公开(公告)号：EP0698230A4

公开(公告)日：1995-10-24

申请号：EP94900495

申请日：1993-10-29

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  BREYTA GREGORY ,  DIPIETRO RICHARD ANTHONY ,  ITO HIROSHI ,  KNORS CHRISTOPHER JOHN ,  KWONG RANEE WAI-LING ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SACHDEV HARBANS SINGH ,  WELSH KEVIN MICHAEL

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C5/16 ,  G03F7/029

CPC classification number: G03F7/039

Abstract: Resists for use in ultraviolet, electron beam and x-ray exposure devices comprising a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate esters or benzenesulfonyloxy esters of N-hydroxyimides.

公开(公告)号：DE69227210T2

公开(公告)日：1999-06-02

申请号：DE69227210

申请日：1992-02-11

Applicant: IBM

Inventor： CORNETT KATHLEEN MARIE ,  HEFFERON GEORGE JOSEPH ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/16 ,  H01L21/027

公开(公告)号：DE69125745T2

公开(公告)日：1997-11-13

申请号：DE69125745

申请日：1991-01-25

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  KNORS CHRISTOPHER JOHN ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  WELSH KEVIN MICHAEL

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE69227210D1

公开(公告)日：1998-11-12

申请号：DE69227210

申请日：1992-02-11

Applicant: IBM

Inventor： CORNETT KATHLEEN MARIE ,  HEFFERON GEORGE JOSEPH ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/16 ,  H01L21/027

公开(公告)号：DE69027799T2

公开(公告)日：1997-01-23

申请号：DE69027799

申请日：1990-02-02

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  KNORS CHRISTOPHER JOHN ,  KWONG RANEE WAI-LING ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: Resists for use in photon, electron beam and x-ray exposure devices comprise a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate salts of imides.

公开(公告)号：DE69228358T2

公开(公告)日：1999-09-23

申请号：DE69228358

申请日：1992-10-23

Applicant: IBM

Inventor： KNORS CHRISTOPHER JOHN ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SMITH RANDOLPH JOSEPH

IPC: G03F7/022 ,  H01L21/027

Abstract: Positive photoresist compositions and methods using the photoresist compositions for making submicron patterns in the production of semiconductor devices are disclosed. The photoresists contain sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.

公开(公告)号：DE69228358D1

公开(公告)日：1999-03-18

申请号：DE69228358

申请日：1992-10-23

Applicant: IBM

Inventor： KNORS CHRISTOPHER JOHN ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SMITH RANDOLPH JOSEPH

IPC: G03F7/022 ,  H01L21/027

Abstract: Positive photoresist compositions and methods using the photoresist compositions for making submicron patterns in the production of semiconductor devices are disclosed. The photoresists contain sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.

公开(公告)号：DE69125745D1

公开(公告)日：1997-05-28

申请号：DE69125745

申请日：1991-01-25

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  KNORS CHRISTOPHER JOHN ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  WELSH KEVIN MICHAEL

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE69027799D1

公开(公告)日：1996-08-22

申请号：DE69027799

申请日：1990-02-02

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  KNORS CHRISTOPHER JOHN ,  KWONG RANEE WAI-LING ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: Resists for use in photon, electron beam and x-ray exposure devices comprise a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate salts of imides.