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    Synthetic amorphous silica powder and method for producing same
    51.
    发明授权
    Synthetic amorphous silica powder and method for producing same 有权
    合成无定形二氧化硅粉末及其制造方法

    公开(公告)号：US09272918B2

    公开(公告)日：2016-03-01

    申请号：US13520798

    申请日：2010-12-24

    Applicant: Toshiaki Ueda

    Inventor： Toshiaki Ueda

    IPC: C01B33/12 ,  C01B33/18 ,  C01B33/14 ,  C03C3/06 ,  C03B19/10

    CPC classification number: C01B33/181 ,  C01B33/14 ,  C01P2002/02 ,  C01P2002/82 ,  C01P2004/03 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2006/12 ,  C03B19/1025 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/10 ,  C03C2203/27 ,  Y10T428/2982

    Abstract: The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00.

    Abstract translation: 本发明的合成无定形二氧化硅粉末的特征在于，其包含通过对二氧化硅粉末进行球化处理得到的合成无定形二氧化硅粉末，然后进行清洗和干燥，使得合成的无定形二氧化硅粉末的平均粒径 D50为10〜2000μm; 其中所述合成无定形二氧化硅粉末具有：通过将粉末的BET比表面积除以由平均粒径D50计算的理论比表面积获得的商为1.00至1.35的商; 实际密度为2.10〜2.20g / cm3; 颗粒内孔隙率为0至0.05; 0.75〜1.00的圆形度; 球化率为0.55〜1.00。

    Surface Nitrided Alkali-Free Glasses
    52.
    发明申请
    Surface Nitrided Alkali-Free Glasses 有权
    表面无氮化玻璃

    公开(公告)号：US20150329408A1

    公开(公告)日：2015-11-19

    申请号：US14710130

    申请日：2015-05-12

    Applicant: CORNING INCORPORATED

    Inventor： Andrea Weiss Bookbinder ,  Dana Craig Bookbinder ,  Timothy Michael Gross ,  Pushkar Tandon

    IPC: C03C3/091 ,  C03C21/00 ,  C03C3/06

    CPC classification number: C03C3/045 ,  C03C3/06 ,  C03C3/091 ,  C03C3/111 ,  C03C21/007 ,  C03C23/007 ,  C03C2201/02 ,  C03C2201/24 ,  Y10T428/315

    Abstract: Alkali-free glasses are disclosed having (in weight %) 50≦SiO2≦80%, 2≦Al2O3≦17%, 8≦B2O3≦36%, and greater than or equal to 2% and less than or equal to 25% of at least one of CaO, MgO, BaO, SrO or ZnO. The alkali-free glasses can have a surface layer with greater than 0.2 weight % N. Such alkali-free glasses are achieved by nitriding processes and exhibit increased strength, scratch resistance and chemical durability.

    Abstract translation: 公开了无碱玻璃，其重量百分比为50％，SiO 2和N 100; 80％，2％，Al 2 O 3和N 2; 17％，8％和10％; B 2 O 3和N 3; 36％，并且大于或等于2％且小于或等于 CaO，MgO，BaO，SrO或ZnO中的至少一种。 无碱玻璃可以具有大于0.2重量％N的表面层。这种无碱玻璃通过渗氮工艺实现，并且显示出增加的强度，耐划伤性和化学耐久性。

    Product method of synthetic silica glass and thermal treatment apparatus
    55.
    发明授权
    Product method of synthetic silica glass and thermal treatment apparatus 有权
    合成石英玻璃和热处理设备的产品方法

    公开(公告)号：US06732546B1

    公开(公告)日：2004-05-11

    申请号：US09806236

    申请日：2001-03-28

    Applicant: Shouji Yajima ,  Hiroyuki Hiraiwa ,  Yasuji Ishida

    Inventor： Shouji Yajima ,  Hiroyuki Hiraiwa ,  Yasuji Ishida

    IPC: C03B1906

    CPC classification number: C03B19/1484 ,  C03B19/1453 ,  C03B25/02 ,  C03B32/00 ,  C03C3/06 ,  C03C23/007 ,  C03C2201/02 ,  C03C2203/40 ,  C03C2203/52

    Abstract: A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900° C., retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10° C./h down to a temperature of not more than 500° C.; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500° C. nor more than 1100° C., retaining the ingot or the like thereat, and thereafter cooling the ingot or the like at a temperature decrease rate of not less than 50° C./h down to a temperature 100° C. lower than the second retention temperature.

    Abstract translation: 根据本发明的合成石英玻璃的制造方法包括：第一步骤，从燃烧器喷射含有氧和氢的硅化合物和燃烧气体，以在氢氧焰中水解硅化合物，生成石英玻璃微粒， 然后在与燃烧器相对的靶上沉积并玻璃化石英玻璃的微粒，得到合成石英玻璃锭; 将第一步骤中获得的合成石英玻璃锭等加热至不低于900℃的第一保持温度，将锭等保持在第一保持温度的第二步骤，并将锭子或 其温度降低率不超过10℃/ h，降至不超过500℃的温度; 以及将第二工序中得到的合成二氧化硅玻璃锭等加热至不低于500℃，不高于1100℃的第二保持温度的第三步骤，将锭等保持在其上， 然后以不低于50℃/ h的温度降低速率将锭等冷却至比第二保持温度低100℃的温度。

    Production method for making an optical member for excimer laser using synthetic quartz glass
    57.
    发明授权
    Production method for making an optical member for excimer laser using synthetic quartz glass 有权
    使用合成石英玻璃制造准分子激光用光学部件的制造方法

    公开(公告)号：US06499315B1

    公开(公告)日：2002-12-31

    申请号：US09671202

    申请日：2000-09-28

    Applicant: Hiroyuki Nishimura ,  Akira Fujinoki ,  Hisatoshi Otsuka

    Inventor： Hiroyuki Nishimura ,  Akira Fujinoki ,  Hisatoshi Otsuka

    IPC: C03B2000

    CPC classification number: C03B19/1415 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/02 ,  C03C2201/21 ,  C03C2203/40 ,  Y02P40/57

    Abstract: The present invention relates to a synthetic quartz glass, which is a material for producing an optical member having an excellent excimer laser resistance, and a production method thereof with a good productivity. That is, the synthetic quartz glass produced by vitrifying glass fine particles obtained by flame hydrolysis of an organodisilazane compound directly on a substrate having a birefringence index of 5 nm/cm or less, a refractive index difference (&Dgr;n) of 2×10−6/cm or less, and an ArF saturated absorbance of 0.05/cm or less at a pulse energy density of 100 mJ/cm2/pulse. The production method thereof comprises the steps of introducing an organodisilazane compound represented by a general formula 1: (R1), SiNHSi(R2)3  (1) wherein R1 and R2 represent the same or a different alkyl group having 1 to 3 carbon atoms, into a flame comprising a combustion gas and a combustion-supporting gas to generate silica fine particles, and accumulating the silica fine particles on a rotating heat resistant substrate to be a molten glass.

    Abstract translation: 本发明涉及一种合成石英玻璃，其是用于制造具有优异的受激准分子激光电阻的光学部件的材料及其生产率高的生产方法。 也就是说，通过玻璃化玻璃微粒制造的合成石英玻璃，其通过有机二硅氮烷化合物直接在双折射率为5nm / cm以下的折射率（DELTAn）为2×10 -6 / cm 或更小，在脉冲能量密度为100mJ / cm 2 /脉冲下的ArF饱和吸光度为0.05 / cm以下。 其制造方法包括将由通式1表示的有机二硅氮烷化合物引入包含燃烧气体和燃烧支持的火焰的步骤中，其中R1和R2表示相同或不同的具有1至3个碳原子的烷基 气体产生二氧化硅微粒，并将二氧化硅微粒聚集在旋转的耐热基材上成为熔融玻璃。

    Method for fabricating silica glass
    59.
    发明授权
    Method for fabricating silica glass 失效
    石英玻璃的制造方法

    公开(公告)号：US5919280A

    公开(公告)日：1999-07-06

    申请号：US122627

    申请日：1998-07-27

    Applicant: Jeong-hyun Oh ,  Young-min Baik

    Inventor： Jeong-hyun Oh ,  Young-min Baik

    IPC: C03B8/02 ,  C03B19/12 ,  C03B20/00 ,  C03C1/00 ,  C03C3/06 ,  C03C13/04 ,  C03B8/00 ,  C03B37/016 ,  C03B3/04

    CPC classification number: C03C13/045 ,  C03B19/12 ,  C03C1/006 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/22 ,  C03C2203/32 ,  C03C2203/52 ,  Y02P40/57

    Abstract: A method for fabricating a silica glass is provided. The method includes the steps of adding silica and a dispersant to a premix solution obtained by dissolving an acrylic resin monomer and a cross-linking agent in distilled water, dispersing the mixed solution and adjusting the pH of the mixture, to form a sol. Air bubbles are removed from the sol, and then the resultant sol is aged. A polymerization initiator and a catalyst are added to the aged sol, and the pH of the reaction mixture is adjusted. The reaction mixture is poured into a mold, and then the mixture is gelated, aged, demolded, dried, and then thermally treated to remove organic substances. Hydroxy groups are eliminated and the gel is sintered. A high purity silica glass tube, substantially free of cracking after drying and having a low shrinking ratio can be obtained. Also, a large silica glass tube can be manufactured by this fabrication method.

    Abstract translation: 提供一种制造石英玻璃的方法。 该方法包括将二氧化硅和分散剂加入到通过将丙烯酸树脂单体和交联剂溶解在蒸馏水中而获得的预混合溶液中，分散混合溶液并调节混合物的pH以形成溶胶的步骤。 从溶胶中除去气泡，然后使所得溶胶老化。 向老化的溶胶中加入聚合引发剂和催化剂，调整反应混合物的pH。 将反应混合物倒入模具中，然后将混合物凝胶化，老化，脱模，干燥，然后热处理以除去有机物质。 消除羟基并将凝胶烧结。 可以获得高纯度石英玻璃管，其干燥后基本上不含裂纹并具有低收缩率。 此外，可以通过该制造方法制造大的石英玻璃管。

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