/08 ,  B05C13/02

Abstract: A coating system for a substrate is provided. The substrate has a first portion and a second portion. The coating system includes a base adapted to receive and rotate the substrate about an axis. The coating system also includes a nozzle adapted to deposit a material on a predefined location on the substrate. The coating system further includes a controller configured to receive a signal indicative of coating the first portion of the substrate with the material. The controller is configured to determine a parameter of the material. The controller is configured to determine a parameter of the predefined location. The controller is also configured to determine a parameter of the rotation of the base. The controller is further configured to selectively control the base and the nozzle to coat the first portion of the substrate with the material based on the received signal and the determined parameters.

Abstract translation: 提供了一种用于基底的涂层系统。 基板具有第一部分和第二部分。 涂层系统包括适于接收并绕轴线旋转基底的基座。 涂层系统还包括适于将材料沉积在基板上的预定位置上的喷嘴。 涂覆系统还包括控制器，其被配置为接收指示用材料涂覆基板的第一部分的信号。 控制器被配置为确定材料的参数。 控制器被配置为确定预定义位置的参数。 控制器还被配置为确定基座的旋转的参数。 控制器还被配置为基于接收到的信号和所确定的参数，选择性地控制基座和喷嘴以使材料的第一部分涂覆材料。

公开(公告)号：US09539607B2

公开(公告)日：2017-01-10

申请号：US13944237

申请日：2013-07-17

Applicant: DAINIPPON SCREEN MFG. CO., LTD. ,  SOKUDO CO., LTD.

Inventor： Joji Kuwahara ,  Takashi Taguchi ,  Masahito Kashiyama ,  Kohei Iwasaki

IPC: B05C13/00 ,  H01L21/67 ,  H01L21/68

CPC classification number: B05C13/00 ,  H01L21/67259 ,  H01L21/681

Abstract: A substrate is transported based on coordinates information indicating a receiving position of the substrate and a placement position of the substrate by a hand. If the substrate is shifted from a first position, the substrate is received by the hand while a center of the substrate is shifted from a normal position of the hand. The hand that holds the substrate is moved toward a second position. A plurality of portions at an outer periphery of the substrate are detected before the substrate is placed. A shift of the substrate with respect to the normal position of the hand is detected based on the detection result, and the coordinates information is corrected such that a shift between a position of the center of the substrate to be placed at the second position by the hand and the center of the second position is canceled.

Abstract translation: 基于基于指示基板的接收位置的坐标信息和用手将基板的放置位置传送到基板。 如果基板从第一位置移位，则基板被手接收，同时基板的中心从手的正常位置移位。 保持基板的手移动到第二位置。 在放置基板之前，检测基板外周的多个部分。 基于检测结果检测基板相对于手的正常位置的偏移，并且校正坐标信息，使得要放置在第二位置的基板的中心的位置之间的偏移由 手和第二个位置的中心被取消。

公开(公告)号：US20160346878A1

公开(公告)日：2016-12-01

申请号：US15164944

申请日：2016-05-26

Applicant: Senju Metal Industry Co., Ltd.

Inventor： Manabu Muraoka ,  Takeo Saitoh ,  Shigeyuki Sekine ,  Takashi Obayashi ,  Kaichi Tsuruta ,  Takashi Hagiwara ,  Hiroyuki Yamasaki ,  Kota Kikuchi ,  Naoto Kameda

IPC: B23K35/40 ,  B23K1/08 ,  B23K35/36 ,  B05C3/12 ,  B05C13/00

CPC classification number: B23K35/404 ,  B05C3/125 ,  B05C9/04 ,  B05C9/12 ,  B05C9/14 ,  B05C13/00 ,  B23K1/08 ,  B23K35/36

Abstract: In the flux applying device, a control portion controls conveying rollers or the like so that thickness of flux applied to solder is controlled. The winding roller rotates so that the solder is conveyed at the conveying speed. The drawing-out roller applies any load (back tension) to the solder backward along the conveying direction of the solder when drawing out the solder. The solder is conveyed at the predetermined speed and dipped into the flux tank containing flux. The solder is pulled up from the flux tank at the conveying speed vertically. By pulling up the solder from the flux tank at the constant conveying speed vertically, the interfacial tension acts on the solder 9a and the flux, so that the flux having a uniform thickness according to the conveying speed remains on the surface and back surface of the solder.

Abstract translation: 在助焊剂施加装置中，控制部控制输送辊等，从而控制施加于焊料的焊剂的厚度。 卷绕辊旋转，使得焊料以传送速度传送。 拉出焊料时，拉出辊沿着焊料的输送方向向焊料反向施加任何负载（反向张力）。 焊料以预定速度输送并浸入含有焊剂的焊剂罐中。 焊料以垂直的输送速度从焊剂罐中拉出。 通过以恒定的输送速度垂直地从焊剂罐中拉出焊料，界面张力作用在焊料9a和焊剂上，使得根据传送速度具有均匀厚度的焊剂保留在焊料的表面和背面上 焊接。

公开(公告)号：US09506176B2

公开(公告)日：2016-11-29

申请号：US14701174

申请日：2015-04-30

Applicant: CRAYOLA, LLC

Inventor： Roseld V. Laguatan ,  James Allen ,  Oliver Morris

IPC: B05B13/02 ,  B05C1/06 ,  B05C13/00 ,  D06B1/10 ,  D06B11/00 ,  A63H33/30 ,  B65H54/28 ,  B65H57/00 ,  B65H71/00 ,  B05C3/12

CPC classification number: D06B1/10 ,  A63H33/3088 ,  B05B13/0207 ,  B05C1/06 ,  B05C3/125 ,  B05C13/00 ,  B65H54/28 ,  B65H57/006 ,  B65H71/00 ,  B65H2701/31 ,  D06B1/12 ,  D06B11/0026

Abstract: An apparatus is provided for coloring threaded material. A payout support member of the apparatus is configured to support a payout spool. A drive member is configured to rotate a takeup spool. A coloring assembly comprises a colorant applicator holding portion that is configured to receive a colorant applicator. The coloring assembly also includes a passage configured to receive a thread and to dispose the thread against the colorant applicator as the thread is wound onto the takeup spool. The coloring assembly is positioned to direct the thread drawn through the passage toward a portion of the takeup spool.

Abstract translation: 提供一种用于着色螺纹材料的装置。 该装置的支付支持构件被配置为支持支付线轴。 驱动构件被配置为旋转卷取卷轴。 着色组件包括着色剂施加器保持部分，其配置成接收着色剂涂布器。 着色组件还包括构造成接收螺纹的通道，并且当线缠绕在卷取卷轴上时将线对准着色剂施加器。 着色组件被定位成将通过通道拉出的线引向卷取卷轴的一部分。

公开(公告)号：US20160306364A1

公开(公告)日：2016-10-20

申请号：US15101705

申请日：2014-12-03

Applicant: Musashi Engineering, Inc.

Inventor： Naotoshi IKUSHIMA

IPC: G05D7/06 ,  B25J9/20 ,  G05B19/416 ,  B05C5/02 ,  B05C13/00

CPC classification number: G05D7/0635 ,  B05C5/0212 ,  B05C5/0216 ,  B05C5/0225 ,  B05C11/1023 ,  B05C13/00 ,  B25J9/1679 ,  B25J9/20 ,  G05B19/416 ,  G05B2219/45065 ,  G05B2219/49056

Abstract: A liquid material application device can alleviate programming work for drawing a line. The device includes a discharge head (50) for discharging a liquid material, a worktable (25) on which a workpiece is placed, a robot (20) for moving the discharge head and the worktable relative to each other in XYZ directions, and a control unit including an arithmetic device and a storage device for storing an application program, the liquid material application device applying the liquid material to be drawn in the form of a line on the workpiece while the workpiece and the discharge head are moved relative to each other, the control unit includes a first control unit (30) for moving the workpiece and the discharge head relative to each other in accordance with the application program, and a second control unit (40) for controlling a discharge amount of the discharge head.

Abstract translation: 液体材料应用装置可以减轻绘制线的编程工作。 该装置包括用于排出液体材料的排放头（50），放置工件的工作台（25），用于沿XYZ方向相对于彼此移动排放头和工作台的机器人（20），以及 控制单元，包括运算装置和用于存储应用程序的存储装置，所述液体材料施加装置在工件和排出头相对于彼此移动的同时将待绘制的液体材料以线的形式施加在工件上 控制单元包括用于根据应用程序相对于彼此移动工件和排出头的第一控制单元（30）和用于控制排出头的排放量的第二控制单元（40）。