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公开(公告)号：US20180217036A1
公开(公告)日：2018-08-02
申请号：US15747517
申请日：2016-08-16
Applicant: IAS Inc.
Inventor： Katsuhiko Kawabata , Tatsuya Ichinose , Hayashi Takuma
CPC classification number: G01N1/4044 , G01N1/28 , G01N1/32 , G01N27/62 , H01L21/67017 , H01L21/67034 , H01L21/67069 , H01L21/67253 , H01L21/6773 , H01L21/67742 , H01L21/68
Abstract: A silicon substrate analyzing device with which impurities such as trace metals in a silicon substrate having a thick nitride film or oxide film formed on a silicon substrate surface can be analyzed with a high precision by ICP-MS. The silicon substrate analyzing device includes a load port, a substrate transportation robot, an aligner, a drying chamber, a gas-phase decomposition chamber, an analysis scan port having an analysis stage and a substrate analyzing nozzle, an analysis liquid collecting means, and an analysis means for performing inductively coupled plasma mass spectrometry. The silicon substrate having an oxide film or a nitride film formed on the silicon substrate is subjected to scanning the surface of the silicon substrate with a high-concentration recovered liquid with use of the substrate analyzing nozzle so that the high-concentration recovered liquid is recovered. The recovered high-concentration recovered liquid is discharged onto the surface of the silicon substrate and then heated and dried. The surface of the silicon substrate is scanned with the analysis liquid so that the impurities are recovered, and the analysis liquid is analyzed by ICP-MS.
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公开(公告)号：US10151727B2
公开(公告)日：2018-12-11
申请号：US15322389
申请日：2015-07-21
Applicant: IAS Inc. , Shin-Etsu Handotai Co., Ltd.
Inventor： Katsuhiko Kawabata , Tatsuya Ichinose , Toshihiko Imai
Abstract: An object of the present invention is to provide an analysis apparatus in which local analysis of a substrate with ICP-MS is automated. The present invention relates to an automatic analysis apparatus for a local region of a substrate, including: a nozzle for local analysis having: analysis-liquid supply means that ejects analysis liquid onto a substrate; analysis-liquid discharge means that takes the analysis liquid including an object to be analyzed from the substrate into the nozzle to feed the analysis liquid to a nebulizer; and exhaust means including an exhaust channel in the nozzle; automatic liquid-feed means that automatically feeds the collected analysis liquid to ICP-MS; flow adjustment means that adjusts the flow of the analysis liquid; and automatic control means that simultaneously performs local analysis and analysis of the object to be analyzed with the ICP-MS to perform automatic analysis to a plurality of adjacent predetermined regions, successively.
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公开(公告)号：US10024801B2
公开(公告)日：2018-07-17
申请号：US15540320
申请日：2016-08-16
Applicant: IAS Inc.
Inventor： Katsuhiko Kawabata , Tatsuya Ichinose , Mitsumasa Ikeuchi
Abstract: The present invention relates to an analysis system capable of online transferring an analysis sample and promptly acquiring an analysis result. The analysis system capable of analyzing the analysis samples supplied from at least two sites, with one analysis apparatus, and requiring no cleaning process for a nebulizer and a spray chamber, is provided. The present invention relates to analysis system including at least two sample individually transferring units. Each sample transferring path of the sample individually transferring units is coupled to a plasma torch of a common analysis unit including the one analysis apparatus with inductively-coupled plasma or microwave plasma. Each sample transferring path has a main flow path, a makeup gas supply path, and a drain flow path. The plasma torch has a sample introducing pipe that introduces the atomized analysis sample, provided at a substantially center. The inner diameter of the drain flow path is equivalent to or larger than the inner diameter of an inlet portion of the sample introducing pipe of the plasma torch.
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Patent Agency Ranking
4.发明授权公开(公告)号：US11569081B2
公开(公告)日：2023-01-31
申请号：US17043406
申请日：2019-08-29
Applicant: IAS Inc.
Inventor： Katsuhiko Kawabata , Tatsuya Ichinose , Kohei Nishiguchi
IPC: H01J49/00 , G01N27/623 , G01N27/626 , H01J49/10 , H01J49/04
Abstract: The present invention provides a method for analyzing a sample containing metal fine particles with an inductive coupling plasma mass spectrometer. The method enables analysis of the sample without the need of standard metal fine particles. Specifically, the present invention relates to a method for analyzing metal fine particles in liquid by use of an inductive coupling plasma mass spectrometer. In the method, the analysis apparatus is provided with a standard solution introduction apparatus including a standard solution storage unit for storing a standard solution containing a specific element in a known concentration, a syringe pump for suctioning and discharging the standard solution, and a solution introduction unit having a standard solution nebulizer and a standard solution spray chamber that are supplied with the standard solution, the standard solution is directly supplied to the standard solution nebulizer at a flow rate of 3 μL/min or less.
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公开(公告)号：US20170160233A1
公开(公告)日：2017-06-08
申请号：US15322389
申请日：2015-07-21
Applicant: IAS Inc. , Shin-Etsu Handotai Co., Ltd.
CPC classification number: G01N27/62 , B01L3/0203 , B01L3/0293 , B01L2400/022 , G01N1/00 , G01N1/28 , G01N1/32 , G01N35/10 , G01N35/1002 , G01N35/1016 , G01N35/1095 , H01J49/045 , H01J49/105
Abstract: An object of the present invention is to provide an analysis apparatus in which local analysis of a substrate with ICP-MS is automated. The present invention relates to an automatic analysis apparatus for a local region of a substrate, including: a nozzle for local analysis having: analysis-liquid supply means that ejects analysis liquid onto a substrate; analysis-liquid discharge means that takes the analysis liquid including an object to be analyzed from the substrate into the nozzle to feed the analysis liquid to a nebulizer; and exhaust means including an exhaust channel in the nozzle; automatic liquid-feed means that automatically feeds the collected analysis liquid to ICP-MS; flow adjustment means that adjusts the flow of the analysis liquid; and automatic control means that simultaneously performs local analysis and analysis of the object to be analyzed with the ICP-MS to perform automatic analysis to a plurality of adjacent predetermined regions, successively.
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6.发明公开公开(公告)号：US20230335387A1
公开(公告)日：2023-10-19
申请号：US18084978
申请日：2022-12-20
Applicant: IAS Inc.
Inventor： Katsuhiko Kawabata , Tatsuya Ichinose , Kohei Nishiguchi
IPC: H01J49/10 , G01N27/623 , H01J49/00 , H01J49/04
CPC classification number: H01J49/105 , G01N27/623 , H01J49/0009 , H01J49/04
Abstract: A method for analyzing a sample containing metal fine particles with an inductively coupled plasma mass spectrometer. The method enables analysis of the sample without the need of standard metal fine particles. Specifically, the present invention relates to a method for analyzing metal fine particles in liquid by use of an inductively coupled plasma mass spectrometer. In the method, the analysis apparatus is provided with a standard solution introduction apparatus including a standard solution storage unit for storing a standard solution containing a specific element in a known concentration, a syringe pump for suctioning and discharging the standard solution, and a solution introduction unit having a standard solution nebulizer and a standard solution spray chamber that are supplied with the standard solution, the standard solution is directly supplied to the standard solution nebulizer at a flow rate of 3 μL/min or less.
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公开(公告)号：US20190013248A1
公开(公告)日：2019-01-10
申请号：US15750566
申请日：2016-10-25
Applicant: IAS INC.
Inventor： Katsuhiko Kawabata , Sungjae Lee , Tatsuya Ichinose
Abstract: Provided is a nozzle for substrate analysis with a simple structure, which enables analysis to be reliably performed without leaking an analysis liquid when a substrate having high hydrophilicity is scanned with the analysis liquid. The nozzle for analysis of a substrate according to the present invention includes: a double pipe including a nozzle main body that discharges and suctions an analysis liquid, and an outer pipe disposed on the outer periphery of the nozzle main body so as to surround the scanning analysis liquid; exhaust means having an exhaust path between the nozzle main body and the outer pipe; and a gas spraying pipe for spraying an inert gas to the tip of the nozzle main body in a direction substantially parallel to a substrate surface, the gas spraying pipe being disposed on the outer periphery of the tip of the outer pipe and on a side opposite to a scanning direction of the nozzle.
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公开(公告)号：US20180024068A1
公开(公告)日：2018-01-25
申请号：US15540320
申请日：2016-08-16
Applicant: IAS Inc.
Inventor： Katsuhiko Kawabata , Tatsuya Ichinose , Mitsumasa Ikeuchi
CPC classification number: G01N21/68 , G01N21/714 , G01N21/73 , G01N21/85 , G01N27/62 , G01N2001/002 , G01N2001/1006 , G01N2021/8411 , H01J49/105
Abstract: The present invention relates to an analysis system capable of online transferring an analysis sample and promptly acquiring an analysis result. The analysis system capable of analyzing the analysis samples supplied from at least two sites, with one analysis apparatus, and requiring no cleaning process for a nebulizer and a spray chamber, is provided. The present invention relates to analysis system including at least two sample individually transferring units. Each sample transferring path of the sample individually transferring units is coupled to a plasma torch of a common analysis unit including the one analysis apparatus with inductively-coupled plasma or microwave plasma. Each sample transferring path has a main flow path, a makeup gas supply path, and a drain flow path. The plasma torch has a sample introducing pipe that introduces the atomized analysis sample, provided at a substantially center. The inner diameter of the drain flow path is equivalent to or larger than the inner diameter of an inlet portion of the sample introducing pipe of the plasma torch.
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