Abstract:
Ion implantation systems that separate the flow of ions from the flow of neutral particles are disclosed. The separation of neutral particles from ions can be achieved by manipulating the flow of ions in the system through variations in electrical or magnetic fields disposed within the implantation system. The path of neutral particles is less affected by electrical and magnetic fields than ions. The separation of these flows may also be accomplished by diverting the neutral particles from the ion beam, such as via an introduced gas flow or a flow blockage. Both separation techniques can be combined in some embodiments.
Abstract:
Methods and apparatus for reducing energy contamination can be provided to a beam line assembly for ion implantation. Protrusions comprising surface areas and grooves therebetween can face neutral trajectories within a line of sight view from the workpiece within the beam line assembly. The protrusions can alter the course of the neutral trajectories away from the workpiece or cause alternate trajectories for further impacting before hitting a workpiece, and thereby, further reduce energy contamination for more sensitive implants.
Abstract:
본 발명은 반사전자 검출 기능을 구비한 주사전자현미경에 관한 것으로서, 본 발명에 따른 반사전자 검출 기능을 구비한 주사전자현미경은 광소스로부터 생성되는 1차전자(Primary Electron)를 시료로 입사시키고, 상기 1차전자가 입사된 후 시료로부터 방출되는 방출전자를 검출하기 위한 주사전자현미경에 있어서, 상기 광소스와 상기 시료 사이에 배치되며, 자기장 및 전기장을 발생시킴으로써, 상기 방출전자를 2차전자(Secondary Electron)와 상기 반사전자(Back Scattered Electron)로 분리하는 빈필터부; 상기 빈필터부로부터 분리되는 2차전자와 반사전자를 각각 디텍팅하는 디텍팅부;를 포함하는 것을 특징으로 한다. 이에 의하여, 빈필터를 이용하여 2차전자와 반사전자를 분리하여 디텍팅할 수 있는 반사전자 검출 기능을 구비한 주사전자현미경이 제공된다.
Abstract:
One embodiment relates to a method of inspecting a site location on a target substrate. Contours are obtained, the contours having been generated from a reference image using a design clip. A target image of the site location is acquired. The contours are aligned to the target image, and contrast values are computed for pixels on the contours. A threshold is applied to the contrast values to determine contour-based defect blobs. Another embodiment relates to a method of generating contours for use in inspecting a site location for defects. Other embodiments, aspects and features are also disclosed.
Abstract:
A method of processing one or more surfaces is provided, comprising: providing a switchable ion gun which is switchable between a cluster mode setting for producing an ion beam substantially comprising ionised gas clusters for irradiating a surface and an atomic mode setting for producing an ion beam substantially comprising ionised gas atoms for irradiating a surface; and selectively operating the ion gun in the cluster mode by mass selecting ionised gas clusters using a variable mass selector thereby irradiating a surface substantially with ionised gas clusters or the atomic mode by mass selecting ionised gas atoms using a variable mass selector thereby irradiating a surface substantially with ionised gas atoms. Also provided is a switchable ion gun comprising: a gas expansion nozzle for producing gas clusters; an ionisation chamber for ionising the gas clusters and gas atoms; and a variable (preferably a magnetic sector) mass selector for mass selecting the ionised gas clusters and ionised gas atoms to produce an ion beam variable between substantially comprising ionised gas clusters and substantially comprising ionised gas atoms. Preferably, the gun comprises an electrically floating flight tube for adjusting the energy of the ions whilst within the mass selector.
Abstract:
Methods are disclosed for operating a device having a high energy particle detector wherein the particles create first incoming traversal events, outgoing backscatter events, higher-order in and out events and incoming events caused by particles which backscatter out of the device, hit nearby mechanical structures and are scattered back into the device. Exemplary method steps include discriminating incoming traversal events from outgoing backscatter events, higher-order in and out events and incoming events by limiting dose rate to a level at ensures that separate events do not overlap and discriminating events from background and from other events based on total energy in each event; discriminating backscatter events from incoming traversal events based on electron path shape; or determining that a first event and a second event are coincident with each other and separating incoming form backscatter events based on electron path shape and energy level.
Abstract:
The present disclosure provides a component for an imaging detector of a scanning charged particle microscope. The scanning changed particle microscope has a column for providing a scanning beam of the charged particles. The imaging detector is arranged for detecting off-axis electrons at a position outside the column and comprises an electron receiving element that is arranged to generate a signal in response to an intensity of received electrons. The detector component also comprises a filter that has a solid screening element and is arranged such that at least a portion of the electrons that have an initial kinetic energy within a first energy range are captured by the screening element and prevented from being received by the electron receiving element and at least a portion of the electrons that have an initial kinetic energy within a second energy range are received by the electron receiving element. The first energy range includes higher energies than the second energy range.
Abstract:
An ion implantation method and system that incorporate beam neutralization to mitigate beam blowup, which can be particularly problematic in low-energy, high-current ion beams. The beam neutralization component can be located in the system where blowup is likely to occur. The neutralization component includes a varying energizing field generating component that generates plasma that neutralizes the ion beam and thereby mitigates beam blowup. The energizing field is generated with varying frequency and/or field strength in order to maintain the neutralizing plasma while mitigating the creation of plasma sheaths that reduce the effects of the neutralizing plasma.