公开(公告)号：US10790153B2

公开(公告)日：2020-09-29

申请号：US16391263

申请日：2019-04-22

Applicant: Applied Materials, Inc.

Inventor： Yue Guo ,  Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Gonzalo Monroy ,  Lucy Zhiping Chen

IPC: H01L21/3065 ,  H01J37/305 ,  H01J37/32 ,  H01L21/3213

Abstract: Embodiments described herein relate to apparatus and methods for performing electron beam etching process. In one embodiment, a method of etching a substrate includes delivering a process gas to a process volume of a process chamber, applying a RF power to an electrode formed from a high secondary electron emission coefficient material disposed in the process volume, generating a plasma comprising ions in the process volume, bombarding the electrode with the ions to cause the electrode to emit electrons and form an electron beam, applying a negative DC power to the electrode, accelerating electrons emitted from the bombarded electrode toward a substrate disposed in the process chamber, and etching the substrate with the accelerated ions.

公开(公告)号：US20200035454A1

公开(公告)日：2020-01-30

申请号：US16595339

申请日：2019-10-07

Applicant: Applied Materials, Inc.

Inventor： Kenneth S. Collins ,  Kartik Ramaswamy ,  James D. Carducci ,  Shahid Rauf ,  Leonid Dorf ,  Yang Yang

IPC: H01J37/32

Abstract: A method of etching uses an overhead electron beam source that generates an ion-ion plasma for performing an atomic layer etch process.

公开(公告)号：US10544505B2

公开(公告)日：2020-01-28

申请号：US15717822

申请日：2017-09-27

Applicant: Applied Materials, Inc.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Gonzalo Antonio Monroy ,  Lucy Chen ,  Yue Guo

IPC: C23C16/26 ,  C23C14/30 ,  C23C16/27 ,  C23C16/505 ,  C23C16/56 ,  H01J37/32 ,  C23C16/44 ,  C23C16/48 ,  C23C16/52 ,  H01J37/302 ,  H01J37/317 ,  H01L21/02

Abstract: A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.

公开(公告)号：US10249479B2

公开(公告)日：2019-04-02

申请号：US14985688

申请日：2015-12-31

Applicant: Applied Materials, Inc.

Inventor： Joseph F. Aubuchon ,  Tza-Jing Gung ,  Travis Lee Koh ,  Nattaworn Boss Nunta ,  Sheng-Chin Kung ,  Steven Lane ,  Kartik Ramaswamy ,  Yang Yang

IPC: H01J37/32

Abstract: Embodiments described herein generally relate to plasma process apparatus. In one embodiment, the plasma process apparatus includes a plasma source assembly. The plasma source assembly may include a first coil, a second coil surrounding the first coil, and a magnetic device disposed outside the first and inside the second coil. The magnet enables additional tuning which improves uniformity control of the processes on the substrate.

公开(公告)号：US10153139B2

公开(公告)日：2018-12-11

申请号：US14742142

申请日：2015-06-17

Applicant: Applied Materials, Inc.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Steven Lane ,  Lawrence Wong ,  Shahid Rauf ,  Andrew Nguyen ,  Kenneth S. Collins ,  Roger Alan Lindley

IPC: H01J37/32

Abstract: Implementations described herein provide a substrate support assembly which enables tuning of a plasma within a plasma chamber. In one embodiment, a method for tuning a plasma in a chamber is provided. The method includes providing a first radio frequency power and a direct current power to a first electrode in a substrate support assembly, providing a second radio frequency power to a second electrode in the substrate support assembly at a different location than the first electrode, monitoring parameters of the first and second radio frequency power, and adjusting one or both of the first and second radio frequency power based on the monitored parameters.

公开(公告)号：US20180274100A1

公开(公告)日：2018-09-27

申请号：US15717897

申请日：2017-09-27

Applicant: Applied Materials, Inc.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Eswaranand Venkatasubramanian ,  Kenneth S. Collins ,  Steven Lane ,  Gonzalo Antonio Monroy ,  Lucy Chen ,  Yue Guo

IPC: C23C16/48 ,  C23C16/27 ,  C23C16/52 ,  C23C16/56 ,  C23C16/44 ,  H01L21/02 ,  H01J37/32 ,  H01J37/302 ,  H01J37/317

CPC classification number: C23C16/272 ,  C23C16/26 ,  C23C16/4412 ,  C23C16/487 ,  C23C16/505 ,  C23C16/52 ,  C23C16/56 ,  H01J37/302 ,  H01J37/317 ,  H01J37/32082 ,  H01J37/3233 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32715 ,  H01J2237/332 ,  H01J2237/3321 ,  H01L21/02115 ,  H01L21/022 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/0234 ,  H01L21/02351

Abstract: A method of forming a layer of diamond-like carbon on a workpiece includes supporting the workpiece in a chamber with the workpiece facing an upper electrode, and forming a plurality of successive sublayers to form the layer of layer of diamond-like carbon by alternating between depositing a sublayer of diamond-like carbon on the workpiece in the chamber and treating the sublayer with a plasma of the inert gas or an electron beam from the upper electrode.

公开(公告)号：US09613783B2

公开(公告)日：2017-04-04

申请号：US14339990

申请日：2014-07-24

Applicant: APPLIED MATERIALS, INC.

Inventor： Steven Lane ,  Tza-Jing Gung ,  Kartik Ramaswamy ,  Travis Koh ,  Joseph F. Aubuchon ,  Yang Yang

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/32669

Abstract: Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.

公开(公告)号：US20160276134A1

公开(公告)日：2016-09-22

申请号：US14660531

申请日：2015-03-17

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenneth S. Collins ,  Kartik Ramaswamy ,  James D. Carducci ,  Shahid Rauf ,  Leonid Dorf ,  Yang Yang

IPC: H01J37/32

Abstract: A reactor with an overhead electron beam source is capable of generating an ion-ion plasma for performing an atomic layer etch process.

Abstract translation: 具有顶部电子束源的反应器能够产生用于进行原子层蚀刻工艺的离子离子等离子体。

公开(公告)号：US09412563B2

公开(公告)日：2016-08-09

申请号：US14026227

申请日：2013-09-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Kartik Ramaswamy ,  Kenneth S. Collins ,  Shahid Rauf ,  Steven Lane ,  Yang Yang ,  Lawrence Wong

IPC: H01L21/306 ,  C23C16/00 ,  H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32183 ,  H01J37/321 ,  H01J37/32458 ,  H05H1/46 ,  H05H2001/4652

Abstract: An RF plasma source has a resonator with its shorted end joined to the processing chamber ceiling and inductively coupled to two arrays of radial toroidal channels in the ceiling, the resonator having two radial zones and the two arrays of toroidal channels lying in respective ones of the radial zones.

Abstract translation: RF等离子体源具有谐振器，其短路端连接到处理室顶部并感应耦合到天花板中的两个径向环形通道阵列，谐振器具有两个径向区域，并且环形通道的两个阵列位于 径向区。

公开(公告)号：US20160225466A1

公开(公告)日：2016-08-04

申请号：US14832280

申请日：2015-08-21

Applicant: APPLIED MATERIALS, INC.

Inventor： Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Yang Yang ,  Lawrence Wong

IPC: G21B1/05

CPC classification number: H01J37/32357 ,  H01J37/32422 ,  H01J37/3266

Abstract: An external magnetic filter to trap electrons surrounds a reactor chamber and has multiple magnets arranged in a circle, the magnetic orientation of each individual magnet being rotated relative to the orientation of the adjacent individual magnet by a difference angle that is a function of the arc subtended by the individual magnet.

Abstract translation: 用于捕获电子的外部磁性过滤器围绕反应室并且具有以圆形排列的多个磁体，每个单独磁体的磁性定向相对于相邻单独磁体的取向旋转相对于被对准的电弧的函数的差角 由个别磁铁。