Multipole lens and method of fabricating same
    81.
    发明申请
    Multipole lens and method of fabricating same 失效
    多极透镜及其制造方法

    公开(公告)号:US20070278416A1

    公开(公告)日:2007-12-06

    申请号:US11784698

    申请日:2007-04-09

    Applicant: Eiji Kawai

    Inventor: Eiji Kawai

    Abstract: There is disclosed a multipole lens that can be machined with improved accuracy. A method of fabricating this lens is also disclosed. The multipole lens has a blank material from which polar elements will be fabricated. The blank material is sandwiched vertically between two layers of filmy insulator. The blank material and the two layers of filmy insulator are sandwiched vertically between an upper ring and a lower ring. These members are provided with injection holes for injecting a curing agent. The injection holes of these members are aligned. The curing agent is injected into the holes and cured. Then, the blank material is machined by electric discharge machining to form the polar elements.

    Abstract translation: 公开了可以提高准确度来加工的多极镜头。 还公开了一种制造该透镜的方法。 多极镜头具有制造极性元件的空白材料。 坯料垂直夹在两层薄膜绝缘体之间。 空白材料和两层薄膜绝缘体垂直夹在上环和下环之间。 这些构件设置有用于注入固化剂的注入孔。 这些构件的注入孔对齐。 将固化剂注入孔中并固化。 然后,通过放电加工对坯料进行加工以形成极性元件。

    Particle optical apparatus with a predetermined final vacuum pressure
    83.
    发明申请
    Particle optical apparatus with a predetermined final vacuum pressure 有权
    具有预定最终真空压力的粒子光学装置

    公开(公告)号:US20070176102A1

    公开(公告)日:2007-08-02

    申请号:US11700993

    申请日:2007-01-31

    Abstract: The invention relates to a particle-optical apparatus with a predetermined final vacuum pressure. To that end a vacuum chamber of said apparatus is via a first restriction connected to a volume where vapour or gas is present at a known pressure and via a second restriction to a vacuum pump. By making the ratio of the two conductances, associated with said restrictions, a calibrated ratio, the final pressure of the vacuum chamber is a predetermined final pressure. This eliminates the need for e.g. vacuum gauges and control systems, resulting in a more compact design of such apparatus.

    Abstract translation: 本发明涉及具有预定最终真空压力的粒子光学装置。 为此,所述装置的真空室经由与已知压力下存在蒸气或气体并通​​过第二限制到真空泵的体积连接的第一限制。 通过使与所述限制相关联的两个电导率的比率为校准比率,真空室的最终压力是预定的最终压力。 这消除了对例如 真空计和控制系统,从而使这种设备更加紧凑的设计。

    Method and device for distance measurement
    84.
    发明申请
    Method and device for distance measurement 失效
    距离测量方法和装置

    公开(公告)号:US20070164215A1

    公开(公告)日:2007-07-19

    申请号:US11642249

    申请日:2006-12-20

    Abstract: A method and a device for determining the distance from the sample to be examined to at least one reference point which function independently of the type of sample. A signal is modulated to a first potential of a sample and a primary particle beam is directed at the sample, resulting in a secondary particle beam being formed by an interaction, the particles of this beam having the modulated signal. The particles of the secondary particle beam and the signal modulated to the potential of the particles of the secondary particle beam are detected. By comparing the detected modulated signal to a reference signal, the distance is determined from the relationship between the reference signal and the detected modulated signal. The device has the corresponding components for implementing the method.

    Abstract translation: 一种用于确定从被检测样品到至少一个独立于样品类型起作用的参考点的距离的方法和装置。 信号被调制到样品的第一电位,并且一次粒子束被引导到样品,导致通过相互作用形成二次粒子束,该束的粒子具有调制信号。 检测二次粒子束的粒子和调制到二次粒子束的粒子的电位的信号。 通过将检测到的调制信号与参考信号进行比较,根据参考信号与检测到的调制信号之间的关系确定距离。 该设备具有用于实现该方法的相应组件。

    Charged-particle beam system
    86.
    发明申请
    Charged-particle beam system 有权
    带电粒子束系统

    公开(公告)号:US20070114408A1

    公开(公告)日:2007-05-24

    申请号:US11585049

    申请日:2006-10-23

    Abstract: There is disclosed a charged-particle beam system equipped with a higher-order aberration corrector capable of correcting fifth-order spherical aberration and third-order chromatic aberration such that the primary trajectory of an electron beam is not affected by the strength of a transfer lens. The corrector is so adjusted that the image point of the corrector is located at a position shifted a distance of L0 from the principal plane of an objective lens toward the electron source. The transfer lens is so disposed that the position of the principal plane is coincident with the image point of the corrector. Therefore, the primary trajectory of the electron beam passes through the center of the transfer lens. Consequently, the primary trajectory is not affected by the strength of the transfer lens.

    Abstract translation: 公开了一种装有高次像差校正器的带电粒子束系统,其能够校正五阶球面像差和三阶色差,使得电子束的主轨迹不受转印透镜的强度的影响 。 校正器被调整为使得校正器的像点位于从物镜的主平面向电子源偏移L0的位置处的位置。 转印透镜被布置成使得主平面的位置与校正器的图像点一致。 因此,电子束的主要轨迹通过转印透镜的中心。 因此,主轨迹不受转印透镜强度的影响。

    Sample milling/observing apparatus and method of observing sample
    87.
    发明申请
    Sample milling/observing apparatus and method of observing sample 有权
    样品研磨/观察装置和观察样品的方法

    公开(公告)号:US20060226376A1

    公开(公告)日:2006-10-12

    申请号:US11393692

    申请日:2006-03-31

    Applicant: Akiko Fujii

    Inventor: Akiko Fujii

    CPC classification number: H01J37/3056 H01J37/21 H01J37/3005 H01J2237/28

    Abstract: When a sample is cut to update an observed section, an electron beam is focused on the observed section. An apparatus of the invention includes an ion gun 102 which irradiates an ion beam onto a sample 200 to form an observed section 202, an electron gun 104 which irradiates an electron beam EB onto the observed section 202 formed by the ion gun 102, a focal point adjusting unit 106 which adjusts a relationship between the observed section 202 and a focal point of the electron beam EB, and a focal point control unit 108 which controls the focal point adjusting unit 106 on the basis of an amount of cut of the sample 200 obtained by irradiation of the ion beam IB obtained by the ion gun 102.

    Abstract translation: 当切割样品以更新观察部分时,电子束聚焦在观察部分上。 本发明的装置包括离子枪102,其将离子束照射到样品200上以形成观察部分202,将电子束EB照射到由离子枪102形成的观察部分202上的电子枪104,焦点 点调整单元106,其调整观察部分202和电子束EB的焦点之间的关系;以及焦点控制单元108,其基于样本200的切割量来控制焦点调整单元106 通过照射由离子枪102获得的离子束IB获得。

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