Abstract:
PURPOSE: A method for fabricating epi-layer of an InGaAsP/InP ridge waveguide phase modulator having high phase modulation efficiency is provided to reduce the manufacturing cost and enhance the reliability by using a semiconductor including chemical compounds of a third and a fourth group. CONSTITUTION: A first cladding layer(20) of N-InP is formed on an N¬+-Inp substrate(10). A first waveguide layer(30) of n-InGaAsP and a second waveguide layer(40) of p-InGaAsP are formed on the first cladding layer sequentially. A second cladding layer(50) of P-InP and a third cladding layer(60) of P-InP are sequentially formed on the second waveguide layer. A p+-InGaAs electrode layer(70) is formed on the third cladding layer.
Abstract:
PURPOSE: A sample fixing apparatus for adhering a semiconductor wafer is provided to adhere various kinds of wafers within a wide range of temperature by using four blocks and three combination bolts. CONSTITUTION: A holder(30) includes a loading part on which a wafer sample(40) is loaded. Bolt holes are formed at the holder in order to fix the wafer sample. A lower substrate(50) is located at a lower part of the holder. Bolt holes are formed at the lower substrate in order to fix the wafer sample. A pressing member(20) is located at an upper part of the wafer sample and is projected to an upper part of the holder. An upper substrate(10) is in contact with a projected part of the pressing member. Bolt holes are formed at the upper substrate in order to fix sample. A plurality of combination bolts(60) are inserted into each hole of the holder, the lower substrate, and the upper substrate.
Abstract:
PURPOSE: A method for measuring a sectional reflexibility of a field absorption type device is provided to measure easily an optical variable by using an optical current. CONSTITUTION: A lens type fiber(21) transfers a laser beam emitted from a variable wavelength laser(10). The laser beam passing through the lens type filter(21) is irradiated on a section of a device(15). A chopper(11) turns on or off the variable wavelength laser(10). An optical rotator(14) is formed at a position adjacent to a polarization controller(13) in order to control a path of the laser beam. An optical detector(16) is connected with the optical rotator(14) in order to measure a change of reflective intensity of a reflected beam. A lock-in amplifier(17) is connected with the chopper(11) in order to detect a modulated variable wavelength laser beam. A power supply(18) supplies power to each component. A voltage separator(18) separates a signal influence between the device(15) and the lock-in amplifier(17).
Abstract:
본 발명은 반도체 광증폭기를 이용한 전광 XOR 논리소자의 구현방법에 관한 것으로서, 더 상세하게는 반도체 광증폭기에 주입되는 전류와 입사되는 조사신호 및 펌프신호로 조절이 가능한 반도체 광증폭기의 인버터 특성을 이용하여 전광 XOR 논리소자를 구현할 수 있는 기술에 관한 것이다. 본 발명에 따른 XOR 논리소자의 구현방법은, 두개의 반도체 광증폭기에 펌프신호와 조사신호를 같이 입사시켜 상기 반도체 광증폭기의 이득포화와 파장변환에 의해 생기는 인버터 특성의 출력신호를 합하여 전광 XOR 논리소자의 동작특성을 얻음을 특징으로 한다. 본 발명에 의하면, 반도체 광증폭기의 인버터 특성을 이용하여 전광 XOR 논리소자를 구현하기 때문에 광섬유에 기반을 둔 소자들보다 안정적이고 다른 논리소자와의 결합이 용이하며, 클록 신호를 만들어 줄 필요가 없으므로 논리소자의 규모 및 속도 제한이 크게 줄어드는 효과가 있다.
Abstract:
PURPOSE: A mounting technology of a semiconductor optical device for anti-reflection coating is provided to perform the mounting technology in a stable and identical condition by preventing a sample from damaging in the anti-reflection coating. CONSTITUTION: A spacer(20), a fixing plate(30) and the second stainless(40) is deposited on the first stainless(10) in turns. A holder coupling unit(50) couples from the second stainless(40) to the first stainless(10) via each hole. A sample fixing unit(55) couples from the second stainless(40) to the fixing plate(30) via each hole. A laser bar(60) is extended at a level with the spacer(20) between the fixing plate(30) and the first stainless(10). The area size of the second stainless(40) is less than that of the first stainless(10).
Abstract:
PURPOSE: A method for measuring a sectional reflexibility of a field absorption type device is provided to measure easily an optical variable by using an optical current. CONSTITUTION: A lens type fiber(21) transfers a laser beam emitted from a variable wavelength laser(10). The laser beam passing through the lens type filter(21) is irradiated on a section of a device(15). A chopper(11) turns on or off the variable wavelength laser(10). An optical rotator(14) is formed at a position adjacent to a polarization controller(13) in order to control a path of the laser beam. An optical detector(16) is connected with the optical rotator(14) in order to measure a change of reflective intensity of a reflected beam. A lock-in amplifier(17) is connected with the chopper(11) in order to detect a modulated variable wavelength laser beam. A power supply(18) supplies power to each component. A voltage separator(18) separates a signal influence between the device(15) and the lock-in amplifier(17).
Abstract:
본 발명은 레이저 리소그파피 장비를 이용한 네가티브 마스크 제작방법에 관한 것으로, 종래의 네가티브패턴 제작은 정확한 제어나 좋은 대비를 얻기 위해 AZ5200 포토레지스트 시리즈가 사용된다. 그러나 이는 일반적인 포토레지스트보다 값이 비싸고, 제조공정시 가벼운 열처리과정과 역열처리과정을 거쳐야 하므로 제작과정이 복잡하며 열처리조건이 상당한 영향을 받아 제작에 많은 어려움이 있으며, 0℃에서 보관해야 하므로 보관상에 어려움이 있는 문제점이 있었다. 본 발명은 이러한 문제점을 해결하기 위하여 네가티브 패턴 제작시 사용되는 포토레지스트를 일반적인 포지티브 포토레지스트를 사용할 수 있어 가격이 저렴할 뿐 아니라 역열처리 과정등 까다로운 조건없이도 쉽게 제작할 수 있고, 마스크 제작시간의 단축과 폐곡선 및 특수형태의 마스크 제작에 유용하게 사용할 수 있도록 한 것이다.