Methods and systems for plasma deposition and treatment
    75.
    发明授权
    Methods and systems for plasma deposition and treatment 有权
    用于等离子体沉积和处理的方法和系统

    公开(公告)号:US09520271B2

    公开(公告)日:2016-12-13

    申请号:US14341362

    申请日:2014-07-25

    Abstract: An apparatus for separating ions having different mass or charge includes a waveguide conduit coupled to a microwave source for transmitting microwaves through openings in the waveguide conduit. The outlet ends of pipes are positioned at the openings for transporting material from a material source to the openings. A plasma chamber is in communication with the waveguide tube through the openings. The plasma chamber receives through the openings microwaves from the waveguide tube and material from the pipes. The plasma chamber includes magnets disposed in an outer wall thereof for forming a magnetic field in the plasma chamber. The plasma chamber includes a charged cover at a side of the chamber opposite the side containing the openings. The cover includes extraction holes through which ion beams from the plasma chamber are extracted. Deflectors coupled to one of the extraction holes receive the ion beams extracted from the plasma chamber. Each deflector bends an ion beam and provides separate passages for capturing ions following different trajectories from the bending of the ion beam based on their respective mass or charge.

    Abstract translation: 用于分离具有不同质量或电荷的离子的装置包括耦合到微波源的波导导管,用于通过波导管道中的开口传输微波。 管道的出口端位于用于将材料从材料源运输到开口的开口处。 等离子体室通过开口与波导管连通。 等离子体腔室通过开口接收来自波导管的微波和来自管道的材料。 等离子体室包括设置在其外壁中的磁体,用于在等离子体室中形成磁场。 等离子体室包括在室的与包含开口的一侧相对的一侧的带电盖。 盖子包括提取来自等离子体室的离子束的抽吸孔。 与一个提取孔耦合的偏转器接收从等离子体室提取的离子束。 每个偏转器弯曲离子束,并提供单独的通道,用于根据其相应的质量或电荷离开离子束弯曲的不同轨迹之后捕获离子。

    Control of ion angular distribution of ion beams with hidden deflection electrode
    77.
    发明授权
    Control of ion angular distribution of ion beams with hidden deflection electrode 有权
    控制具有隐藏偏转电极的离子束的离子角分布

    公开(公告)号:US09514912B2

    公开(公告)日:2016-12-06

    申请号:US14523428

    申请日:2014-10-24

    Abstract: A processing apparatus may include: an extraction plate disposed along a side of a plasma chamber, the extraction plate having a first and second aperture, and middle portion between the first and second aperture, the first and second aperture being configured to define a first and second ion beam when the plasma is present in the plasma chamber and an extraction voltage is applied between the extraction plate and a substrate; a hidden deflection electrode disposed adjacent the middle portion outside of the plasma chamber, and electrically isolated from the extraction plate; and a hidden deflection electrode power supply to apply a bias voltage to the hidden deflection electrode, wherein the bias voltage is configured to modify a mean angle of incidence of ions and/or a range of angles of incidence centered around the mean angle of incidence in the first and second ion beam.

    Abstract translation: 一种处理设备可以包括:提取板,沿着等离子体室的一侧设置,所述提取板具有第一和第二孔,以及在第一和第二孔之间的中间部分,第一和第二孔被配置为限定第一和第二孔 当等离子体存在于等离子体室中并且在提取板和基板之间施加提取电压时的第二离子束; 隐藏的偏转电极,设置在等离子体室外部的中间部分附近,并与提取板电隔离; 以及隐藏的偏转电极电源,用于向隐藏的偏转电极施加偏置电压,其中偏置电压被配置为修改离子的平均入射角和/或以入射角为中心的入射角范围, 第一和第二离子束。

    Cam actuated filament clamp
    78.
    发明授权
    Cam actuated filament clamp 有权
    凸轮驱动灯丝夹

    公开(公告)号:US09502207B1

    公开(公告)日:2016-11-22

    申请号:US14835780

    申请日:2015-08-26

    CPC classification number: H01J37/08 H01J3/04 H01J2237/061 H01J2237/31701

    Abstract: An ion source filament clamp has a clamp member having first and second ends. The first end has one of a cam surface and a cam follower, and has first and second portions that are opposed to one another and separated by a slot having a lead opening defined therein to receive a lead of an ion source filament. An actuator pin extends along an actuator pin axis and has first and second sections. The first section is coupled to the first portion of the clamp member. The actuator pin extends through, and is in sliding engagement with, a thru-hole in the second portion of the clamp member. A cam member is operably coupled to the second section of the actuator pin. The cam member has a handle and the other of the cam surface and cam follower and is configured to rotate between a clamped position and an unclamped position. The cam follower slidingly contacts the cam surface. In the clamped position, the cam follower engages the cam surface in a first predetermined manner, thus selectively compressing the first and second portions of the clamp member toward one another and exerting a clamping pressure on the lead within the lead opening while inducing a spring tension between the first and second portions of the clamp member. In the unclamped position, the cam follower engages the cam surface in a second predetermined manner, wherein the spring tension extends the first and second portions of the clamp member apart from one another, therein releasing the clamping pressure on the lead within the lead opening.

    Abstract translation: 离子源灯丝夹具具有一个具有第一和第二端的夹紧件。 第一端具有凸轮表面和凸轮从动件中的一个,并且具有彼此相对并且由其中限定有引线开口的槽分隔开的第一和第二部分,以接收离子源灯丝的引线。 执行器销沿致动器销轴线延伸并具有第一和第二部分。 第一部分联接到夹紧构件的第一部分。 致动器销延伸穿过并且与夹紧构件的第二部分中的通孔滑动接合。 凸轮构件可操作地联接到致动器销的第二部分。 凸轮构件具有手柄和凸轮表面和凸轮从动件中的另一个,并且构造成在夹紧位置和未夹紧位置之间旋转。 凸轮从动件滑动地接触凸轮表面。 在夹紧位置中,凸轮从动件以第一预定方式接合凸轮表面,从而选择性地将夹紧构件的第一和第二部分彼此压缩并且在引导开口内的引线上施加夹紧压力,同时引起弹簧张力 在夹紧构件的第一和第二部分之间。 在松开位置,凸轮从动件以第二预定方式接合凸轮表面,其中弹簧张力将夹紧构件的第一和第二部分彼此分开延伸,从而在引线开口内释放引线上的夹持压力。

    Ion Source for Metal Implantation and Methods Thereof
    79.
    发明申请
    Ion Source for Metal Implantation and Methods Thereof 审中-公开
    金属植入物的离子源及其方法

    公开(公告)号:US20160322198A1

    公开(公告)日:2016-11-03

    申请号:US14701320

    申请日:2015-04-30

    Abstract: An ion source for an implanter includes a first solid state source electrode disposed in an ion source chamber. The first solid state source electrode includes a source material coupled to a first negative potential node. A second solid state source electrode is disposed in the ion source chamber. The second solid state source electrode includes the source material coupled to a second negative potential node, and the first solid state source electrode and the second solid state source electrode are configured to produce ions to be implanted by the implanter.

    Abstract translation: 用于注入机的离子源包括设置在离子源室中的第一固态源电极。 第一固态源极包括耦合到第一负电位节点的源极材料。 第二固态源电极设置在离子源室中。 第二固体源电极包括耦合到第二负电位节点的源极材料,并且第一固态源极电极和第二固态源极电极被配置为产生待被注入器植入的离子。

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