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    Spectrometer and method of detecting an electromagnetic (EM) wave spectrum
    84.
    发明授权
    Spectrometer and method of detecting an electromagnetic (EM) wave spectrum 有权

    公开(公告)号：US12098950B2

    公开(公告)日：2024-09-24

    申请号：US17634451

    申请日：2020-08-11

    Applicant: National University of Singapore

    Inventor： Guangya James Zhou

    IPC: G01J3/02 ,  G01J3/04

    CPC classification number: G01J3/0272 ,  G01J3/0208 ,  G01J3/0216 ,  G01J3/0229 ,  G01J3/04 ,  G01J2003/045

    Abstract: A spectrometer for detecting an electromagnetic (EM) wave spectrum having one or more wavelength components within a spectral band of interest, and a method of detecting an electromagnetic (EM) wave spectrum having one or more wavelength components within a spectral band of interest. The method uses an entrance aperture; a dispersion and imaging optics containing at least one dispersion element; an exit aperture; a collection optics; and at least one single-pixel detector, each single-pixel detector sensitive to one or more of the wavelength components; and the method comprises the steps of spatially encoding at least one entrance slit of the entrance aperture along a direction substantially transverse to a direction of dispersion of the dispersion and imaging optics; creating, using the dispersion and imaging optics, dispersed images of the entrance aperture on a plane of the exit aperture, such that respective images at the different wavelength components are offset by different amounts of displacements along the direction of dispersion; spatially encoding a plurality of exit slits of the exit aperture along the direction substantially transverse to the direction of dispersion, wherein the exit aperture comprises a plurality of exit slits arranged in the direction of dispersion; gathering, using the collection optics, a total EM wave energy that enters the entrance aperture and exits the exit aperture to one of the at least one single-pixel detectors; changing at least one of an encoding pattern of the at least one entrance slits and an encoding pattern of the plurality of exit slits for a number of times; and measuring the output of the at least one detector for respective ones of the number of times for reconstructing the EM wave spectrum.

    Color measurement apparatus
    86.
    发明授权
    Color measurement apparatus 有权

    公开(公告)号：US11927484B2

    公开(公告)日：2024-03-12

    申请号：US17522104

    申请日：2021-11-09

    Applicant: Seiko Epson Corporation

    Inventor： Haruki Miyasaka ,  Sho Aruga

    IPC: G01J3/50 ,  G01J3/02 ,  G01J3/04 ,  G02B5/28

    CPC classification number: G01J3/50 ,  G01J3/0237 ,  G01J3/04 ,  G02B5/284

    Abstract: A color measurement apparatus includes an incident light processing portion that processes light incident through the opening portion, a light emission portion that emits light toward the measurement target, a first circuit substrate in which the incident light processing portion is disposed, a second circuit substrate in which the light emission portion is disposed, and a frame assembly that is formed of a metal material, and in which the first circuit substrate and the second circuit substrate are disposed, in which the frame assembly includes a main frame that forms a base of the apparatus, a first subframe that holds the first circuit substrate, and a second subframe that holds the second circuit substrate, and the first subframe and the second subframe are in direct or indirect contact with the main frame.

    CURVED-SLIT IMAGING SPECTROMETER
    87.
    发明公开
    CURVED-SLIT IMAGING SPECTROMETER 审中-公开

    公开(公告)号：US20230332953A1

    公开(公告)日：2023-10-19

    申请号：US17636844

    申请日：2020-12-09

    Applicant: SOOCHOW UNIVERSITY

    Inventor： Jiacheng ZHU ,  Qiao PAN ,  Xinhua CHEN ,  Weimin SHEN

    IPC: G01J3/28 ,  G01J3/04 ,  G01J3/02

    CPC classification number: G01J3/2823 ,  G01J3/04 ,  G01J3/021 ,  G01J3/0218

    Abstract: The invention provides a curved-slit imaging spectrometer, wherein a fiber bundle transfers a straight line image of a front objective lens to a curved slit, and the front objective lens doesn't need to have a curved image plane to directly abut the spectrometer, so that the system is less complicated, and the front objective lens and spectrometer have a simple structure. The arc-shaped or approximately arc-shaped curved slit matches the optimum imaging circle of the Offner-type spectrometer, thereby achieving an extra-long slit. The arced slit is 5 to 10 times longer than the straight slit of the classical Offner-type spectrometer. In the case of a compact size, the length of the slit can be greater than 100 mm. Also, the same spectral response function applies in different fields of view while presenting desirable imaging quality.

    ICP EMISSION SPECTROPHOTOMETER
    89.
    发明申请
    ICP EMISSION SPECTROPHOTOMETER 审中-公开

    公开(公告)号：US20180275069A1

    公开(公告)日：2018-09-27

    申请号：US15926097

    申请日：2018-03-20

    Applicant: Hitachi High-Tech Science Corporation

    Inventor： Yutaka Ikku

    IPC: G01N21/73 ,  G01J3/18 ,  G01J3/28 ,  G01J3/443

    CPC classification number: G01N21/73 ,  G01J3/0235 ,  G01J3/04 ,  G01J3/18 ,  G01J3/2823 ,  G01J3/443 ,  G01J2003/045 ,  G01N21/68

    Abstract: An ICP emission spectrophotometer includes an inductively coupled plasma device, a spectroscope, and a computer. The spectroscope includes an incidence window, an incidence side slit, a diffraction grating, an emission window, an emission side slit, and a detector. Measurement conditions including diffraction condition and a measurement result are displayed on a display device. In a case where there are a plurality of diffraction conditions each including a combination of a diffraction grating and a diffraction order for measuring desired diffracted light, comparison information including at least an intensity and a resolution of emitted light in the diffraction condition is displayed on the display device. A measurer selects diffraction conditions in which resolution is higher from among the diffraction conditions, and selects a diffraction condition in which an intensity is obtained from among the selected diffraction conditions.

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