公开(公告)号：JPH0294542A

公开(公告)日：1990-04-05

申请号：JP24626488

申请日：1988-09-30

Applicant: CANON KK

Inventor： MATSUI SHIN ,  UZAWA SHUNICHI ,  KARIYA TAKUO ,  EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI

IPC: H01L21/677 ,  H01L21/68

Abstract: PURPOSE:To get a substrate in and out of a substrate container without rubbing by so providing an attitude correcting means for correcting the attitude of a transfer hand that the substrate and the hand are not brought into contact with the container. CONSTITUTION:A push bar 9 with a top raised by an actuator 12 lifts a hand locking plate 6. A sucking hand 4 is lifted by pins at three points on the plate 6, and its attitude is positioned in parallel with respect to an initially set attitude. A wafer container of a wafer cassette 8 is so regulated in advance as to become parallel to the attitude of a wafer 15 of the lifted state. Thus, the wafer 15 is inserted into the cassette 8 in the state that its attitude is corrected. Accordingly, the wafer 15 and the cassette 8 are not rubbed with each other.

公开(公告)号：JPH0269955A

公开(公告)日：1990-03-08

申请号：JP22126988

申请日：1988-09-06

Applicant: CANON KK

Inventor： CHIBA YUJI ,  FUJIOKA HIDEHIKO ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  SHIMODA ISAO

IPC: B65G1/07 ,  B65G1/00 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/677

Abstract: PURPOSE:To prevent dusts from adhering onto a mask board and to simplify a loading mechanism by using means for opening or closing a mask substrate cassette when the cassette is loaded in a chamber for sealing from the atmosphere also as means for feeding it to a desired position in a chamber. CONSTITUTION:The door MCHD of a mask chamber MCH is opened, and a cassette of the state that a cassette body MCH is coupled to a cassette cover MCC to seal its interior is placed on a table. Then, the door MCHD is closed, the chamber MCC is evacuated in vacuum, He gas is filled therein, the table is raised by an elevator EA, and a mask substrate MF is moved to a desired position. Thus, the functions of a separating mechanism for separating the body MCM from the cover MCC and a selecting mechanism for the substrate MF are provided in a body chamber WMC, and a predetermined exposure is conducted in the chamber WMC. When it is finished, the door MCHD is opened by a reverse operation thereto to be opened with the atmosphere.

公开(公告)号：JPH0248196A

公开(公告)日：1990-02-16

申请号：JP14709188

申请日：1988-06-15

Applicant: CANON KK

Inventor： KUNO MITSUTOSHI ,  UZAWA SHUNICHI ,  KARIYA TAKUO

IPC: G01V3/10 ,  B25J15/00 ,  B25J19/02 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68

Abstract: PURPOSE:To improve the reliability of a transfer equipment and improve the transfer efficiency by providing a circuit which detects the inductance of an electro-magnet and checking whether or not any substance to be transferred exists. CONSTITUTION:A detecting circuit 6 detects the movement of a hard H1 to the position B and according to this signal from the circuit 6, a control circuit 3 changes the position C of the switch of switch selectors 8 and 9 to the position (a) via a switch control circuit 7. As a result, an exciting power supply 10 is connected to the power supply of a bridge circuit to carry the current I1 across coil wound on the permanent magnet MG0 of a magnet chuck MG1. Variation in inductance at this time is detected and it is detected whether or not a mask M1 exists on a master holder MH1. From the result of this detection if the existence of the mask is detected, the hard H1 is moved to the position C and the mask M1 is released from the mask holder.

公开(公告)号：JPS63312640A

公开(公告)日：1988-12-21

申请号：JP14861387

申请日：1987-06-15

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  WATANABE YUTAKA ,  OGURA SHIGETARO ,  KARIYA TAKUO ,  FUKUDA YOSHIAKI ,  KAWAI YASUO ,  MINAMI SETSUO

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To align and transfer a pattern of an original plate irradiated by an electromagnetic wafer of an X-ray range efficiently on a substrate with high resolution by providing cooling means for forcibly cooling the plate and composing a plurality of multilayer film reflecting mirrors in a contraction projection optical system. CONSTITUTION:A reflecting contraction type projecting optical system is composed sequentially of a concave reflecting mirror M1, a convex reflecting mirror M2 and a concave reflecting mirror M3 from a mask MS side, and contracts to project a circuit pattern of the mask MS on a wafer WF. The reflecting mirror uses a multilayer film reflecting mirror, fundamentally forms a coaxial optical system, and only one sides of the mirrors M1, M3 are used. Further, it corrects an aberration by slightly inclining at least one of the mirrors M1, M3, M2 with respect to an optical axis O by displacing from a coaxial relation. Reflecting films are formed on the reflecting surfaces of the mirrors M1, M3 and M2 to efficiently reflect an X-ray. The films are formed of multilayer films of several tens of layers. In case of a reflection type mask, forcible cooling means CO, such as water-cooling mechanism, electronic cooling mechanism, such as Peltier element can be preferably mounted on its rear face.

公开(公告)号：JPS63312639A

公开(公告)日：1988-12-21

申请号：JP14861287

申请日：1987-06-15

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  WATANABE YUTAKA ,  OGURA SHIGETARO ,  KARIYA TAKUO ,  FUKUDA YOSHIAKI ,  KAWAI YASUO ,  MINAMI SETSUO

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To align and transfer a pattern of an original plate irradiated by an electromagnetic wafer of an X-ray range efficiently on a substrate with high resolution by composing a contraction projection optical system with a plurality of multilayer film reflecting mirror in which helium is fed between at least two of them. CONSTITUTION:A reflecting contraction type projecting optical system is composed sequentially of a concave reflecting mirror M1, a convex reflecting mirror M2 and a concave reflecting mirror M3 from a mask MS side, and contracts to project a circuit pattern of the mask MS on a wafer WF. The reflecting mirror uses a multilayer film reflecting mirror, fundamentally forms a coaxial optical system, and further corrects an aberration by slightly inclining at least one of the mirrors M1, M3, M2 with respect to an optical axis O by displacing from a coaxial relation. Reflecting films are formed on the reflecting surfaces of the mirrors M1, M3 and M2 to efficiently reflect an X-ray. The films are formed of multilayer films of several tens of layers. Light element, such as H, He may be filled in this device to perform an alignment instead of the vacuum state in the device. Even if it is filled with He, forcible cooling means may be attached to the mirrors.

公开(公告)号：JPS63311515A

公开(公告)日：1988-12-20

申请号：JP14861587

申请日：1987-06-15

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  WATANABE YUTAKA ,  OGURA SHIGETARO ,  KARIYA TAKUO ,  FUKUDA YOSHIAKI ,  KAWAI YASUO ,  MINAMI SETSUO

IPC: G01B11/26 ,  G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To accurately correct and maintain the parallelism and orthogonality of first and second objects by setting the distances of corresponding two points to a focusing position with respect to respective three points of the first and second objects. CONSTITUTION:An optical means which is provided between the first and the second objects and which includes plural reflecting mirrors, a detection means detecting the focusing of corresponding two points with respect to respective three points of the first and the second objects, and a control means controlling the orthogonality or pallalelism between the first and the second objects based on the detected result of the detection means are provided. As for a couple of corresponding two points, the control means position-controls the second object and the detection means focusing-detects it. When they are focused, similar focusing is executed with respect to a subsequent couple of two pints and furthermore, with respect to a remainder couple of two points. Accordingly, the first and the second objects are controlled to be in the relation of a mutually parallel position or of a mutually vertical position if the optical axis of an optical system is bent in a right angle between the first and the second objects.

公开(公告)号：JPS63139288A

公开(公告)日：1988-06-11

申请号：JP28706986

申请日：1986-12-02

Applicant: CANON KK

Inventor： YAMAMOTO SEKINORI ,  OKAWA SHINKICHI ,  MATSUSHITA KOICHI ,  KAWAI YASUO ,  HIGOMURA MAKOTO ,  KARIYA TAKUO

IPC: G01B21/00 ,  G03F7/20 ,  G03F7/207 ,  G12B5/00 ,  H01L21/68

公开(公告)号：JPS61294443A

公开(公告)日：1986-12-25

申请号：JP13594485

申请日：1985-06-24

Applicant: CANON KK

Inventor： KARIYA TAKUO

IPC: H01L21/30 ,  G03F1/00 ,  G03F1/66 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To assure stable operation and inexpensive production by moving a permanent magnet to change the magnetic force on the joint surfaces of a holder and magnetic material thereby attracting or detaching a mask. CONSTITUTION:A solenoid coil 3 is impulsively excited by a DC power source via lead wires 7 while the mask 1 is brought near to the same. The permanent magnet 4 is preliminarily magnetized so as to move downward by repulsing from the magnetic field of the coil 3 when a driving pulse 8 is inputted to the coil 3. The magnet 4 is therefore moved by the input of the pulse 8 in any position where the permanent magnet exists and thereafter a closed magnetic path consisting of the magnet 4, a yoke 2 and the magnetic material of the mask 1 is formed and the mask 1 is kept attracted by the magnetic field of the magnet 4. A driving pulse 9 is inputted to excite the coil 3 in the case of detaching the mask 1 from the holder. The holder is thus stably operated to surely hold the mask and is inexpensively produced.

公开(公告)号：JPS60183599A

公开(公告)日：1985-09-19

申请号：JP3873184

申请日：1984-03-02

Applicant: CANON KK

Inventor： KAWAI YASUO ,  KARIYA TAKUO

IPC: G21K1/00 ,  G03F7/20 ,  G21K1/02 ,  H01L21/027

公开(公告)号：JPS60178627A

公开(公告)日：1985-09-12

申请号：JP3361184

申请日：1984-02-24

Applicant: CANON KK

Inventor： KARIYA TAKUO ,  KAWAI YASUO ,  OKUNUKI MASAHIKO ,  GOTOU SUSUMU

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce the effect of the expansion and contraction of a wafer on a pattern image as much as possible while effectively utilizing energy from an X- ray source for the irradiation of a mask by contracting the area of the wafer to which a pattern is transferred by one-time baking. CONSTITUTION:A circuit pattern 20 and a pair of alignment marks 21 are formed on an X-ray transmitting substrate by an X-ray non-transmitting substance in a mask 16. X-rays are projected under the state in which one of four divided irradiating areas of a wafer 12 and the mask 16 are superposed. Alignment marks 24, 25, 26 are formed in each irradiating area at every one pair. The position of the wafer is adjusted so that an orientation flat section 27 in the wafer is directed in the predetermined direction, and the opposite surfaces of the mask 16 and the wafer 12 run parallel and the mask 16 and the wafer 12 are kept at a prescribed space. A rough and fine adjustment brings a mask holder onto a wafer holder on an irradiating base waiting at the position of pre-alignment, and stacks both the mask holder and the wafer holder. The irradiating base is moved to the adjacent position of fine alignment for more precise positioning. The wafer is transported into an irradiating chamber, and scanned and irradiated by X-rays.