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    Active rectifier
    1.
    发明授权
    Active rectifier 有权
    有源整流器

    公开(公告)号：US08232829B2

    公开(公告)日：2012-07-31

    申请号：US11954050

    申请日：2007-12-11

    Applicant: Andrew Frederick Robinson, III

    Inventor： Andrew Frederick Robinson, III

    IPC: H03K5/08

    CPC classification number: H02M7/217

    Abstract: In accordance with the present invention, the active rectifier is a circuit which directly takes the place of a passive rectifier by using a switching module (or simply a device in cases where a single device is used) controlled by a sensing circuit. Where passive devices have a single knee value determined by the physical properties of the semi-conductive material being used, the active circuit can be designed to a range of knee voltages and other performance criterion. Additional flexibility is available to the designer through the active rectifiers ability to allow for manipulation of the curve of response from the circuit in the knee region. Flexibility both in production, in designs, and in characteristics make the active rectifier highly valuable for engineering firms designing larger electronic circuits.

    Abstract translation: 根据本发明，有源整流器是通过使用由感测电路控制的开关模块（或简单地使用单个装置的情况下的装置）直接取代无源整流器的电路。 在无源器件具有由所使用的半导体材料的物理性质确定的单个膝盖值的情况下，有源电路可被设计为膝盖电压范围和其他性能标准。 通过有源整流器的能力，设计人员可以获得额外的灵活性，从而可以对来自膝盖区域的电路的响应曲线进行操作。 在生产，设计和特性方面的灵活性使得主动整流器对于设计大型电子电路的工程公司非常有价值。

    Charged particle beam performance measurement system and method thereof
    4.
    发明授权
    Charged particle beam performance measurement system and method thereof 失效
    带电粒子束性能测量系统及其方法

    公开(公告)号：US5936252A

    公开(公告)日：1999-08-10

    申请号：US936353

    申请日：1997-09-24

    Applicant: Werner Stickel ,  Christopher Frederick Robinson

    Inventor： Werner Stickel ,  Christopher Frederick Robinson

    IPC: H01J37/304

    CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30433 ,  H01J2237/3175

    Abstract: A charged particle beam performance measurement system includes a charged particle beam generator device for producing a charged particle beam, a test reticle having at least two areas of higher transparency than its surroundings that form a pattern, a reduction projection imaging device, a reference target having an essentially identical pattern as the test reticle, and a beam current detector. A patterned beam is generated by passing the charged particle beam through the pattern areas of the test reticle. The patterned beam is reduced and projected by the reduction projection imaging device and the reduced patterned beam is imaged onto a reference target. The reduced patterned beam is then exposed to the reference target, wherein some of the beam may pass through reference target pattern areas. Beam current detector records and measures the amount of beam current that is absorbed on, back-scattered from, or transmitted by the target reference, and determines from the measured beam current the accuracy of the projection system.

    Abstract translation: 带电粒子束性能测量系统包括用于产生带电粒子束的带电粒子束发生器装置，具有至少两个比其形成图案的周围具有更高透明度的区域的测试掩模版，还原投影成像装置，具有 与测试掩模版基本相同的图案，以及光束电流检测器。 通过使带电粒子束通过测试掩模版的图案区域来产生图案化的束。 图案化的光束被还原投影成像装置减小和投射，并且缩小的图案化光束被成像到参考目标上。 然后将经缩小的图案化的光束暴露于参考目标，其中一些光束可以通过参考目标图案区域。 光束电流检测器记录并测量由目标基准吸收，反向散射或透射的束电流量，并根据测量的束电流确定投影系统的精度。

    Proximity correction dose modulation for E-beam projection lithography
    5.
    发明授权
    Proximity correction dose modulation for E-beam projection lithography 失效
    用于电子束投影光刻的近似校正剂量调制

    公开(公告)号：US5866913A

    公开(公告)日：1999-02-02

    申请号：US878226

    申请日：1997-06-18

    Applicant: Christopher Frederick Robinson

    Inventor： Christopher Frederick Robinson

    IPC: H01J37/30

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/36

    Abstract: A lithographic projection method which comprises projecting radiation along a transmission path and through a lens system and an opaque back focal plane filter for electrons with a transparent aperture for the projected radiation to produce a patterned image and an amount of desired radiation on a target. The transmission path includes a source of radiation of charged particles directed at a target comprising a substrate coated with resist. A pattern-defining mask that contains a plurality of subresolution scattering features thereon to produce the desired degree of scattering of the radiation is placed between the source and the target. The subresolution scattering features vary in density as an direct function of predicted proximity exposure.

    Abstract translation: 一种光刻投影方法，其包括沿着透射路径投射辐射，并通过透镜系统和用于具有用于投影辐射的透明孔的电子的不透光后焦平面滤光器来产生图案化图像和目标上所需辐射的量。 传输路径包括指向包含涂覆有抗蚀剂的基底的靶的带电粒子的辐射源。 在源和目标之间设置包含其上的多个分散散射特征以产生期望的辐射散射的图案定义掩模。 分散散射特征作为预测接近度暴露的直接函数在密度上变化。

    Projection reticle transmission control for coulomb interaction analysis
    9.
    发明授权
    Projection reticle transmission control for coulomb interaction analysis 失效
    用于库仑相互作用分析的投影掩模传输控制

    公开(公告)号：US5751004A

    公开(公告)日：1998-05-12

    申请号：US789675

    申请日：1997-01-24

    Applicant: Christopher Frederick Robinson ,  Werner Stickel

    Inventor： Christopher Frederick Robinson ,  Werner Stickel

    IPC: G03F7/20 ,  H01J37/00 ,  H01J37/305 ,  H01L21/027 ,  H01J37/09

    CPC classification number: H01J37/00 ,  H01J2237/30433 ,  H01J2237/3175

    Abstract: A method and system for studying the effect of electron-electron interaction in an electron beam writing system. First and second test reticles are provided that have different open areas. An electron beam is directed through the first test reticle to form a first pattern on a test surface, and the electron beam is then directed through the second test reticle to form a second pattern on a test surface. Because the open areas of the test reticles differ, the current of the electron beam is different when that beam passes through the first test reticle than when that beam passes through the second test reticle. The resolution of the first formed pattern is compared with the resolution of the second formed pattern to assess the effect of the different currents of the electron beam on the resolutions of the formed patterns.

    Abstract translation: 一种用于研究电子束写入系统中电子 - 电子相互作用效应的方法和系统。 提供具有不同开放面积的第一和第二测试标线。 电子束被引导通过第一测试掩模版以在测试表面上形成第一图案，然后电子束被引导通过第二测试光罩以在测试表面上形成第二图案。 由于测试光罩的开放区域不同，当光束通过第一测试光罩时，电子束的电流不同于当光束通过第二测试光罩时。 将第一形成图案的分辨率与第二形成图案的分辨率进行比较，以评估电子束的不同电流对形成的图案的分辨率的影响。

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