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    Electron Microscope
    1.
    发明申请
    Electron Microscope 审中-公开

    公开(公告)号：US20190272971A1

    公开(公告)日：2019-09-05

    申请号：US16289872

    申请日：2019-03-01

    Applicant: JEOL Ltd.

    Inventor： Shigeyuki Morishita ,  Takeo Sasaki ,  Tomohiro Nakamichi

    IPC: H01J37/153 ,  H01J37/26 ,  G01M11/02

    Abstract: An electron microscope includes: an optical system including an aberration correction device; and a control unit that controls the aberration correction device, wherein the control unit performs: processing for displaying, on a display unit, an image for designating a direction of aberration in superposition on an aberration pattern representing a state of aberration, processing for specifying the direction of aberration from the image that has been subjected to a rotation operation, and processing for controlling the aberration correction device to cause the aberration correction device to introduce an aberration in the specified direction.

    Charged Particle Beam Apparatus and Control Method for Charged Particle Beam Apparatus
    2.
    发明公开
    Charged Particle Beam Apparatus and Control Method for Charged Particle Beam Apparatus 审中-公开

    公开(公告)号：US20230290607A1

    公开(公告)日：2023-09-14

    申请号：US18120617

    申请日：2023-03-13

    Applicant: JEOL Ltd.

    Inventor： Takeo Sasaki ,  Kanako Noguchi ,  Kazuki Yagi

    IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

    CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265

    Abstract: A charged particle beam apparatus for scanning a specimen with a charged particle beam and acquiring a scan image. The charged particle beam apparatus including: an optical system that includes a pulse mechanism for illuminating the specimen with pulses of the charged particle beam, and a deflector that deflects the charged particle beam and scans the specimen with the deflected charged particle beam; and a control unit that controls the optical system. The control unit controls the optical system so as to satisfy T = n × t (n is a natural number). T represents a dwell time of the charged particle beam in each pixel of the scan image, and t represents a cycle of pulses of the charged particle beam.

    METHOD FOR AXIAL ALIGNMENT OF CHARGED PARTICLE BEAM AND CHARGED PARTICLE BEAM SYSTEM
    3.
    发明申请
    METHOD FOR AXIAL ALIGNMENT OF CHARGED PARTICLE BEAM AND CHARGED PARTICLE BEAM SYSTEM 有权
    充电粒子束和充电粒子束系统的轴向对准方法

    公开(公告)号：US20140367585A1

    公开(公告)日：2014-12-18

    申请号：US14469898

    申请日：2014-08-27

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Takeo Sasaki

    IPC: H01J37/147 ,  H01J37/153

    CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/103 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/262

    Abstract: A method for axial alignment of a charged particle beam relative to at least three stages of multipole elements and a charged particle beam system capable of making the axial alignment. Some parts of the orbit of the beam or the distributions of three astigmatic fields, or both, are simultaneously translated in a direction perpendicular to the optical axis such that astigmatisms of the same order and same type due to axial deviations between successive ones of the astigmatic fields cancel.

    Abstract translation: 一种用于相对于多极元件的至少三级的带电粒子束和能够进行轴向对准的带电粒子束系统的轴向对准的方法。 光束轨道的一些部分或三个散光场或两者的分布在垂直于光轴的方向上同时平移，使得由于像散的连续散射之间的轴向偏差而具有相同阶数和相同类型的像散 字段取消。

    Electron microscope
    5.
    发明授权
    Electron microscope 有权

    公开(公告)号：US10720302B2

    公开(公告)日：2020-07-21

    申请号：US16289872

    申请日：2019-03-01

    Applicant: JEOL Ltd.

    Inventor： Shigeyuki Morishita ,  Takeo Sasaki ,  Tomohiro Nakamichi

    IPC: H01J37/26 ,  H01J37/153 ,  H01J37/22

    Abstract: An electron microscope includes: an optical system including an aberration correction device; and a control unit that controls the aberration correction device, wherein the control unit performs: processing for displaying, on a display unit, an image for designating a direction of aberration in superposition on an aberration pattern representing a state of aberration, processing for specifying the direction of aberration from the image that has been subjected to a rotation operation, and processing for controlling the aberration correction device to cause the aberration correction device to introduce an aberration in the specified direction.

    Charged Particle Beam System
    6.
    发明申请
    Charged Particle Beam System 审中-公开
    带电粒子束系统

    公开(公告)号：US20160013012A1

    公开(公告)日：2016-01-14

    申请号：US14668060

    申请日：2015-03-25

    Applicant: JEOL Ltd.

    Inventor： Takeo Sasaki

    IPC: H01J37/04 ,  H01J37/10 ,  H01J37/26

    CPC classification number: H01J37/045 ,  H01J37/10 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/15 ,  H01J2237/2802

    Abstract: A charged particle beam system has a charged particle beam source (110) for producing a charged particle beam (EB), a beam blanker (1) and a sample stage (130) on which a sample (S) is held. The sample (S) is irradiated with the beam (EB) passed through the beam blanker (1). The beam blanker (1) has a multistage deflector assembly (20) and a first apertured portion (30). Multiple stages of deflectors (20a, 20b, 20c) for deflecting the beam (EB) are arranged in the multistage deflector assembly (20). The first apertured portion (30) is disposed between the first stage of deflector (20a) and the second stage of deflector (20b) of the deflector assembly (20). The beam (EB) which has passed through the first aperture portion (30) after being deflected by the first stage of deflector (20a) is deflected back to an optical axis (OA) by the second and subsequent stages of deflectors (20a, 20b).

    Abstract translation: 带电粒子束系统具有用于产生带电粒子束（EB）的带电粒子束源（110），保持样品（S）的束消除器（1）和样品台（130）。 用通过光束消除器（1）的光束（EB）照射样品（S）。 光束消除器（1）具有多级偏转器组件（20）和第一有孔部分（30）。 用于偏转梁（EB）的多级偏转器（20a，20b，20c）布置在多级偏转器组件（20）中。 第一有孔部分（30）设置在偏转器组件（20）的偏转器（20a）的第一级和偏转器（20b）的第二级之间。 在偏转器（20a）的第一级偏转之后通过第一开口部分（30）的光束（EB）被第二和随后的偏转器（20a，20b）偏转回到光轴（OA） ）。

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