公开(公告)号：NL2008695A

公开(公告)日：2012-11-27

申请号：NL2008695

申请日：2012-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EIJK JAN ,  HOL SVEN ANTOIN JOHAN ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN

IPC: G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

公开(公告)号：NL2007606A

公开(公告)日：2012-05-23

申请号：NL2007606

申请日：2011-10-17

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HOUKES MARTIJN ,  KAMIDI RAMIDIN ,  WAL MARINUS ,  WIJDEVEN JEROEN

IPC: G03F7/20 ,  H01L21/768

Abstract: A controller is provided that controls an actuator system having a plurality of actuators arranged to act on an object. The controller uses a gain balancing matrix to convert a first control signal, representing a set of forces desired to be provided to the center of gravity of the object into a second control signal, representing an equivalent set of forces to be provided by the plurality of actuators. The system is further configured such that a first gain balancing matrix is used at a first frequency band and a second gain balancing matrix is used at a second frequency band.

公开(公告)号：NL2004256A

公开(公告)日：2010-11-18

申请号：NL2004256

申请日：2010-02-18

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL1036568A1

公开(公告)日：2009-09-21

申请号：NL1036568

申请日：2009-02-12

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS

IPC: G03F9/00 ,  H01L21/68

公开(公告)号：NL1036516A1

公开(公告)日：2009-09-08

申请号：NL1036516

申请日：2009-02-05

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  GILS PETRUS JACOBUS MARIA VAN

IPC: G03F9/00

公开(公告)号：NL1036160A1

公开(公告)日：2009-05-25

申请号：NL1036160

申请日：2008-11-06

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  WIJST MARC WILHELMUS MARIA VAN ,  PEE JOOST DE ,  HOON CORNELIUS ADRIANUS LAMBERTUS ,  BOSCHKER STIJN

IPC: G03F9/00 ,  H01L21/68

公开(公告)号：NL1036080A1

公开(公告)日：2009-05-07

申请号：NL1036080

申请日：2008-10-16

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  PASCH ENGELBERTUS ANTONIUS FRANCISCUS

IPC: H01L21/68 ,  G03F9/00 ,  H01L23/544

公开(公告)号：DE60229680D1

公开(公告)日：2008-12-18

申请号：DE60229680

申请日：2002-02-06

Applicant: ASML NETHERLANDS BV

Inventor： BOONMAN MARCUS EMILE JOANNES ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  BUTLER HANS

IPC: G03F7/20 ,  G03F7/22 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027

Abstract: In a lithographic apparatus the shape of the focal plane (11,12,13) is adjusted using available manipulators (22,24,26) in the projection lens system (PL) so that it is in closer conformity to the shape of the wafer surface (WS) in the exposure area. The control of the focal plane shape can be integrated with the leveling control which determines the height and tilt of the wafer surface.

公开(公告)号：DE602005001870T2

公开(公告)日：2008-04-30

申请号：DE602005001870

申请日：2005-02-17

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BOONMAN MARCUS EMILE JOANNES ,  VAN DEN BIGGELAAR PETRUS MARIN

IPC: G03F7/20 ,  H01L21/027 ,  G03F9/00

Abstract: The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system (IL) configured to provide a beam of radiation (PB), a first support structure (MT) configured to support a patterning device (MA) that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure (WT) that includes a substrate holder for holding a substrate (W), a projection system (PL) configured to project the patterned beam of radiation onto a target portion (C) on a surface of the substrate, and a servo unit (PW) configured to position the substrate holder. The apparatus further includes a sensor unit (LS) configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane (REF), a memory unit configured to store surface information of the substrate based on respective distances of corresponding the at least one location point on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.

公开(公告)号：DE60214792T2

公开(公告)日：2007-10-11

申请号：DE60214792

申请日：2002-06-13

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS

IPC: G03F7/20 ,  H01L21/027 ,  H02P5/00

Abstract: A lithographic projection apparatus includes a first object table configured and arranged to hold a patterning structure capable of patterning a projection beam of radiation according to a desired pattern and a second object table configured and arranged to hold a substrate. A positioning structure is configured and arranged to generate a force so as to move one of the object tables with respect to a projection system during an imaging operation. Processing circuitry is configured and arranged to read from a data storage device a compensation force value that corresponds to a value of a signal representing a position of said object table and to generate a force adjustment signal based on the compensation force value. The positioning structure is further configured and arranged to generate the force according to the force adjustment signal.