公开(公告)号：US20220013322A1

公开(公告)日：2022-01-13

申请号：US17210815

申请日：2021-03-24

Applicant: SK hynix Inc. ,  Pusan National University Industry-University Cooperation Foundation

Inventor： Jong Jin HWANG ,  Ho Jun LEE

IPC: H01J37/08 ,  H01J37/317 ,  C23C14/48

Abstract: An ion source head may include a reaction chamber and a coil. The reaction chamber may be configured to provide an ionization space. The reaction chamber may be divided into a lower region, a central region and an upper region. The coil may be configured to be wound on an outer surface of the reaction chamber. The coil may include a first coil, a second coil and a third coil. The first coil may be spirally wound on an outer surface of the lower region of the reaction chamber. The second coil may be wound on the central region of the reaction chamber. The third coil may be spirally wound on an outer surface of the upper region of the reaction chamber. The second coil may be connected between the first coil and the third coil. The second coil may have a winding direction obliquely to a winding direction of the first and third coils.

公开(公告)号：US20210384004A1

公开(公告)日：2021-12-09

申请号：US17410251

申请日：2021-08-24

Applicant: Applied Materials, Inc.

Inventor： Adam M. McLaughlin ,  Jordan B. Tye

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/20 ,  C23C14/48 ,  H01L21/687

Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.

公开(公告)号：US20210375585A1

公开(公告)日：2021-12-02

申请号：US17403223

申请日：2021-08-16

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, JR. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US11170973B2

公开(公告)日：2021-11-09

申请号：US16735125

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, Jr. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08 ,  H01J37/317

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US11145484B2

公开(公告)日：2021-10-12

申请号：US16831082

申请日：2020-03-26

Applicant: ULVAC-PHI, INC

Inventor： Mauo Sogou ,  Hiromichi Yamazui ,  Daisuke Sakai ,  Katsumi Watanabe

IPC: H01J37/08

Abstract: An analyzing apparatus includes a sample chamber, a measurement apparatus, and a gas cluster ion beam apparatus. A cooling body separates an ionization chamber of the gas cluster ion beam apparatus from a nozzle support to prevent heat emitted by an ionization filament from being transmitted to the nozzle support, and a temperature of a source gas emitted from a nozzle is kept at a constant temperature by a gas heating device while a sputtering rate is kept constant. A pressure of the source gas supplied to the nozzle is kept at constant pressure by a pressure controller, and a size of gas cluster ions is kept at a constant value. Because the sputtering rate is a constant value, highly accurate depth surface profiling can be performed.

公开(公告)号：US20210305001A1

公开(公告)日：2021-09-30

申请号：US16828886

申请日：2020-03-24

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Alexander C. Kontos ,  James J. Howarth

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/317

Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.

公开(公告)号：US20210296078A1

公开(公告)日：2021-09-23

申请号：US17201436

申请日：2021-03-15

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Yuuji Ishida

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/18 ,  H01J37/32

Abstract: There is provided an ion generation device including a plasma generation chamber that generates a plasma for extracting an ion, and a heating device configured to heat the plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to the plasma generated inside the plasma generation chamber with a laser beam.

公开(公告)号：US11127558B1

公开(公告)日：2021-09-21

申请号：US16826921

申请日：2020-03-23

Applicant: Applied Materials, Inc.

Inventor： Adam M. McLaughlin ,  Jordan B. Tye

IPC: H01J37/08 ,  H01J37/20 ,  H01L21/687 ,  C23C14/48 ,  H01J37/317

Abstract: Thermally isolated captive features disposed in various components of an ion implantation system are disclosed. Electrodes, such as repellers and side electrodes, may be constructed with a captive feature, which serves as the electrode stem. The electrode stem makes minimal physical contact with the electrode mass due to a gap disposed in the interior cavity which retains the flared head of the electrode stem. In this way, the temperature of the electrode mass may remain higher than would otherwise be possible as conduction is reduced. Further, this concept can be applied to workpiece holders. For example, a ceramic platen is manufactured with one or more captive fasteners which are used to affix the platen to a base. This may minimize the thermal conduction between the platen and the base, while providing an improved mechanical connection.

公开(公告)号：US20210287871A1

公开(公告)日：2021-09-16

申请号：US16316289

申请日：2016-07-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kengo ASAI ,  Hiroyasu SHICHI ,  Toru IWAYA ,  Hisayuki TAKASU

IPC: H01J37/08 ,  H01J37/09 ,  H01J37/305

Abstract: To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.

公开(公告)号：US11062873B2

公开(公告)日：2021-07-13

申请号：US16409423

申请日：2019-05-10

Applicant: Axcelis Technologies, Inc.

Inventor： Neil K Colvin ,  Tseh-Jen Hsieh

IPC: H01J37/08 ,  H01J37/317

Abstract: A terminal system for an ion implantation system has an ion source with a housing and extraction electrode assembly having one or more aperture plates. A gas box is electrically coupled to the ion source. A gas source is within the gas box to provide a gas at substantially the same electrical potential as the ion source assembly. A bleed gas conduit introduces the gas to a region internal to the housing of the ion source and upstream of at least one of the aperture plates. The bleed gas conduit has one or more feed-throughs extending through a body of the ion source assembly, such as a hole in a mounting flange of the ion source. The mounting flange may be a tubular portion having a channel. The bleed gas conduit can further have a gas distribution apparatus defined as a gas distribution ring. The gas distribution ring can generally encircle the tubular portion of the mounting flange.