公开(公告)号：US06946654B2

公开(公告)日：2005-09-20

申请号：US09840558

申请日：2001-04-23

Applicant: Robert L. Gerlach ,  Karel D. van der Mast ,  Michael R. Scheinfein

Inventor： Robert L. Gerlach ,  Karel D. van der Mast ,  Michael R. Scheinfein

IPC: H01J37/252 ,  G01Q10/04 ,  G01Q30/02 ,  G01Q30/04 ,  H01J37/141 ,  H01J37/244 ,  H01J37/28 ,  G01N23/00 ,  G21K7/00

CPC classification number: H01J37/141 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485

Abstract: A high resolution scanning electron microscope collects secondary Auger electrons through its objective lens to sensitively determine the chemical make-up with extremely fine positional resolution. The system uses a magnetic high resolution objective lens, such as a snorkel lens or a dual pole magnetic lens which provides an outstanding primary electron beam performance. The Auger electrons are deflected from the path of the primary beam by a transfer spherical capacitor. The primary beam is shielded, by a tube or plates, as it traverses the spherical capacitor to prevent aberration of the primary beam and the external wall of the shield maintains a potential gradient related to that of the spherical capacitor to reduce aberration of the primary electron beam. The coaxial configuration of the primary electron beam and the collected secondary electron beam allows the Auger image to coincide with the SEM view.

Abstract translation: 高分辨率扫描电子显微镜通过其物镜收集次级俄歇电子，以非常精细的位置分辨率灵敏地确定化学成分。 该系统使用磁性高分辨率物镜，例如浮潜透镜或提供优异的一次电子束性能的双极磁性透镜。 俄歇电子通过转移球形电容器从主光束的路径偏转。 主梁被穿过球形电容器时被管或屏蔽屏蔽，以防止主光束的像差，并且屏蔽的外壁保持与球形电容器相关的电位梯度，以减少初级电子的像差 光束。 一次电子束和收集的二次电子束的同轴配置允许俄歇图与SEM视图一致。

公开(公告)号：US20110064191A1

公开(公告)日：2011-03-17

申请号：US12853998

申请日：2010-08-10

Applicant: Milos Toth ,  Michael R. Scheinfein ,  Eric Silver ,  David Narum

Inventor： Milos Toth ,  Michael R. Scheinfein ,  Eric Silver ,  David Narum

IPC: G01N23/083

CPC classification number: G01N23/20033 ,  H01J37/244 ,  H01J37/256 ,  H01J2237/2442

Abstract: An improved microcalorimeter-type energy dispersive x-ray spectrometer provides sufficient energy resolution and throughput for practical high spatial resolution x-ray mapping of a sample at low electron beam energies. When used with a dual beam system that provides the capability to etch a layer from the sample, the system can be used for three-dimensional x-ray mapping. A preferred system uses an x-ray optic having a wide-angle opening to increase the fraction of x-rays leaving the sample that impinge on the detector and multiple detectors to avoid pulse pile up.

Abstract translation: 改进的微量热计式能量色散X射线光谱仪为低电子束能量下样品的实际高空间分辨率X射线成像提供了足够的能量分辨率和通量。 当与提供从样品中蚀刻层的能力的双光束系统一起使用时，该系统可用于三维x射线映射。 优选的系统使用具有广角开口的x射线光学器件来增加离开检测器的样品的X射线的分数，以及多个检测器以避免脉冲堆积。

公开(公告)号：US07372195B2

公开(公告)日：2008-05-13

申请号：US11286802

申请日：2005-11-22

Applicant: Steven T. Coyle ,  Michael R. Scheinfein ,  William J. Devore

Inventor： Steven T. Coyle ,  Michael R. Scheinfein ,  William J. Devore

IPC: H01J27/02 ,  H01J27/26

CPC classification number: H01J37/065 ,  H01J37/143 ,  H01J2237/06316 ,  H01J2237/06341

Abstract: An electron beam source for use in an electron gun. The electron beam source includes an emitter terminating in a tip. The emitter is configured to generate an electron beam. The electron beam source further includes a suppressor electrode laterally surrounding the emitter such that the tip of the emitter protrudes through the suppressor electrode and an extractor electrode disposed adjacent the tip of the emitter. The extractor electrode comprises a magnetic disk whose magnetic field is aligned with an axis of the electron beam.

Abstract translation: 一种用于电子枪的电子束源。 电子束源包括终端在尖端中的发射器。 发射极被配置为产生电子束。 电子束源还包括横向围绕发射器的抑制电极，使得发射极的尖端突出通过抑制电极和与发射极的顶端相邻设置的提取电极。 提取器电极包括其磁场与电子束的轴线对齐的磁盘。

公开(公告)号：US06900447B2

公开(公告)日：2005-05-31

申请号：US10635228

申请日：2003-08-06

Applicant: Robert L. Gerlach ,  Mark W. Utlaut ,  Michael R. Scheinfein

Inventor： Robert L. Gerlach ,  Mark W. Utlaut ,  Michael R. Scheinfein

IPC: H01J37/12 ,  G01N23/00 ,  G21K7/00 ,  H01J37/05 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/12 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/12 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.

Abstract translation: 包括同轴聚焦离子束和电子束的系统允许使用由电子束形成的图像利用FIB进行精确的处理。 在一个实施例中，偏转器将电子束偏转到离子束的轴上，并将通过最终透镜收集的二次粒子偏转到检测器。 在一个实施例中，正偏置的最终静电透镜使用相同的电压对两个光束进行聚焦，以允许同时或交替的FIB和SEM操作。 在一个实施例中，可以改变电子的着陆能量而不改变工作距离。

公开(公告)号：US08357894B2

公开(公告)日：2013-01-22

申请号：US12853998

申请日：2010-08-10

Applicant: Milos Toth ,  Michael R. Scheinfein ,  Eric Silver ,  David Narum

Inventor： Milos Toth ,  Michael R. Scheinfein ,  Eric Silver ,  David Narum

IPC: G21K5/04

CPC classification number: G01N23/20033 ,  H01J37/244 ,  H01J37/256 ,  H01J2237/2442

Abstract: An improved microcalorimeter-type energy dispersive x-ray spectrometer provides sufficient energy resolution and throughput for practical high spatial resolution x-ray mapping of a sample at low electron beam energies. When used with a dual beam system that provides the capability to etch a layer from the sample, the system can be used for three-dimensional x-ray mapping. A preferred system uses an x-ray optic having a wide-angle opening to increase the fraction of x-rays leaving the sample that impinge on the detector and multiple detectors to avoid pulse pile up.

Abstract translation: 改进的微量热计式能量色散X射线光谱仪为低电子束能量下样品的实际高空间分辨率X射线成像提供了足够的能量分辨率和通量。 当与提供从样品中蚀刻层的能力的双光束系统一起使用时，该系统可用于三维x射线映射。 优选的系统使用具有广角开口的x射线光学器件来增加离开检测器的样品的X射线的分数，以及多个检测器以避免脉冲堆积。

公开(公告)号：US07504623B2

公开(公告)日：2009-03-17

申请号：US11523979

申请日：2006-09-20

Applicant: Paul E. Fischione ,  David W. Smith ,  Michael R. Scheinfein ,  Joseph M. Matesa ,  Thomas C. Swihart ,  David Martin

Inventor： Paul E. Fischione ,  David W. Smith ,  Michael R. Scheinfein ,  Joseph M. Matesa ,  Thomas C. Swihart ,  David Martin

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/305 ,  H01J2237/0822 ,  H01J2237/30477 ,  H01J2237/3174 ,  H01J2237/31745

Abstract: A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.

Abstract translation: 公开了用于通过使用离子轰击制备显微镜试样或其它表面科学应用的研磨装置。 该设备提供了通过使用高能量和低能量离子源来利用样品表面的粗略和细微改性的能力。 由离子源产生的冲击波束内的样本位置的精确控制提供了使样本相对于其倾斜和旋转的能力。 位置控制还允许在程序化控制下和在一致的真空条件下在各种来源之间移动样品。 还提供了一种装载锁定机构，以允许将样品引入装置中而不会损失真空，并且能够在这种加载和卸载操作期间将样品返回到环境温度。 可以在所有活动期间观察和成像样本。

公开(公告)号：US07132673B2

公开(公告)日：2006-11-07

申请号：US10903657

申请日：2004-07-30

Applicant: Paul E. Fischione ,  David W. Smith ,  Michael R. Scheinfein ,  Joseph M. Matesa ,  Thomas C. Swihart ,  David Martin

Inventor： Paul E. Fischione ,  David W. Smith ,  Michael R. Scheinfein ,  Joseph M. Matesa ,  Thomas C. Swihart ,  David Martin

IPC: H01J37/08

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/305 ,  H01J2237/0822 ,  H01J2237/30477 ,  H01J2237/3174 ,  H01J2237/31745

Abstract: A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.