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    Electron beam treatment apparatus
    183.
    发明授权
    Electron beam treatment apparatus 有权
    电子束处理装置

    公开(公告)号：US07049606B2

    公开(公告)日：2006-05-23

    申请号：US10698726

    申请日：2003-10-30

    Applicant: Alexandros T. Demos ,  Hari K. Ponnekanti ,  Jun Zhao ,  Helen R. Armer

    Inventor： Alexandros T. Demos ,  Hari K. Ponnekanti ,  Jun Zhao ,  Helen R. Armer

    IPC: H01J37/30

    CPC classification number: H01J37/317 ,  H01J3/025 ,  H01J37/077

    Abstract: One embodiment of the present invention is an electron beam treatment apparatus that includes: (a) a chamber; (b) a cathode having a surface of relatively large area that is exposed to an inside of the chamber; (c) an anode having holes therein that is disposed inside the chamber and spaced apart from the cathode by a working distance; (d) a wafer holder disposed inside the chamber facing the anode; (e) a source of negative voltage whole output is applied to the cathode to provide a cathode voltage; (f) a source of voltage whose output is applied to the anode; (g) a gas inlet adapted to admit gas into the chamber at an introduction rate; and (h) a pump adapted to exhaust gas from the chamber at an exhaust rate, the introduction rate and the exhaust rate providing a gas pressure in the chamber; wherein values of cathode voltage, gas pressure, and the working distance are such that there is no arcing between the cathode and anode and the working distance is greater than an electron mean free path.

    Abstract translation: 本发明的一个实施例是一种电子束处理装置，包括：（a）室; （b）具有暴露于所述室内部的相对较大面积表面的阴极; （c）其中具有孔的阳极，其设置在室内并与阴极间隔开工作距离; （d）设置在面向阳极的腔室内的晶片保持器; （e）将负电压全输出源施加到阴极以提供阴极电压; （f）其输出端施加到阳极的电压源; （g）气体入口，其适于以引入速率将气体引入所述腔室; 以及（h）适于以排气速度从所述室排出气体的泵，所述引入速率和排气速率在所述室中提供气体压力; 其中阴极电压，气体压力和工作距离的值使得阴极和阳极之间没有电弧，并且工作距离大于电子平均自由程。

    Uniformity correction for large area electron source
    185.
    发明授权
    Uniformity correction for large area electron source 有权
    大面积电子源的均匀性校正

    公开(公告)号：US06407399B1

    公开(公告)日：2002-06-18

    申请号：US09408926

    申请日：1999-09-30

    Applicant: William R. Livesay

    Inventor： William R. Livesay

    IPC: H01J3730

    CPC classification number: H01J1/36 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/31779

    Abstract: The invention pertains to electron exposure equipment useful for exposing, treating and processing coatings and other materials by a cold cathode gas discharge electron source having a broad uniform emitting area. The apparatus has a vacuum chamber; a large surface area cathode in the vacuum chamber and means for applying a negative voltage to the cathode and causing the cathode to issue electrons toward a target in the vacuum chamber. An anode is positioned between the cathode and the target. The anode is formed of an electrically conductive grid having an array of apertures therethrough extending from a center of the grid to an edge of the grid. In one embodiment the apertures have a progressively increasing area from the center of the grid to the edge of the grid. In another embodiment the anode has a progressively decreasing thickness from the center of the grid to the edge of the grid. In yet another embodiment the anode has both progressively increasing area from the center of the grid to the edge of the grid and a progressively decreasing thickness from the center of the grid to the edge of the grid. A voltage is applied to the anode which is positive relative to the voltage applied to the cathode.

    Abstract translation: 本发明涉及用于通过具有宽均匀发射面积的冷阴极气体放电电子源对涂层和其它材料进行曝光，处理和加工的电子曝光设备。 该装置具有真空室; 真空室中的大的表面积阴极和用于向阴极施加负电压并使阴极向真空室中的靶发射电子的装置。 阳极位于阴极和靶之间。 阳极由导电栅格形成，其具有从栅极的中心延伸到栅格的边缘的孔的阵列。 在一个实施例中，孔具有从栅格的中心到栅格的边缘的逐渐增加的面积。 在另一个实施例中，阳极从网格的中心到网格边缘的厚度逐渐减小。 在又一实施例中，阳极具有从栅格的中心到栅格的边缘的逐渐增加的面积，以及从网格的中心到栅格的边缘的逐渐减小的厚度。 对阳极施加电压，阳极相对于施加到阴极的电压为正。

    Ion plasma electron gun
    186.
    发明授权
    Ion plasma electron gun 失效
    离子等离子体电子枪

    公开(公告)号：US4755722A

    公开(公告)日：1988-07-05

    申请号：US22123

    申请日：1987-03-05

    Applicant: George Wakalopulos

    Inventor： George Wakalopulos

    IPC: H01J3/02 ,  H01J33/00 ,  H01S3/038 ,  H01S3/0959 ,  H01J7/24

    CPC classification number: H01J33/00 ,  H01J3/021 ,  H01J3/025 ,  H01S3/038 ,  H01S3/0959

    Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

    Abstract translation: 一种用于产生具有均匀电子分布的大面积电子束的离子等离子体电子枪。 通过等离子体放电室中的线产生的正离子通过提取栅格被加速到包含高压冷阴极的第二室中。 这些正离子轰击阴极的表面，导致阴极发射形成电子束的二次电子。 在通过提取格栅和等离子体放电室之后，电子束通过第二格栅和支撑在第二格栅上的箔窗口从枪射出。 枪被构造成使得通过箔窗的电子束具有相当大的面积和均匀的电子分布，其基本上与入射到阴极上的离子束的离子分布相同。 所产生的电子束的控制是通过在电极和等离子体室的接地壳体之间施加控制电压来控制正离子轰击阴极的密度来实现的。

    Broad-beam electron source
    187.
    发明授权
    Broad-beam electron source 失效
    宽射束电子源

    公开(公告)号：US4684848A

    公开(公告)日：1987-08-04

    申请号：US787665

    申请日：1985-10-15

    Applicant: Harold R. Kaufman ,  Raymond S. Robinson

    Inventor： Harold R. Kaufman ,  Raymond S. Robinson

    IPC: H01J3/02 ,  H01J37/077 ,  H01J7/24 ,  H05B31/26

    CPC classification number: H01J37/077 ,  H01J3/025

    Abstract: A broad-beam electron source has a chamber into which is introduced an ionizing gas. Electrons are emitted between a cathode and an anode assembly to ionize that gas. The electrons within the plasma are drawn outwardly from the chamber through an apertured wall, which constitutes a screen, and thereafter are accelerated toward a target in a well-directed beam. A comparatively copious supply of electrons is developed, while yet requiring only low voltages in connection with its generation and resulting in correspondingly low electron energies. Ions produced external to the electron source itself are utilized to assist in neutralizing the charge density of the electron beam in order to help maintain its definition. For insulative targets, secondarily emitted electrons permit conservation of surface charge.

    Abstract translation: 宽束电子源具有引入离子化气体的室。 电子在阴极和阳极组件之间发射以使该气体电离。 等离子体内的电子通过孔壁向外从室中向外拉出，该多孔壁构成屏幕，然后在良好定向的光束中向目标加速。 开发了相当丰富的电子供应，同时仅需要与其产生相关的低电压并导致相应的低电子能量。 在电子源外部产生的离子本身被用于帮助中和电子束的电荷密度，以帮助维持其定义。 对于绝缘目标，次要发射的电子可以保持表面电荷。

    Sliding spark source cold cathode electron gun and method
    188.
    发明授权
    Sliding spark source cold cathode electron gun and method 失效
    滑动火花源冷阴极电子枪及方法

    公开(公告)号：US4163172A

    公开(公告)日：1979-07-31

    申请号：US813892

    申请日：1977-07-08

    Applicant: Gary K. Loda

    Inventor： Gary K. Loda

    IPC: H01J3/02 ,  H01J1/46 ,  H01J21/10

    CPC classification number: H01J3/025

    Abstract: A broad beam DC cold cathode electron gun with a plurality of plasma emitters formed by a capacitively coupled sliding spark assembly operable as a steady state as well as a pulsed device. Stabilization of the plasma emission current is attained through a feedback loop between the spark assembly and the grid bias supply.

    Abstract translation: 具有由可操作为稳定状态的电容耦合滑动火花组件形成的多个等离子体发射体以及脉冲装置的宽束直流冷阴极电子枪。 等离子体发射电流的稳定通过火花组件和电网偏压电源之间的反馈回路获得。

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