公开(公告)号：KR1020120090018A

公开(公告)日：2012-08-16

申请号：KR1020120060961

申请日：2012-06-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사카모토타카히로 ,  사카이미츠히로 ,  야히로슌이치

IPC: F26B5/04 ,  F26B9/06 ,  F26B15/12 ,  F26B15/18

Abstract: PURPOSE: A decompressing and drying device is provided to prevent imprints on coating solutions, and to reduce vibration generated by the operation of a transfer tool. CONSTITUTION: A decompressing and drying device(23b) comprises a chamber(6), a gate member(64), a decompressing tool, and a transfer tool(7). The chamber comprises inlet and outlet ports(61.62) for a substrate(G) in the side wall part. The chamber horizontally receives the substrate from the inlet port. The gate member opens and closes the inlet and outlet ports. The decompressing tool decompresses the chamber in state where the inlet and outlet ports are closed. The transfer tool transfers the substrate to the chamber from the inlet port.

Abstract translation: 目的：提供减压干燥装置，以防止涂层溶液上的印痕，并减少由转印工具的操作产生的振动。 构成：减压干燥装置（23b）包括腔室（6），门部件（64），减压工具和转移工具（7）。 该室包括用于侧壁部分中的基底（G）的入口和出口（61.62）。 该室从入口水平地接收基底。 闸门构件打开和关闭入口和出口。 减压工具在入口和出口关闭的状态下对室进行减压。 转移工具从入口将衬底转移到腔室。

公开(公告)号：KR1020100026985A

公开(公告)日：2010-03-10

申请号：KR1020090072703

申请日：2009-08-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 소마야스타카 ,  야히로슌이치

IPC: H01L21/677 ,  B65G49/06 ,  B65G13/00 ,  G02F1/13

CPC classification number: H01L21/67706 ,  B65G13/00 ,  B65G39/02 ,  B65G49/061 ,  B65G49/063 ,  G02F1/1303

Abstract: PURPOSE: A device for transferring a substrate is provided to prevent a stain on a process layer from generating by reducing the heat-transfer differences between a transfer roller and the substrate. CONSTITUTION: A transfer roller(50) is supported by a rotary shaft(51) The transfer roller is rotatable to the direction of a substrate transfer. One end(50b) of the transfer roller is connected and fixed to an adjacent roller unit(52). A driving part drives the rotary shaft. The outer surface of the transfer roller is a concavo-convex shape.

Abstract translation: 目的：提供一种用于转移基板的装置，以通过减少转印辊和基板之间的传热差异来防止工艺层上的污染。 构成：转印辊（50）由旋转轴（51）支撑。转印辊可以旋转到基板转印的方向。 转印辊的一端（50b）连接并固定到相邻的辊单元（52）上。 驱动部件驱动旋转轴。 转印辊的外表面是凹凸形状。

公开(公告)号：KR1020170103455A

公开(公告)日：2017-09-13

申请号：KR1020160026393

申请日：2016-03-04

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오노우에고우타로우 ,  야히로슌이치

IPC: H01L51/56 ,  H01L51/00 ,  B41J29/393 ,  H01L21/66

Abstract: 본발명은피토출체에토출되는액적을적절히검사하는것을목적으로한다. 액적검사장치(1)는, 액적(21)을포함하는검사시트(20) 상의조사(照射) 영역(22)에자외선을조사하는조사부(10)와, 액적(21)[또는검사시트(20)]이발광한조사영역(22)을촬상하는촬상부(11)와, 촬상부(11)의광축상에설치되고, 검사시트(20)에서반사된자외선(31)을차단하는자외선차단필터(12)와, 촬상부(11)에의해촬상된촬상화상에기초하여, 액적(21)의크기및 검사시트(20) 상의액적(21)의위치를계측하는계측부(13a)를갖는다.

Abstract translation: 本发明的目的是适当检查喷射到目标物体上的液滴。 液滴检查装置1具有照射部10，该照射部10对包含液滴21和液滴21的检查用片20上的照射区域22照射紫外线 设置在图像捕获单元11的光轴上并阻挡由测试片20反射的紫外线31的紫外线阻挡滤光片（未示出） 以及计量部13a，用于基于由成像部11拾取的捕获图像来测量液滴21的尺寸和液滴21在检查片20上的位置。

公开(公告)号：KR1020160048013A

公开(公告)日：2016-05-03

申请号：KR1020150148085

申请日：2015-10-23

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 후지타나오키 ,  이시다히로시 ,  야히로슌이치 ,  이케다후미히코

IPC: G02F1/1343 ,  H01L21/027

Abstract: 본발명은 IPS 방식, FFS 방식의액정구동방식등의액정표시장치를제조하는데 있어서, 해상도가낮은종래일반의노광장치를이용해도, 한층더한화소전극의협피치화를가능하게하는것을목적으로한다. 유리기판(G) 상에화소전극의패턴을형성하는방법으로서, 유리기판(G) 상의화소전극층(1)의상면에, 상기패턴의제1 스페이스부가되는부분에레지스트(2)를형성하고, 그후 희생막을형성하며, 계속해서잔치(殘置) 희생막(3a, 3b)을남기고희생막을제거하여, 화소전극층(1)의상면에상기패턴의제2 스페이스부(S2)를형성한다. 그후 레지스트(2)를제거하여, 상기패턴의제2 스페이스부를형성하고, 계속해서상기제1 스페이스부, 제2 스페이스부의측방에, 컨택트부의레지스트를형성하며, 그후 제1 스페이스부, 제2 스페이스부의화소전극층을제거한다.

Abstract translation: 本发明的目的在于，即使使用具有低分辨率的传统通用曝光装置，也可以使液晶驱动系统的液晶显示装置如IPS型或 一种FFS类型。 在玻璃基板（G）上形成像素电极的图案的方法包括在像素电极层（1）的上表面上形成为图案的第一空间部分的部分上形成抗蚀剂（2） 所述玻璃基板（G）形成牺牲层，去除除了残留牺牲层（3a，3b）之外的所述牺牲层以在所述像素电极层（1）的上表面上形成所述图案的第二空间部分（S2） 去除抗蚀剂（2），形成图案的第二空间部分，在第一和第二空间部分的侧部形成接触部分的抗蚀剂，并且去除第一和第二空间部分的像素电极层。

公开(公告)号：KR101299763B1

公开(公告)日：2013-08-23

申请号：KR1020070007599

申请日：2007-01-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 소우마야스타카 ,  사카이미츠히로 ,  와다노리오 ,  야히로슌이치

IPC: H01L21/02

CPC classification number: H01L2924/0002 ,  H01L2924/00

Abstract: 본 발명은, 기판이 대형이더라도, 처리량의 향상을 도모하면서 기판의 뒤틀림 및 파손을 확실하게 방지하는 것이 가능한 기판 냉각 장치를 제공한다.
기판 냉각 장치(25)는, 가열 후의 기판(G)을 일방향으로 반송하는 반송로로서의 롤러 반송 기구(5)와, 롤러 반송 기구(5)에 의해 반송되고 있는 기판(G)을 냉각하는 냉각 기구(7)를 구비하고, 냉각 기구(7)는, 롤러 반송 기구(5)를 따라 반송 방향 상류측으로부터 차례로 예비 냉각실(65a)과 주냉각실(65b)이 배치되어 있으며, 가열 후의 기판(G)을 예비 냉각실(65a)에서 냉각하고 기판(G)의 조열(粗熱) 제거를 행한 후, 이 기판(G)을 주냉각실(65b)에서 소정의 온도로 냉각한다.

公开(公告)号：KR1020110031112A

公开(公告)日：2011-03-24

申请号：KR1020100090464

申请日：2010-09-15

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야히로슌이치 ,  사다데쓰야 ,  구보마코토

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  G03F1/60 ,  G03F7/202

Abstract: PURPOSE: A thermal treating apparatus is provided to uniformize a linewidth of a wiring pattern between substrates and on the surface of the substrate by suppressing the difference of a thermal treatment temperature. CONSTITUTION: A substrate transferring unit(10) continuously transfers a plurality of substrates along a substrate transfer path. A first chamber(8) forms a thermal treatment space for a substrate transferred through a substrate transfer path. A clean air supply unit is arranged on the front of the first chamber and blows clean air to the substrate transfer path. A control unit(50) controls the amount of clean air by the clean air supply unit. The first chamber has an inlet for transferring the substrate on the substrate transfer path. The clean air from the clean air supply unit is supplied from the inlet to the first chamber.

Abstract translation: 目的：提供一种热处理装置，通过抑制热处理温度的差异来均匀化基板之间和基板表面上的布线图案的线宽。 构成：基板传送单元（10）沿着基板传送路径连续地传送多个基板。 第一室（8）形成用于通过衬底传送路径传送的衬底的热处理空间。 清洁空气供应单元布置在第一室的前部，并将清洁空气吹送到基板传送路径。 控制单元（50）通过清洁空气供应单元来控制清洁空气的量。 第一室具有用于将衬底转移到衬底传送路径上的入口。 来自清洁空气供应单元的清洁空气从入口供应到第一室。

公开(公告)号：KR1020090127059A

公开(公告)日：2009-12-09

申请号：KR1020090045015

申请日：2009-05-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야히로슌이치 ,  후타마타유우스케

IPC: H01L21/027

CPC classification number: G03F7/168 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/67098 ,  H01L21/67248

Abstract: PURPOSE: A decompressing drying unit is provided to prevent traces of pins supporting a treated substrate from being transferred to the substrate, by performing drying treatment of a treatment solution for the substrate coated with the treatment solution. CONSTITUTION: A chamber(106) accommodates a treated substrate(G). A decompressing part(142) decompresses in the chamber. Plural lift pins(128) are arranged in the chamber, and support the treated substrate from the bottom. A lift pin lifting part lifts a lift pin in each group independently, by grouping the plural lift pins. A substrate temperature range detection part detects temperature of the substrate varying according to the decompressing drying treatment. A lift pin temperature control part sets a contact part with the substrate in the pin to have a fixed temperature included in the temperature range detected by the substrate temperature range detection part. A control part controls the operation of the lift pin lifting part.

Abstract translation: 目的：通过对涂覆有处理溶液的基材的处理溶液进行干燥处理，提供减压干燥单元以防止支撑经处理的基材的引脚的痕迹被转移到基底。 构成：室（106）容纳经处理的基板（G）。 减压部件（142）在腔室中减压。 多个提升销（128）布置在室中，并从底部支撑经处理的基板。 升降销提升部件通过分组多个提升销钉独立地提升每个组中的升降销。 基板温度范围检测部检测根据减压干燥处理而变化的基板的温度。 升降针温度控制部将与针脚中的基板的接触部设定为具有由基板温度范围检测部检测出的温度范围内的固定温度。 控制部件控制升降杆提升部件的操作。

公开(公告)号：KR1020070061418A

公开(公告)日：2007-06-13

申请号：KR1020060123948

申请日：2006-12-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 소마야스타카 ,  와다노리오 ,  야히로슌이치

IPC: H01L21/027 ,  H01L21/324

CPC classification number: H01L21/67109 ,  H01L21/67173 ,  H01L21/67207

Abstract: A heat treatment apparatus is provided to restrain the damage of a large sized substrate and to reduce the size of the apparatus by using a transfer path enclosed with a casing and first/second sheet type heaters. A heat treatment apparatus includes a transfer path for transferring a substrate to one way, a casing, and first and second sheet type heaters. The casing(6) is used for enclosing the transfer path. The first and second sheet type heaters(71a to 71r, 72a to 72r) are arranged along the transfer path in the casing. The first and second sheet type heaters are installed adjacent to both sides of the substrate. The transfer path is composed of a plurality of rotator members spaced apart from each other. The first and second sheet type heaters are installed at portions between the rotator members.

Abstract translation: 提供一种热处理装置，用于限制大尺寸基板的损坏，并且通过使用由壳体和第一/第二片式加热器封装的传送路径来减小设备的尺寸。 热处理设备包括用于将衬底转移到单向的传送路径，壳体以及第一和第二片状加热器。 壳体（6）用于封闭传送路径。 第一和第二片式加热器（71a至71r，72a至72r）沿壳体中的传送路径布置。 第一和第二片式加热器安装在基片的两侧附近。 传送路径由彼此间隔开的多个旋转体构件构成。 第一和第二片式加热器安装在旋转件之间的部分。