公开(公告)号：EP2437279B1

公开(公告)日：2018-05-30

申请号：EP11007981.1

申请日：2011-09-30

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Biberger, Josef ,  Pulwey, Ralph ,  Adolf, Andreas

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

公开(公告)号：EP2471086B1

公开(公告)日：2013-12-11

申请号：EP10812685.5

申请日：2010-08-28

Applicant: FEI Company

Inventor： MIRRO, Gene ,  KOOIJMAN, Cornelis, Sander ,  VOS, Hendrik Jan de ,  MILLER, Tom

IPC: H01J37/147 ,  H01J37/04 ,  H01J37/302

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

公开(公告)号：EP1891467B1

公开(公告)日：2013-01-09

申请号：EP06768670.9

申请日：2006-05-29

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob ,  KIM, Byeng Jin

IPC: H01J3/18 ,  H01J3/26 ,  H01J37/12

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

公开(公告)号：EP2437279A3

公开(公告)日：2012-12-05

申请号：EP11007981.1

申请日：2011-09-30

Applicant: Carl Zeiss NTS GmbH

Inventor： Biberger, Josef ,  Pulwey, Ralph ,  Adolf, Andreas

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.
The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

公开(公告)号：EP2404640A4

公开(公告)日：2012-06-13

申请号：EP09845793

申请日：2009-06-09

Applicant: MITSUBISHI ELECTRIC CORP

Inventor： HARADA HISASHI ,  IWATA TAKAAKI

IPC: A61N5/10

CPC classification number: H01J3/22 ,  A61N5/1042 ,  A61N5/1043 ,  A61N5/1077 ,  A61N5/1078 ,  A61N2005/1087 ,  H01J3/26

公开(公告)号：EP2437279A2

公开(公告)日：2012-04-04

申请号：EP11007981.1

申请日：2011-09-30

Applicant: Carl Zeiss NTS GmbH

Inventor： Biberger, Josef ,  Pulwey, Ralph ,  Adolf, Andreas

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.
The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract translation: 离子束系统包括电压供应系统（7）和至少一个具有至少一个第一偏转电极（51a，51b，51c）和多个第二偏转电极（52a，52b，52c）的光束偏转器（39），其中 电压供给系统被配置为向多个第二偏转电极提供不同的可调偏转电压，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

公开(公告)号：EP2355128A2

公开(公告)日：2011-08-10

申请号：EP11152420.3

申请日：2011-01-27

Applicant: Carl Zeiss NTS GmbH

Inventor： Glasmachers, Albrecht, Prof. Dr. ,  Laue, Alexander ,  Aliman, Michel, Dr. ,  Mantz, Hubert, Dr. ,  Zeile, Ulrike, Dr. ,  Dömer, Holger, Dr.

IPC: H01J49/06 ,  H01J37/244 ,  H01J37/256

CPC classification number: H01J37/265 ,  H01J3/26 ,  H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J49/063 ,  H01J49/065 ,  H01J49/10 ,  H01J2237/05 ,  H01J2237/2449 ,  H01J2237/2527

Abstract: The invention relates to an apparatus (1200,1300) for transmission of energy of an ion to at least one gas particle and/or for transportation of an ion. The invention also relates to a particle beam device having an apparatus such as this. In particular, a container is provided, in which a gas is arranged which has gas particles, wherein the container has a transport axis. Furthermore, at least one first multipole unit and at least one second multipole unit are provided, which are arranged along the transport axis. The first multipole unit and the second multipole unit are formed by printed circuit boards. Furthermore, an electronic circuit is provided, which provides each multipole unit with a potential, such that a potential gradient is generated, in particular along the transport axis.

Abstract translation: 本发明涉及对用于离子的能量传递到至少一个气体 - 颗粒和/或用于离子的运输装置（1200.1300）。 因此，本发明涉及具有在装置的粒子射线装置：如此。 特别地，容器设置，在其中气体布置有具有气体粒子，worin容器具有输送轴。 进一步，至少一个第一多单元和至少一个第二多极单元设置，其沿着输送轴线布置。 所述第一多极单元和第二多极单元通过印刷电路板形成。 进一步，向电子电路提供，其提供每个多极单元的电位，寻求并产生电势梯度，特别是沿着传输轴线。

公开(公告)号：KR1020140106429A

公开(公告)日：2014-09-03

申请号：KR1020140021360

申请日：2014-02-24

Applicant: 가부시키가이샤 뉴플레어 테크놀로지

Inventor： 미야모토노부오

IPC: H01J37/305 ,  H01L21/027

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461 ,  H01J37/305 ,  H01J33/00 ,  H01L21/027

Abstract: A method to adjust the operating temperature of cathodes given in an aspect of the present invention includes: acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode, and an operating temperature of the cathode at which a bias voltage becomes saturated on the emission current; measuring the current density of an electron beam from the cathode in a state where an n^th (n is an integer) emission current value and an n^th cathode operating temperature are set in the electron beam source; determining whether the measured current density is within a tolerance range; changing the n^th emission current value to an (n+1)^th emission current value if the measured current density is not within the tolerance range; calculating the operating temperature of the cathode corresponding to the (n+1)^th emission current value using the approximate equation; and setting the calculated operating temperature as an (n+1)^th cathode operating temperature in the electron beam source.

Abstract translation: 调整本发明一方面给出的阴极的工作温度的方法包括：获取接近于使用阴极的电子束源中的发射电流值之间的相关性的近似方程，以及阴极的工作温度 偏置电压在发射电流上饱和; 在电子束源中设定第n（n是整数）发射电流值和第n个阴极工作温度的状态下测量来自阴极的电子束的电流密度; 确定所测量的电流密度是否在公差范围内; 如果测得的电流密度不在公差范围内，则将第n个发射电流值改变为第（n + 1）个发射电流值; 使用近似等式计算对应于第（n + 1）个发射电流值的阴极的工作温度; 并将计算出的工作温度设定为电子束源中的第（n + 1）第n个阴极工作温度。

公开(公告)号：KR1020130031788A

公开(公告)日：2013-03-29

申请号：KR1020120101434

申请日：2012-09-13

Applicant: 캐논 가부시끼가이샤

Inventor： 아리타게이이치 ,  시노하라마사히토

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/24507 ,  H01J2237/24585 ,  H01L21/0274 ,  G03F1/20 ,  G03F7/70208 ,  H01J3/08 ,  H01J3/26

Abstract: PURPOSE: A charged particle beam irradiation apparatus, a charged particle beam drawing apparatus, and a method for manufacturing an article are provided to reduce the change of temperature. CONSTITUTION: An aperture array(3) includes openings. A lens array(4) has electrostatic lenses. A blanker array(5) deflects electronic beam. A blanking controller(13) controls the blanker array. Electronic beam is projected on a substrate(10) or a measurement device(12) through electromagnetic lenses(7,9). A measurement device controller(14) adjusts the measurement device. [Reference numerals] (13) Blanking controller; (14) Measurement device controller; (15) Main controller; (16) Deflector controller

Abstract translation: 目的：提供带电粒子束照射装置，带电粒子束描绘装置和制品制造方法以减少温度变化。 构成：孔径阵列（3）包括开口。 透镜阵列（4）具有静电透镜。 消隐器阵列（5）偏转电子束。 消隐控制器（13）控制消隐器阵列。 电子束通过电磁透镜（7,9）投影在基板（10）或测量装置（12）上。 测量装置控制器（14）调节测量装置。 （附图标记）（13）消隐控制器; （14）测量装置控制器; （15）主控制器; （16）导流板控制器

公开(公告)号：KR1020150088202A

公开(公告)日：2015-07-31

申请号：KR1020150010647

申请日：2015-01-22

Applicant: 가부시키가이샤 히다치 하이테크 사이언스

Inventor： 우에모토아츠시 ,  만,신 ,  아사하타다츠야

IPC: H01J37/26 ,  H01J3/26 ,  H01J37/147

CPC classification number: H01J37/265 ,  H01J2237/15 ,  H01J2237/30483 ,  H01J3/26 ,  H01J37/147

Abstract: 적은비트수의 DAC(디지털/아날로그변환기)를이용하여가공정밀도를높일수 있는단면가공관찰장치를제공한다. 본발명의단면가공관찰장치(100)는, 하전입자빔발생집속부및 편향기를제어하는것이며, 입력한디지털신호를편향기에대해입력하는아날로그신호로변환하는 DAC를가지는이온빔제어부(11)와, 슬라이스량의설정치에의거하여편향기의주사에의한하전입자빔의시야의값을설정하는 FOV(시야) 설정부(14-1)를구비하고있다.

Abstract translation: 提供了一种截面处理的观察装置，其可以通过使用具有少量位的数模转换器（DAC）来提高处理精度。 本发明的分割处理（100）的观察装置控制用于产生带电粒子束的束聚焦单元和偏转器，并且包括：离子束控制单元（11），其具有将输入的数字信号转换为模拟信号的DAC 被输入到偏转器中; 以及FOV设定单元（14-1），其基于切片量的设定值，对偏光器的扫描设定带电粒子束的视场（FOV）的值。