公开(公告)号：NL2014016A

公开(公告)日：2015-07-23

申请号：NL2014016

申请日：2014-12-19

Applicant: ASML NETHERLANDS BV

Inventor： HUANG YANG-SHAN ,  KIM MINKYU ,  NIJSSE GERARD JOHANNES PIETER

IPC: G03F7/20 ,  H01L21/68

Abstract: A coil assembly for an electromagnetic actuator or motor, includes a magnetic core including at least one pair of slots; a coil, at least partly mounted inside the at least one pair of slots; and a cooling member, the cooling member being mounted to a surface of the coil.

公开(公告)号：NL2009827A

公开(公告)日：2013-06-26

申请号：NL2009827

申请日：2012-11-16

Applicant: ASML NETHERLANDS BV

Inventor： GROOT ANTONIUS ,  LAFARRE RAYMOND ,  HUANG YANG-SHAN ,  BROERS SANDER CHRISTIAAN ,  ROS PETER LAURENTIUS MARIA

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2008353A

公开(公告)日：2012-10-02

申请号：NL2008353

申请日：2012-02-27

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  AKKERMANS JOHANNES ,  WAL MARINUS ,  BEERENS RUUD ,  HUANG YANG-SHAN ,  AANGENENT WOUTER

IPC: G03F7/20

公开(公告)号：NL2009332A

公开(公告)日：2013-03-26

申请号：NL2009332

申请日：2012-08-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN ,  VALENTIN CHRISTIAAN LOUIS ,  SEGERS HUBERT MARIE ,  BERG JOHAN ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VISSER RAIMOND

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.

公开(公告)号：SG183609A1

公开(公告)日：2012-09-27

申请号：SG2012006169

申请日：2012-01-27

Applicant: ASML NETHERLANDS BV

Inventor： HOL SVEN ANTOIN JOHAN ,  VAN EIJK JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  NIJSSE GERARD JOHANNES PIETER ,  HUANG YANG-SHAN ,  KOOT MICHAEL WILHELMUS THEODORUS ,  DE BOEIJ JEROEN ,  KIMMAN MAARTEN HARTGER ,  ZHOU WEI ,  MARTENS SIMON BERNARDUS CORNELIS MARIA

Abstract: An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction.Figure 1

公开(公告)号：NL2010628A

公开(公告)日：2013-10-29

申请号：NL2010628

申请日：2013-04-12

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA ,  BROERS SANDER CHRISTIAAN ,  HOL SVEN ANTOIN JOHAN ,  HUANG YANG-SHAN ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2009338A

公开(公告)日：2013-03-26

申请号：NL2009338

申请日：2012-08-22

Applicant: ASML NETHERLANDS BV

Inventor： HUANG YANG-SHAN ,  GROOT ANTONIUS ,  CADEE THEODORUS PETRUS MARIA ,  VALENTIN CHRISTIAAN LOUIS

IPC: G03F7/20 ,  H01L21/683

公开(公告)号：NL2010679A

公开(公告)日：2013-11-26

申请号：NL2010679

申请日：2013-04-22

Applicant: ASML NETHERLANDS BV

Inventor： HUANG YANG-SHAN ,  CADEE THEODORUS PETRUS MARIA

IPC: G03F7/20

公开(公告)号：NL2010565A

公开(公告)日：2013-10-29

申请号：NL2010565

申请日：2013-04-03

Applicant: ASML NETHERLANDS BV

Inventor： GROOT ANTONIUS FRANCISCUS ,  BROERS SANDER CHRISTIAAN ,  CADEE THEODORUS PETRUS MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  HUANG YANG-SHAN ,  BOEIJ JEROEN ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  VEN BASTIAAN LAMBERTUS

IPC: G03F7/20

公开(公告)号：NL2008695A

公开(公告)日：2012-11-27

申请号：NL2008695

申请日：2012-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EIJK JAN ,  HOL SVEN ANTOIN JOHAN ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN

IPC: G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.