公开(公告)号：US20230312387A1

公开(公告)日：2023-10-05

申请号：US18127351

申请日：2023-03-28

Applicant: CORNING INCORPORATED

Inventor： William Robert Angell, IV ,  John Edward Maxon ,  Jeffrey Lee Sunderland

IPC: C03B19/14

CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/36

Abstract: A process for producing a glass body, the process including flowing oxygen gas from a burner in a furnace at a flow rate of greater than 12.0 standard liters per minute and flowing a precursor gas mixture from the burner. The process further including oxidizing the precursor gas mixture with the oxygen gas to form glass particles and depositing the glass particles on a collection cup to form the glass body.

公开(公告)号：US09932261B2

公开(公告)日：2018-04-03

申请号：US15297534

申请日：2016-10-19

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Steven Bruce Dawes ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina ,  William Rogers Rosch ,  Bryan Ray Wheaton

IPC: C03C3/06 ,  C03C3/089 ,  C03B25/02 ,  C03C4/00 ,  C03B19/14

CPC classification number: C03C3/089 ,  C03B19/14 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/00 ,  C03C23/007 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

公开(公告)号：US09890071B2

公开(公告)日：2018-02-13

申请号：US15291379

申请日：2016-10-12

Applicant: Corning Incorporated

Inventor： Carlos Alberto Duran

IPC: C03C3/06 ,  C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03C3/076

CPC classification number: C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/00 ,  C03C2201/42 ,  Y02P40/57

Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

公开(公告)号：US20180016176A1

公开(公告)日：2018-01-18

申请号：US15716084

申请日：2017-09-26

Applicant: NIKON CORPORATION

Inventor： Toshio YOSHINARI ,  Tadahiko SAITO

IPC: C03B19/14 ,  C03C3/04 ,  C03B23/00 ,  C03C3/06 ,  C03B32/00 ,  C03B23/049 ,  C03B11/00

CPC classification number: C03B19/1415 ,  C03B11/00 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1476 ,  C03B19/1492 ,  C03B23/0013 ,  C03B23/0496 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/04 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52

Abstract: A device for manufacturing SiO2—TiO2 based glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot.

公开(公告)号：US20170197878A1

公开(公告)日：2017-07-13

申请号：US15471344

申请日：2017-03-28

Applicant: Corning Incorporated

Inventor： Dana Craig Bookbinder ,  Robert Brett Desorcie ,  Hazel Benton Matthews, III ,  Pushkar Tandon

IPC: C03C25/66 ,  G02B6/036 ,  C03C25/10

CPC classification number: C03C25/66 ,  C03B37/01205 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/027 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2203/23 ,  C03B2203/24 ,  C03C3/06 ,  C03C13/045 ,  C03C25/1061 ,  C03C25/1068 ,  C03C2201/11 ,  C03C2201/22 ,  C03C2201/31 ,  C03C2203/54 ,  G02B6/02 ,  G02B6/021 ,  G02B6/03627 ,  G02B6/0365 ,  Y02P40/57

Abstract: The present disclosure is directed to a method of making an optical fiber with improved bend performance, the optical fiber having a core and at least one cladding layer, and a chlorine content in the in the last layer of the at least one cladding layer that is greater than 500 ppm by weight. The fiber is prepared using a mixture of a carrier gas, a gaseous chlorine source material and a gaseous reducing agent during the sintering of the last or outermost layer of the at least one cladding layer. The inclusion of the reducing gas into a mixture of the carrier gas and gaseous chlorine material reduces oxygen-rich defects that results in at least a 20% reduction in TTP during hydrogen aging testing.

公开(公告)号：US20170038672A1

公开(公告)日：2017-02-09

申请号：US15041113

申请日：2016-02-11

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

IPC: G03F1/24 ,  C03C3/06 ,  C03C4/08 ,  C03B19/14

CPC classification number: G03F1/24 ,  C03B19/1415 ,  C03B19/1423 ,  C03B2201/42 ,  C03B2207/64 ,  C03C3/06 ,  C03C4/0085 ,  C03C4/08 ,  C03C2201/42 ,  C03C2203/42 ,  G03F1/50

Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

Abstract translation: 在二氧化钛掺杂石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）与双折射测量点（A）之间的直线和 在测量点（A）处的双折射具有大于45度的平均值。 由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。

公开(公告)号：US09505649B2

公开(公告)日：2016-11-29

申请号：US14474427

申请日：2014-09-02

Applicant: Corning Incorporated

Inventor： Carlos Alberto Duran

IPC: C03C3/06 ,  C03B25/02 ,  C03B25/08 ,  C03B25/00 ,  C03C3/076

CPC classification number: C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/00 ,  C03C2201/42 ,  Y02P40/57

Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

Abstract translation: 在宽范围的零交叉温度下具有小的温度变化系数的二氧化硅 - 二氧化钛玻璃以及用于制造眼镜的方法。 该方法包括在两种不同温度方案下具有受控退火的冷却方案。 较高的温度控制退火可能在750°C-950°C的温度区间或其次间隔发生。 较低的温度控制退火可以在650℃-875℃或其子间隔的温度区间内进行。 受控退火允许独立控制二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc。 独立控制提供固体组合物的二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc值，迄今为止只能通过组成变化来实现。

公开(公告)号：US20160306271A1

公开(公告)日：2016-10-20

申请号：US15137954

申请日：2016-04-25

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/24 ,  C03C3/06 ,  C03B19/14

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/42 ,  Y02P40/57

Abstract: Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

公开(公告)号：US09382151B2

公开(公告)日：2016-07-05

申请号：US14604998

申请日：2015-01-26

Applicant: Corning Incorporated

Inventor： William R. Angell, IV ,  Sezhian Annamalai ,  Carlos Alberto Duran ,  John Edward Maxon

IPC: C03C3/06 ,  C03C3/076 ,  C03B19/09 ,  C03C3/062 ,  C03B19/14 ,  G03F1/24

CPC classification number: C03C3/076 ,  C03B19/09 ,  C03B19/1407 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/50 ,  C03C3/06 ,  C03C3/062 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2203/40 ,  G03F1/24 ,  G03F1/60

Abstract: A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100−{c+f(x,y,z)}−δ(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and δ(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).

Abstract translation: 提供了一种用于极光紫外光刻（EUVL）的玻璃制品。 玻璃制品包括通过玻璃制品具有组成梯度的二氧化硅 - 二氧化钛玻璃，组成梯度由以下功能定义：[TiO 2] =（c + f（x，y，z））和[SiO 2] =（ 100- {c + f（x，y，z）}-δ（x，y，z））其中[TiO 2]是二氧化钛的重量浓度。 ％，[SiO2]是二氧化硅的重量浓度。 ％，c是以重量计的二氧化钛浓度。 对于预定的零交叉温度（Tzc），f（x，y，z）是三维空间中的函数，其定义以坐标（x，y，z）为中心的体积元素的平均成分的差异与 对于c而言，δ（x，y，z）是定义以坐标（x，y，z）为中心的体元素的所有其他分量的和的三维空间中的函数。

公开(公告)号：US20160137545A1

公开(公告)日：2016-05-19

申请号：US14921487

申请日：2015-10-23

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/12 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/10 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/076 ,  C03C10/0009 ,  C03C2201/10 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2201/58 ,  C03C2203/54

Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.

Abstract translation: 超低膨胀二氧化钛 - 二氧化硅玻璃。 玻璃具有高羟基含量，并且任选地包括一种或多种掺杂剂。 代表性的可选掺杂剂包括硼，碱元素，碱土金属元素或诸如Nb，Ta，Al，Mn，Sn Cu和Sn的金属。 玻璃通过包括蒸汽固结以增加羟基含量的方法制备。 高羟基含量或掺杂剂和高羟基含量的组合降低了玻璃的假想温度，以提供具有非常低的热膨胀系数（CTE），低假想温度（Tf）和低膨胀斜率的玻璃。