PROCESS FOR DEPOSITION AND CHARACTERIZATION OF A COATING
    54.
    发明申请
    PROCESS FOR DEPOSITION AND CHARACTERIZATION OF A COATING 有权
    涂层沉积和表征方法

    公开(公告)号:US20130313480A1

    公开(公告)日:2013-11-28

    申请号:US13902064

    申请日:2013-05-24

    Applicant: VITO NV

    Abstract: Provided herein are processes for depositing a plasma coating on a substrate and coated substrates obtained thereby. More particularly, processes for characterizing a plasma coating on a substrate are provided. The process for depositing a plasma coating includes the step of exposing the substrate to a plasma. The plasma includes at least one coating precursor and one fluorophore other than the coating precursor.

    Abstract translation: 本文提供了在基板上沉积等离子体涂层和由此获得的涂覆基板的工艺。 更具体地,提供了用于表征基板上的等离子体涂层的工艺。 沉积等离子体涂层的方法包括将衬底暴露于等离子体的步骤。 等离子体包括至少一种涂层前体和除涂层前体之外的一种荧光团。

    Coating method and coating apparatus
    56.
    发明授权
    Coating method and coating apparatus 有权
    涂布方法和涂布装置

    公开(公告)号:US08535763B2

    公开(公告)日:2013-09-17

    申请号:US12440128

    申请日:2007-08-31

    Abstract: A first coating rod placed on an upper-surface side of a resin film is pressed onto the resin film in a state where the first coating rod is circumscribed and supported by support members each comprising a pair of rollers and spaced with intervals therebetween in a length direction of the first coating rod so that the first coating rod is rotated in a forward direction at a speed substantially equal to that of the resin film, and a lower surface of the resin film is supported by a guide roll or a second coating rod placed on a downstream side of the first coating rod and an upstream side of a tenter so that the coating liquid continuously measured and supplied to an upper surface of the resin film is smoothened by the first coating rod.

    Abstract translation: 放置在树脂膜的上表面侧的第一涂布杆在第一涂布杆被外接的状态下被压在树脂膜上,并且每个包括一对辊的支撑部件以一定间隔间隔开 第一涂布杆的方向使得第一涂布杆以基本上等于树脂膜的速度向前方向旋转,并且树脂膜的下表面由引导辊或第二涂布杆支撑 在第一涂布杆的下游侧和拉幅机的上游侧,使得连续测量并供给到树脂膜的上表面的涂布液被第一涂布辊平滑化。

    METHOD OF MANUFACTURING GAS BARRIER FILM AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT
    57.
    发明申请
    METHOD OF MANUFACTURING GAS BARRIER FILM AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT 审中-公开
    气体阻隔膜和有机光电转换元件的制造方法

    公开(公告)号:US20130146860A1

    公开(公告)日:2013-06-13

    申请号:US13818277

    申请日:2011-08-16

    Inventor: Takahide Toyama

    Abstract: The present invention provides: a method of manufacturing a gas barrier film, which is manufactured at high productivity, and has extremely high gas barrier performance and stability thereof with time, excellent surface smoothness and bending resistance, and high durability; a gas barrier film obtained using the method; and an organic photoelectric conversion element using the gas barrier film. In the method, after forming a coated layer by applying a coating liquid containing polysilazane to a substrate, a gas barrier layer is formed by applying vacuum ultraviolet light to the coated layer surface thus formed. The method is characterized in that the coated layer is irradiated with the vacuum ultraviolet light, while drying the solvent in the e coated layer.

    Abstract translation: 本发明提供一种以高生产率制造的阻气膜的制造方法,具有极高的阻气性能及其随时间的稳定性,优异的表面平滑性和耐弯曲性,以及高的耐久性; 使用该方法获得的阻气膜; 以及使用阻气膜的有机光电转换元件。 在该方法中,通过将含有聚硅氮烷的涂布液涂布到基板上而形成涂布层后,通过对形成的涂布层表面施加真空紫外光而形成阻气层。 该方法的特征在于,用真空紫外线照射涂层,同时干燥e涂层中的溶剂。

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