公开(公告)号：JPH0425106A

公开(公告)日：1992-01-28

申请号：JP12924090

申请日：1990-05-21

Applicant: CANON KK

Inventor： HARA SHINICHI ,  AMAMIYA MITSUAKI ,  UZAWA SHUNICHI

IPC: G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To grasp the accumulated amount of exposure for each mask, and to facilitate the decision of replacement of the mask by a method wherein the amount of exposure is detected when the mask is exposed, the detected value is added to the accumulated amount of exposure of the above-mentioned mask, and the obtained value is indicated. CONSTITUTION:A detecting device 303 with which the amount of exposure absorbed to a mask 105 when an exposing operation is conducted, a memory storage 305 with which the accumulated amount of exposure of each mask is stored, and a controller 302 with which the amount of exposure detected by the detection device 303 is added to the accumulated amount of exposure stored against the mask when each mask is exposed and indicated by an indicator 306, are provided on the title exposing device. Accordingly, the detected amount of exposure is added to the accumulated amount of exposure when each mask is exposed, and the added value can be indicated by the indicating part 306. As a result, the amount of exposure of each mask 105 can be recognized correctly, and the replacing time of the mask 105 can also be grasped properly.

公开(公告)号：JPH03290917A

公开(公告)日：1991-12-20

申请号：JP9201890

申请日：1990-04-09

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  CHIBA YUJI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F1/76 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To control optimum pressing force, improve positioning accuracy and make positioning smooth by limiting an opening angle of fingers so that a claw is engaged in a groove on a mask side while the fingers are open. CONSTITUTION:When a mask 4 is positioned and mounted on a mask stage 8, the mask 4 is press-fitted to a V-block 9 with fingers 11 open. Since the mask 4 can freely move in parallel to a mask surface by a function of a parallel spring 19 at this time, movement along a V-groove is free and a pressing motion for smooth positioning is possible. A shaft 20a of a sucking member 20 is returned toward a main body 17 according to pressing force of the mash 4 against the V-block 7 so as to press a plate spring 22 to have it deformed, and a resistance value of a strain gage changes to allow the pressing force to be detected. Control of the pressing force wherein positioning pressure is feedback controlled or pressing force is weakened at the time of theta driving or sucking the mask is possible based on the detected pressing force.

公开(公告)号：JPH03265118A

公开(公告)日：1991-11-26

申请号：JP6275390

申请日：1990-03-15

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  EBINUMA RYUICHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: H01L21/027 ,  G03F7/20

Abstract: PURPOSE:To correct the slippage of an alignment axis to an exposure light axis so as to improve transcription accuracy by detecting the rotational slippage around a Y axis of the alignment light axis, and rotating the alignment light axis around the Y axis through an actuator. CONSTITUTION:The X-ray beam 14 from a track emitted light (SOR) device 10 becomes an exposure X-ray beam 18 by formation or the like, and is applied to the thick plate and the board to be exposed being held in the vertical direction by the aligner 20 freely capable of fine rotation around the Y axis, being suspended by a twist removing system 27 such as a pneumatic bearing, etc. The rotational slippage between the alignment light axis of this device 20 and the exposure light axis of the beam 18 is detected by a secondary sensor, etc., and according to the detection results, two sets of pneumatic springs 33 constituting an actuator correct the rotational slippage, and it becomes an aligner where transcription accuracy is elevated.

公开(公告)号：JPH0369710B2

公开(公告)日：1991-11-05

申请号：JP2865380

申请日：1980-03-06

Applicant: CANON KK

Inventor： UZAWA SHUNICHI ,  MATSUMOTO SHIGEYUKI

IPC: B41J2/045 ,  B41J2/055 ,  B41J2/075 ,  B41J2/16 ,  G06K15/10

公开(公告)号：JPH03187211A

公开(公告)日：1991-08-15

申请号：JP32586789

申请日：1989-12-18

Applicant: CANON KK

Inventor： OTA HIROHISA ,  MORI MAKIKO ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  NOSE TETSUSHI

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To improve exposure accuracy by detecting AF set error from an ideal position of an exposure surface in advance and to correct AA detection value by AA detection error corresponding to the AF detection value. CONSTITUTION:A device is provided with an AA detection means to detect relative position relation between an exposure substrate 1 and an original plate 8 by position relation between an AA mark 201 on a substrate formed on the exposure substrate 1 and an AA mark 203 on the original plate 8 formed on the original plate; an AF detection means to detect position deviation from an ideal exposure plane of exposure object surface before AA detection; and a correction means to correct the AA detection value based on the AF detection value. Thereby, it is possible to correct the AA detection value in accordance with the AF detection value (AA detection gap) and to carry out AA more accurately, thereby improving exposure accuracy.

公开(公告)号：JPH0394417A

公开(公告)日：1991-04-19

申请号：JP23033489

申请日：1989-09-07

Applicant: CANON KK

Inventor： WATANABE YUTAKA ,  UNO SHINICHIRO ,  EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  UZAWA SHUNICHI

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To execute an exposure operation in a shortest time by a method wherein a maximum position of an intensity of X-rays transmitted through a mask membrane is a position of 20 to 45% from the side of a mirror in an exposure region. CONSTITUTION:An intensity of X-rays radiated from a light source 1 such as SOR or the like shows nearly a Gaussian distribution in a direction perpendicular to a horizontal orbit line; the X-rays are reflected by a mirror 2 and are transmitted through a Be window and a mask membrane. When the X-rays are incident on a wafer, they show an asymmetric distribution. A maximum position of an intensity of the X-rays transmitted through the mask membrane is a position of 20 to 45% from the side of the mirror inside an exposure region 3. Amounts of the X-rays per unit time which are absorbed by a resist on the wafer coincide within a permissible range for an exposure at both ends in a direction perpendicular to an SOR orbit plane of the exposure region. Thereby, an exposure operation can be executed in a shortest time.

公开(公告)号：JPH0388316A

公开(公告)日：1991-04-12

申请号：JP22550789

申请日：1989-08-31

Applicant: CANON KK

Inventor： MARUMO KOJI ,  IWAMOTO KAZUNORI ,  HARA SHINICHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/30

Abstract: PURPOSE:To suppress vibration and to make it possible to transfer a minute pattern to a substrate without adverse effects on the resolution of a semiconductor exposure apparatus using this substrate holding apparatus by making the introducing direction and the guiding-out direction of liquid medium with respect to the flow path of the liquid medium agree with the direction of the highest rigidity approximately. CONSTITUTION:The introducing direction of liquid medium into a flow path and the guiding-out direction of the liquid medium from the flow path are made to agree with the direction of the highest rigidly approximately in supporting of a substrate holding apparatus 1 with stage means 4a, 4b and 4c. At the time of the inflow and the outflow of the liquid medium, the force of the motion of the liquid medium strongly acts especially in the inflow direction and the outflow direction with respect to an inlet port 1a and an outlet port 1b for the liquid medium, and vibration is generated. The inflow direction and the outflow direction of the liquid medium are made to agree approximately with the direction of the highest rigidity in supporting of the substrate holding apparatus 1. Then, the vibration caused by the flow of the liquid medium is minimized. Thus, the vibration affecting resolution can be decreased.

公开(公告)号：JPH0364195A

公开(公告)日：1991-03-19

申请号：JP19795689

申请日：1989-08-01

Applicant: CANON KK

Inventor： MORI TETSUZO ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI

IPC: H04Q9/00 ,  H01L21/027

Abstract: PURPOSE:To reduce quantity of wiring between a mechanism section and a control section by providing a communication means between the mechanism section and the control section. CONSTITUTION:A mechanism section 110 and a control section 109 are tied by communication means A, B. That is, the communication means A comprising a transmission section 103, a communication line 107 and a reception section 104 and the communication means B comprising a transmission section 105, a communication line 108 and a reception section 106 are provided, and the communication means A is used to send information from the mechanism section 110 to the control section 109 and the communication means B is used to send information from the control section 109 to the mechanism section 110. Thus, the information is sent and received without requiring lots of wirings between the mechanism section 110 and the control section 109.

公开(公告)号：JPH0363485A

公开(公告)日：1991-03-19

申请号：JP19695289

申请日：1989-07-31

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  SAKAMOTO EIJI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: F25D9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable an item of which temperature is controlled to be monitored in a high accuracy by a method wherein a pressure loss in a flow passage ranging from an isothermal water supplying means to a plurality of heat exchanging devices of which temperature is controlled is adjusted by an adjusting valve at the supplying part and another adjusting valve at a recovery side. CONSTITUTION:Liquid medium recoverying passages 12, 13 and 14 have adjusting valves 25, 24 and 23 of which flow passage resistance can be adjusted. A pressure loss is divided by arranging the adjusting valves 19 to 21 at the supplying side, a pressure and a flow rate at the heat exchanging segments 6, 7 and 8 are separately set and the pressures at each of the heat exchanging segments 6, 7 and 8 become substantially the same. With such an arrangement, a temperature increase caused by a pressure loss energy becomes the same degree and temperatures of liquid medium at each of the heat exchanging segments becomes equal to each other. An external part of a room where a temperature controlled item is mounted is provided with a heating part of an isothermal liquid medium supplying means to reduce a temperature variation caused by an external influence on the temperature controlled item.

公开(公告)号：JPH0353199A

公开(公告)日：1991-03-07

申请号：JP18608089

申请日：1989-07-20

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  TERAJIMA SHIGERU ,  UZAWA SHUNICHI

IPC: G01T1/29 ,  G21K5/00 ,  G21K5/04 ,  H01L21/027 ,  H01L21/30 ,  H05H13/04

Abstract: PURPOSE:To efficiently perform exposure of high precision by controlling the exposure time based on measurement results of the orbiting electron current quantity measuring means of a synchrotron orbit radiation (SOR) ring and an X-ray intensity measuring means corresponding to the exposure area. CONSTITUTION:Electrons are supplies from an injector 10 to an SOR ring 1 with a shutter 7 closed and are accelerated to generate the radiation. Thereafter, an exposure intensity measuring instruction is outputted from a CPU 16, and an X-ray detector 6 is fed into the exposure area through an X-ray detector control part 14 by an X-ray detector driving part 12 to measure the intensity of X rays in the exposure area. The quantity of current of orbiting electrons is measured by an ammeter 17 simultaneously with measurement of the detector 6, and the measured current value is sent to the unit 16 through a signal processing part 18. The unit 16 calculates the intensity of X-ray for exposure based on the measured intensity of X rays. The exposure time is calculated and set in accordance with a set exposure and an X-ray mask 8 and a wafer 8 are aligned. Thereafter, an exposure instruction is issued to a shutter control part 15 by the unit 16 to start the exposure.