Spectroscopy systems and methods using quantum cascade laser arrays with lenses
    61.
    发明授权
    Spectroscopy systems and methods using quantum cascade laser arrays with lenses 有权
    使用带透镜的量子级联激光阵列的光谱系统和方法

    公开(公告)号:US09255841B2

    公开(公告)日:2016-02-09

    申请号:US13873636

    申请日:2013-04-30

    Abstract: A spectroscopy system includes an array of quantum cascade lasers (QCLs) that emits an array of non-coincident laser beams. A lens array coupled to the QCL array substantially collimates the laser beams, which propagate along parallel optical axes towards a sample. The beams remain substantially collimated over the lens array's working distance, but may diverge when propagating over longer distances. The collimated, parallel beams may be directed to/through the sample, which may be within a sample cell, flow cell, multipass spectroscopic absorption cell, or other suitable holder. Alternatively, the beams may be focused to a point on, near, or within the target using a telescope or other suitable optical element(s). When focused, however, the beams remain non-coincident; they simply intersect at the focal point. The target transmits, reflects, and/or scatters this incident light to a detector, which transduces the detected radiation into an electrical signal representative of the target's absorption or emission spectrum.

    Abstract translation: 光谱系统包括发射非重合激光束阵列的量子级联激光器阵列(QCL)。 耦合到QCL阵列的透镜阵列基本上准直了沿着平行光轴朝向样本传播的激光束。 光束在透镜阵列的工作距离上保持基本上准直,但是当在较长距离上传播时可能会发散。 准直的平行光束可以被引导到/通过样品,其可以在样品池,流通池,多光谱吸收单元或其它合适的保持器内。 或者,可以使用望远镜或其它合适的光学元件将光束聚焦到靶上,接近或在目标内的点。 然而,当专注时,梁保持不重合; 他们只是在焦点处相交。 目标将该入射光透射,反射和/或散射到检测器,检测器将检测到的辐射转换成代表目标吸收或发射光谱的电信号。

    Device for determination of gas concentration
    63.
    发明授权
    Device for determination of gas concentration 有权
    气体浓度测定装置

    公开(公告)号:US09201007B2

    公开(公告)日:2015-12-01

    申请号:US13851879

    申请日:2013-03-27

    Abstract: A device can be used for establishing gas concentrations in an examination volume. A radiation source is configured to generate an electromagnetic beam. A beam guiding apparatus is arranged downstream of the radiation source. The beam guiding apparatus is configured to set a plurality of variations of beam guidance of the beam entering the beam guiding apparatus in an observation plane in the examination volume. A spectrometer is arranged downstream of the beam guiding apparatus. The spectrometer is configured to carry out a spectral analysis of the beam leaving the beam guiding apparatus. An evaluation unit is configured to establish in the observation plane a 2D concentration distribution for one or more gases in the examination volume on the basis of the spectral analysis for different variations of beam guidance.

    Abstract translation: 一种装置可用于建立检查体积中的气体浓度。 辐射源被配置为产生电磁波束。 光束引导装置布置在辐射源的下游。 光束引导装置被配置为在检查体积中的观察平面中设置进入光束引导装置的光束的多个波束引导变化。 光谱仪布置在光束引导装置的下游。 光谱仪被配置为对离开光束引导装置的光束进行光谱分析。 评估单元被配置为基于对波束引导的不同变化的频谱分析,在观察平面中建立检查体积中的一种或多种气体的2D浓度分布。

    System and method for compensating for second order diffraction in spectrometer measurements
    64.
    发明授权
    System and method for compensating for second order diffraction in spectrometer measurements 有权
    用于补偿光谱仪测量中二次衍射的系统和方法

    公开(公告)号:US09188486B1

    公开(公告)日:2015-11-17

    申请号:US14456687

    申请日:2014-08-11

    CPC classification number: G01J3/28 G01J3/18 G01J3/42 G01J2003/425

    Abstract: The present invention concerns a system and method for identifying and implementing a correction to spectrometer measurements in order to compensate for errors in the measurement values due to second order diffracted light. The present invention in one configuration, measures light reflectance percentages across the same wavelength range for at least one calibration target. From these measurements the portion of the reflectance values resulting from second order diffracted light is identified and corrected for, thereby generating a compensated measurement of the reflectance values of a sample. These compensated values are then provided to a user.

    Abstract translation: 本发明涉及用于识别和实现对光谱仪测量的校正的系统和方法,以补偿由于二阶衍射光引起的测量值中的误​​差。 本发明在一个结构中,测量至少一个校准目标的相同波长范围的光反射率百分比。 从这些测量中,识别并校正由二级衍射光产生的反射率值的部分,从而产生样品的反射率值的补偿测量。 然后将这些补偿值提供给用户。

    Device and method for analyzing kernel component
    66.
    发明授权
    Device and method for analyzing kernel component 有权
    用于分析内核组件的设备和方法

    公开(公告)号:US09091643B2

    公开(公告)日:2015-07-28

    申请号:US13655591

    申请日:2012-10-19

    Abstract: A kernel component analysis device quantitatively analyzing a specific component contained in each of kernels on a kernel-by-kernel basis by spectroscopy includes: a light emitter configured to irradiate a kernel to be analyzed with light; a spectrum detector configured to detect a spectrum of light transmitted through and/or reflected from the kernel irradiated with the light; and a computing unit configured to calculate, on a kernel-by-kernel basis, a content of the specific component in the kernel to be analyzed, based on a spectrum value detected from an effective portion, which is suitable for quantitative analysis, of an image of the kernel by using a calibration curve indicating a relationship between a spectrum value at a specific wavelength and a content of the specific component.

    Abstract translation: 核心成分分析装置通过光谱分析核心分析包含在每个核心中的特定成分的核心部件分析装置包括:配置成用光照射要分析的核的光发射器; 光谱检测器,其被配置为检测透射通过和/或从所述光照射的核的反射光的光谱; 以及计算单元,其被配置为基于从逐个核心基于从要分析的内核中的特定组件的内容,基于从适合于定量分析的有效部分检测到的频谱值,计算 通过使用指示特定波长的光谱值与特定成分的内容之间的关系的校准曲线来确定核的图像。

    Infrared-based metrology for detection of stress and defects around through silicon vias
    67.
    发明授权
    Infrared-based metrology for detection of stress and defects around through silicon vias 有权
    基于红外的测量方法,用于检测硅通孔周围的应力和缺陷

    公开(公告)号:US09041919B2

    公开(公告)日:2015-05-26

    申请号:US13769494

    申请日:2013-02-18

    Inventor: Ming Lei

    Abstract: An approach for IR-based metrology for detecting stress and/or defects around TSVs of semiconductor devices is provided. Specifically, in a typical embodiment, a beam of IR light will be emitted from an IR light source through the material around the TSV. Once the beam of IR light has passed through the material around the TSV, the beam will be analyzed using one or more algorithms to determine information about TSV stress and/or defects such as imbedded cracking, etc. In one embodiment, the beam of IR light may be split into a first portion and a second portion. The first portion will be passed through the material around the TSV while the second portion is routed around the TSV. After the first portion has passed through the material around the TSV, the two portions may then be recombined, and the resulting beam may be analyzed as indicated above.

    Abstract translation: 提供了一种用于检测半导体器件TSV周围的应力和/或缺陷的基于红外测量的方法。 具体地,在典型的实施例中,IR光束将从IR光源通过TSV周围的材料发射。 一旦IR光束通过TSV周围的材料,则将使用一种或多种算法来分析光束,以确定关于TSV应力和/或诸如嵌入裂纹等缺陷的信息。在一个实施例中,IR光束 光可以分成第一部分和第二部分。 第一部分将通过TSV周围的材料,而第二部分绕TSV路线。 在第一部分已经穿过TSV周围的材料之后,可以将两个部分重组,并且可以如上所述分析所得到的光束。

    Systems and methods for correcting optical reflectance measurements
    69.
    发明授权
    Systems and methods for correcting optical reflectance measurements 有权
    用于校正光反射率测量的系统和方法

    公开(公告)号:US08873035B2

    公开(公告)日:2014-10-28

    申请号:US13021065

    申请日:2011-02-04

    Abstract: We disclose measurement systems and methods for measuring analytes in target regions of samples that also include features overlying the target regions. The systems include: (a) a light source; (b) a detection system; (c) a set of at least first, second, and third light ports which transmit light from the light source to a sample and receive and direct light reflected from the sample to the detection system, generating a first set of data including information corresponding to both an internal target within the sample and features overlying the internal target, and a second set of data including information corresponding to features overlying the internal target; and (d) a processor configured to remove information characteristic of the overlying features from the first set of data using the first and second sets of data to produce corrected information representing the internal target.

    Abstract translation: 我们公开了测量系统和方法,用于测量样品目标区域中的分析物,还包括覆盖目标区域的特征。 系统包括:(a)光源; (b)检测系统; (c)一组至少第一,第二和第三光端口,其将来自光源的光透射到样品并且将从样品反射的光接收并引导到检测系统,生成第一组数据,其包括对应于 样本内的内部目标和覆盖内部目标的特征,以及包括对应于覆盖内部目标的特征的信息的第二组数据; 以及(d)处理器,被配置为使用所述第一和第二组数据从所述第一组数据中去除所述上覆特征的信息特征,以产生表示所述内部目标的校正信息。

    Method and device for remotely monitoring an area using a low peak power optical pump
    70.
    发明授权
    Method and device for remotely monitoring an area using a low peak power optical pump 有权
    使用低峰值功率光泵远程监控区域的方法和装置

    公开(公告)号:US08786840B1

    公开(公告)日:2014-07-22

    申请号:US13358853

    申请日:2012-01-26

    Abstract: A method and device for remotely monitoring an area using a low peak power optical pump comprising one or more pumping sources, one or more lasers; and an optical response analyzer. Each pumping source creates a pumping energy. The lasers each comprise a high reflectivity mirror, a laser media, an output coupler, and an output lens. Each laser media is made of a material that emits a lasing power when exposed to pumping energy. Each laser media is optically connected to and positioned between a corresponding high reflectivity mirror and output coupler along a pumping axis. Each output coupler is optically connected to a corresponding output lens along the pumping axis. The high reflectivity mirror of each laser is optically connected to an optical pumping source from the one or more optical pumping sources via an optical connection comprising one or more first optical fibers.

    Abstract translation: 一种使用包括一个或多个泵浦源,一个或多个激光器的低峰值功率光泵来远程监测区域的方法和装置; 和光学响应分析仪。 每个泵浦源产生泵浦能量。 激光器各自包括高反射镜,激光介质,输出耦合器和输出透镜。 每个激光介质由暴露于泵浦能量时发射激光功率的材料制成。 每个激光介质沿着泵送轴光学地连接到并定位在相应的高反射镜和输出耦合器之间。 每个输出耦合器沿泵送轴光学连接到相应的输出透镜。 每个激光器的高反射镜通过包括一个或多个第一光纤的光学连接从一个或多个光泵浦源光学连接到光泵浦源。

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