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    METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS
    81.
    发明申请
    METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS 审中-公开

    公开(公告)号：US20180305236A1

    公开(公告)日：2018-10-25

    申请号：US15959796

    申请日：2018-04-23

    Applicant: Shin-Etsu Quartz Products Co., Ltd. ,  Heraeus Quarzglas GmbH & Co. KG

    Inventor： Manabu UTSUMI

    IPC: C03B25/02

    CPC classification number: C03B25/02 ,  C03C3/06 ,  C03C23/007 ,  C03C2201/02 ,  C03C2203/52

    Abstract: One aspect is a process to producing a synthetic quartz glass, including an annealing treatment that includes: putting a synthetic quartz glass as a parent material into a heat treatment furnace; elevating a temperature in the heat treatment furnace to a prescribed keeping temperature that is equal to or higher than the annealing point; keeping the keeping temperature; annealing the synthetic quartz glass; and taking the synthetic quartz glass out of the heat treatment furnace. The process includes determining an annealing rate v [° C./h] of the annealing step based on a value of S/V [mm2/mm3], wherein S [mm2] is the surface area of the synthetic quartz glass as a parent material and V [mm3] is the volume thereof and a target birefringence Re [nm/cm] for the synthetic quartz glass after the annealing, and the annealing step is performed at the determined annealing rate v.

    BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER
    85.
    发明申请
    BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER 审中-公开
    黑色合成石英玻璃与透明层

    公开(公告)号：US20090098370A1

    公开(公告)日：2009-04-16

    申请号：US12249616

    申请日：2008-10-10

    Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida

    Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida

    IPC: B32B17/06 ,  C03C15/00

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03C4/02 ,  C03C4/082 ,  C03C23/008 ,  C03C2201/02 ,  C03C2201/26 ,  C03C2203/54 ,  Y10T428/261

    Abstract: To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.

    Abstract translation: 为了提供具有透明层的黑色合成石英玻璃，其在远红外区域具有高发射率，具有优异的遮光性能，在金属杂质方面保持与合成石英玻璃相同的纯度，具有高温粘度 与天然石英玻璃相当的特性，可进行焊接等高温加工，不会从表面释放碳; 以及其生产方法。 含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应，反应开始后，达到一定程度的 真空度超过10mmHg（1343Pa），在1200℃〜2000℃的温度下进行加热，生成紧凑的玻璃体。

    Method for producing synthetic quartz glass and synthetic quartz glass article
    86.
    发明申请
    Method for producing synthetic quartz glass and synthetic quartz glass article 有权
    生产合成石英玻璃和合成石英玻璃制品的方法

    公开(公告)号：US20060059948A1

    公开(公告)日：2006-03-23

    申请号：US10535935

    申请日：2003-11-28

    Applicant: Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

    Inventor： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

    IPC: C03C25/64

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

    Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

    Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是 烘烤，从而形成致密的玻璃体。

    Method of producing a composite material having a high SiO2 content, composite material obtained according to the method, and permanent mold made thereof
    89.
    发明授权
    Method of producing a composite material having a high SiO2 content, composite material obtained according to the method, and permanent mold made thereof 有权
    SiO 2含量高的复合材料的制造方法，根据该方法得到的复合材料及其永久模具

    公开(公告)号：US06660671B2

    公开(公告)日：2003-12-09

    申请号：US10103660

    申请日：2002-03-21

    Applicant: Waltraud Werdecker ,  Udo Gertig ,  Johann Leist ,  Rainer Koeppler

    Inventor： Waltraud Werdecker ,  Udo Gertig ,  Johann Leist ,  Rainer Koeppler

    IPC: C03C100

    CPC classification number: C04B35/653 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B20/00 ,  C03C3/06 ,  C03C14/004 ,  C03C2201/02 ,  C04B35/14 ,  Y10S977/775 ,  Y10S977/776 ,  Y10S977/90

    Abstract: Composite material with high resistance to temperature changes and a high density, and having an SiO2-containing matrix with quartz glass grains embedded therein is produced by preparing a suspension from a particle mixture of finely divided SiO2 powder having at least two different particle fractions and of the quartz glass grains, forming a green compact and sintering the compact. The matrix has an SiO2 content of at least 99% by wt. and is formed from at least first and second particle fractions, each of which is present as granules of nanoscale, amorphous, synthetically produced SiO2 primary particles having a mean primary particle size of less than 100 nm. The composite material has an SiO2-containing matrix with an SiO2 content of at least 99% by wt. It is particularly suited for applications such as starting material for producing a permanent mold for melting solar silicon.

    Abstract translation: 通过从具有至少两种不同颗粒级分的细分SiO 2粉末和具有至少两种不同颗粒级分的颗粒混合物制备悬浮液，制备具有高耐温变化和高密度的复合材料，并且具有嵌入石英玻璃颗粒的含SiO 2基质 石英玻璃颗粒，形成一个生坯并烧结成型。 该基质具有至少99重量％的SiO 2含量。 并且由至少第一和第二颗粒组分形成，每个颗粒级分以纳米级，无定形，合成产生的平均一次粒径小于100nm的SiO 2一次颗粒的颗粒形式存在。 复合材料具有SiO 2含量至少为99重量％的含SiO 2的基体。 特别适合用于制造用于熔化太阳能硅的永久模具的起始材料。

    Method of producing a composite material having a high SiO2 content, composite material obtained according to the method, and permanent mold made thereof
    90.
    发明申请
    Method of producing a composite material having a high SiO2 content, composite material obtained according to the method, and permanent mold made thereof 有权
    SiO 2含量高的复合材料的制造方法，根据该方法得到的复合材料及其永久模具

    公开(公告)号：US20030119648A1

    公开(公告)日：2003-06-26

    申请号：US10103660

    申请日：2002-03-21

    Inventor： Waltraud Werdecker ,  Udo Gertig ,  Johann Leist ,  Rainer Koeppler

    IPC: C03C014/00

    CPC classification number: C04B35/653 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B20/00 ,  C03C3/06 ,  C03C14/004 ,  C03C2201/02 ,  C04B35/14 ,  Y10S977/775 ,  Y10S977/776 ,  Y10S977/90

    Abstract: Known is a method of producing a composite material having an SiO2-containing matrix in which quartz glass grains are embedded, wherein a suspension is prepared from a particle mixture of finely divided SiO2 powder having at least two different particle fractions and of the quartz glass grains, a green compact is formed therefrom and said compact is sintered. To permit an inexpensive production of a composite material having a high resistance to temperature changes together with a high density, it is suggested according to the invention that the matrix should have an SiO2 content of at least 99% by wt. and should be formed from at least a first (33) and a second (35) particle fraction, each of the particle fractions being present as granules of nanoscale, amorphous, synthetically produced SiO2 primary particles (2) having a mean primary particle size of less than 100 nm. The composite material produced according to the method is characterized by an SiO2-containing matrix which has an SiO2 content of at least 99% by wt. It is particularly suited for applications where temperature strength, density and high purity are of importance, e.g. as a starting material for producing a permanent mold for melting solar silicon.

    Abstract translation: 已知有一种制备具有SiO 2的基质的复合材料的方法，其中嵌有石英玻璃颗粒，其中由具有至少两种不同颗粒级分的细碎SiO 2粉末和石英玻璃颗粒的颗粒混合物制备悬浮液 ，由此形成生坯，并且所述成形体被烧结。 为了允许廉价生产具有高耐温性的复合材料以及高密度，根据本发明，提出基质应具有至少99重量％的SiO 2含量。 并且应该由至少第一（33）和第二（35）颗粒级分形成，每个颗粒部分以纳米尺度，无定形，合成的SiO 2一次粒子（2）的颗粒形式存在，所述SiO 2一次粒子的平均一次粒径为 小于100nm。 根据该方法制备的复合材料的特征在于SiO 2含量为至少99重量％的基质。 它特别适用于温度强度，密度和高纯度重要的应用，例如， 作为用于制造用于熔化太阳能硅的永久模具的起始材料。

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