公开(公告)号：US20250006454A1

公开(公告)日：2025-01-02

申请号：US18292070

申请日：2021-09-29

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta IMAI ,  Teruo KOHASHI ,  Junichi KATANE

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

Abstract: A charged particle beam device includes: a charged particle source configured to generate a charged particle beam; a scanning unit configured to scan a sample while deflecting the charged particle beam; a detector configured to detect secondary particles emitted from the sample and output a detection signal; and a control unit configured to generate an observation image of the sample based on the detection signal. The control unit generates a mixed-condition image, in which detection signals under different detection conditions are mixed in a single image, by changing a detection condition of the detector for each pixel in a process of scanning the sample, and uses the mixed-condition image to restore a single-condition image which is an image for each detection condition.

公开(公告)号：US20230230799A1

公开(公告)日：2023-07-20

申请号：US17928691

申请日：2020-07-14

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta IMAI ,  Junichi KATANE

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J37/265 ,  H01J2237/226 ,  H01J2237/24578

Abstract: Provided is a sample image observation device including an SEM and a control system configured to control the SEM. An observation region of a sample is divided into a plurality of sections, and restoration processing is performed on an image which is acquired by irradiating each section with a sparse electron beam, based on scanning characteristics in the section. A reduction in quality of a restored image due to a beam irradiation position deviation caused by a scanning response is prevented and restoration with high accuracy and high throughput under a condition for preventing sample damage is possible.

公开(公告)号：US20230377829A1

公开(公告)日：2023-11-23

申请号：US18363284

申请日：2023-08-01

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta IMAI ,  Masahiro SASAJIMA ,  Yoshihiro TAKAHOKO

IPC: H01J37/145 ,  H01J37/15 ,  H01J37/21

CPC classification number: H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/12

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

公开(公告)号：US20210151279A1

公开(公告)日：2021-05-20

申请号：US17056993

申请日：2018-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta IMAI ,  Masahiro SASAJIMA ,  Yoshihiro TAKAHOKO

IPC: H01J37/145 ,  H01J37/21 ,  H01J37/15

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

公开(公告)号：US20240222065A1

公开(公告)日：2024-07-04

申请号：US18556927

申请日：2021-06-04

Applicant: Hitachi High- Tech Corporation

Inventor： Yuta IMAI ,  Daisuke BIZEN ,  Junichi KATANE

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/224 ,  H01J37/28

Abstract: To provide a sample image observation device and a method that restore an image based on a sparsely sampled image and that can improve observation throughput and usability by maintaining a restored image quality constant regardless of a change in an observation condition. In a sample image observation device that irradiates a part of an observation area of the sample 19 with an electron beam and restores an image including a pixel not irradiated with the electron beam, the control system 22 includes a storage unit configured to store a correlation between an irradiation condition of irradiating the observation area of the sample with the electron beam and an observation condition of the sample, a control unit configured to synchronize an irradiation proportion of the electron beam with the observation condition based on the correlation, and an input unit configured to input sample information on the sample.

公开(公告)号：US20220254597A1

公开(公告)日：2022-08-11

申请号：US17617379

申请日：2019-07-02

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Yuta IMAI ,  Junichi KATANE

IPC: H01J37/141 ,  H01J37/244 ,  H01J37/28

Abstract: The invention provides a charged particle beam device that prevents a leakage of an unnecessary magnetic field to a trajectory of a charged particle beam with which a sample is irradiated in a sample observation according to a boosting method. The charged particle beam device includes: a charged particle source configured to generate the charged particle beam with which the sample is irradiated; an object lens configured to generate the magnetic field for focusing the charged particle beam; and a boosting electrode that is provided inside the object lens and to which a voltage for accelerating the charged particle beam is applied. The boosting electrode is formed of a magnetic material.

公开(公告)号：US20210296081A1

公开(公告)日：2021-09-23

申请号：US17056285

申请日：2018-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta IMAI ,  Masahiro SASAJIMA ,  Yoshihiro TAKAHOKO

IPC: H01J37/145 ,  H01J37/244 ,  H01J37/20 ,  H01J37/28 ,  H01J37/26

Abstract: In a charged particle beam device including a deceleration optical system, a change in a deceleration electric field and an axis shift due to a structure between an objective lens and a sample are prevented to reduce adverse effects on an irradiation system and detection system. The charged particle beam device includes an electron source, an objective lens configured to focus a probe electron beam from the electron source on the sample, an acceleration electrode configured to accelerate the probe electron beam, a first detector provided in the acceleration electrode, a deceleration electrode configured to form a deceleration electric field for the probe electron beam with the acceleration electrode, the probe electron beam being configured to pass through an opening of the deceleration electrode, and a second detector inserted between the deceleration electrode and the sample. The second detector includes an opening portion larger than the opening of the deceleration electrode, and a sensing surface is provided around the opening portion.

公开(公告)号：US20210217580A1

公开(公告)日：2021-07-15

申请号：US17058259

申请日：2018-06-12

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Kazuo OOTSUGA ,  Yuta IMAI ,  Tsunenori NOMAGUCHI

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244

Abstract: A charged particle beam device includes: a charged particle beam source configured to generate a charged particle beam with which a sample is irradiated; a charged particle detection unit configured to detect a charged particle generated when the sample is irradiated with the charged particle beam; an intensity data generation unit configured to generate intensity data of the charged particle detected by the charged particle detection unit; a pulse-height value data generation unit configured to generate pulse-height value data of the charged particle detected by the charged particle detection unit; and an output unit configured to output a first image of the sample based on the intensity data and a second image of the sample based on the pulse-height value data.