-
公开(公告)号：KR101104093B1
公开(公告)日：2012-01-12
申请号：KR1020100029120
申请日：2010-03-31
Applicant: 한국표준과학연구원
Abstract: 본 발명은 내부 안테나 및 플라즈마 발생 장치를 제공한다. 이 내부 안테나는 진공용기의 내부에 직접 삽입되어 플라즈마를 발생시킨다. 내부 안테나는 일단에 전력이 공급되고 타단에서 전력이 4갈래로 분배되는 전원 공급부, 전원 공급부와 수직하게 배치된 전력 분배 평면에 배치되고 전원 공급부의 타단에서 대칭적으로 4 갈래로 갈라지는 주 방사상(main radial) 브랜치들, 인접한 주 방사상 브랜치들을 서로 연결시키는 외곽 브랜치들, 외곽 브랜치들의 중심 영역에서 전원 공급부의 타단 방향으로 연장되는 보조 방사상 브랜치들(sub radial), 및 보조 방사상 브랜치들에 각각 연결되고 전원 공급부와 평행하게 연장되는 접지부들을 포함한다.
-
公开(公告)号：KR1020110121790A
公开(公告)日：2011-11-09
申请号：KR1020100041241
申请日：2010-05-03
Applicant: 한국표준과학연구원
CPC classification number: H01J37/3211 , H01F27/427 , H01J37/32183 , H01J37/32577 , H05H1/46 , H05H2001/4667 , H05H2001/4682
Abstract: PURPOSE: A plasma generating apparatus and a transformer are provided to generate the symmetric plasma of high density by serially and/or parallely combining CCP(Capacitively Coupled Plasma) with ICP(Inductively Coupled Plasma) in various types. CONSTITUTION: A plasma generating apparatus comprises an internal antenna(122) which is inserted in a plasma chamber(101) and a transformer(110) which supplies power to the internal antenna. The transformer includes a center conducting wire(114) and a plurality of coaxial cables which includes the cladding conducting wires(112) surrounding the center conducting wire. One end of the center conducting wire is connected to RF power(132). The other end of the center conducting wire is grounded. The cladding conducting wires are serially connected each other. The internal antenna is connected to one end of the center conducting wire and the cladding conducting wires. The plasma chamber includes a lid(102) and a cylindrical chamber(104).
Abstract translation: 目的：提供等离子体发生装置和变压器，通过串联和/或并联组合CCP（电容耦合等离子体）与各种类型的ICP（感应耦合等离子体）来产生高密度的对称等离子体。 构成：等离子体产生装置包括插入在等离子体室（101）中的内部天线（122）和向内部天线供电的变压器（110）。 变压器包括中心导线（114）和多个同轴电缆，其包括围绕中心导线的包层导线（112）。 中心导线的一端连接到RF电源（132）。 中心导线的另一端接地。 包层导线彼此串联连接。 内部天线连接到中心导线和包层导线的一端。 等离子体室包括盖（102）和圆柱形室（104）。
-
公开(公告)号：KR101059962B1
公开(公告)日：2011-08-26
申请号：KR1020090037752
申请日：2009-04-29
Applicant: 한국표준과학연구원
Abstract: 본 발명은 대기압 플라즈마 장치 및 대기압 플라즈마 오염물 처리 장치를 제공한다. 이 대기압 플라즈마 장치는 제1 방향으로 대칭적인 테이퍼 형상을 가지는 테이퍼부를 포함하는 제1 전극, 제1 전극의 테이퍼부의 둘레에 배치되고 제1 방향으로 플라즈마 출구를 포함하는 제2 전극, 및 제1 전극에 전기적으로 연결되는 전원을 포함하되, 테이퍼부와 제2 전극 사이의 간격은 균일하게 유지되고, 간격은 방전 공간을 제공할 수 있다.
대기압 플라즈마, 가변 전극, 세탁, 살균Abstract translation: 本发明提供一种大气压等离子体装置和一种大气压等离子体污染物处理装置。 大气压等离子体装置是设置在所述锥形部的外周的第一电极，第一电极包括具有在第一方向上，包括在第一方向上的等离子体出口的对称锥形的锥形部分的第二电极，和第一电极 其中锥形部分和第二电极之间的间隙保持均匀，并且该间隙可以提供放电空间。
-
公开(公告)号：KR1020090062886A
公开(公告)日：2009-06-17
申请号：KR1020070130359
申请日：2007-12-13
Applicant: 한국표준과학연구원
IPC: H01L21/205 , H01L21/02
CPC classification number: H01J37/32917 , H01L22/34
Abstract: An anti-plasma evaluation method is provided to maintain a constant plasma density in a chamber by controlling the power of the plasma generator based on the plasma density. A process of manufacturing a specimen is performed(P1). A withstand voltage of the manufactured specimen is measured by performing an initial withstand voltage measurement process(P2). An operation condition of the plasma generating chamber is set to an experiment environment(P3). The specimen is positioned on the set chamber. The anti-plasma experiment process is performed by exposing the specimen to the plasma(P4). The withstand voltage of the specimen is measured(P5). The measured second withstand voltage value is compared with the initial withstand measurement value(P6).
Abstract translation: 提供了一种抗等离子体评估方法，通过基于等离子体密度控制等离子体发生器的功率来维持腔室中恒定的等离子体密度。 进行试样的制造工序（P1）。 通过进行初始耐受电压测量处理（P2）来测量制造的试样的耐压。 将等离子体产生室的操作条件设定为实验环境（P3）。 试样位于固定室上。 通过将样品暴露于等离子体（P4）来进行抗等离子体实验过程。 测量样品的耐受电压（P5）。 将测得的第二耐受电压值与初始耐受测量值（P6）进行比较。
-
公开(公告)号：KR1020090062885A
公开(公告)日：2009-06-17
申请号：KR1020070130358
申请日：2007-12-13
Applicant: 한국표준과학연구원
Abstract: A coating performance evaluation apparatus is provided to place a plurality of specimens in a tray so as to perform measurement under the same condition. A coating performance evaluation apparatus comprises a chamber(20) with a hollow cavity, a chemical vessel(30) which is installed on the bottom of the chamber to contain etchant solution having acidity, a tray(40) installed in the middle of the chamber, a plasma generating device(50) installed on the top of the chamber, and a heating unit creating high temperature in the chamber. The tray has a through hole so that the coated surface of a specimen(90) is exposed to the etchant gas.
Abstract translation: 提供涂层性能评价装置，将多个试样放置在托盘中，以在相同的条件下进行测量。 涂料性能评价装置包括具有中空腔的腔室（20），安装在腔室底部以容纳具有酸度的蚀刻剂溶液的化学容器（30），安置在腔室中部的托盘（40） ，安装在所述室顶部的等离子体产生装置（50）以及在所述室中产生高温的加热单元。 托盘具有通孔，使得样品（90）的涂覆表面暴露于蚀刻剂气体。
-
Patent Agency Ranking
公开(公告)号：KR1020090055059A
公开(公告)日：2009-06-02
申请号：KR1020070121777
申请日：2007-11-28
Applicant: 한국표준과학연구원
Abstract: A volume measurement device and a measurement method thereof are provided to measure volume of complicated sample precisely. A volume measurement method comprises a step(S100) which measures volume and pressure of a piston; a step(S200) which loads a sample in a chamber and measures an initial pressure inside the chamber; a step(S300) which inflows a constant flow rate to the chamber; and a step(S400) which measures pressure of the chamber and extracts the volume of sample. The volume of the sample is extracted by using a boyle-charles' law. The flow rate is flowed into the chamber through the piston or a mass flow controller. The step which measures the initial pressure by loading the sample into the chamber comprises a step which exhausts the chamber under a reference pressure and a step which stops the exhaustion and measures the initial pressure.
Abstract translation: 提供体积测量装置及其测量方法来精确地测量复杂样品的体积。 体积测量方法包括测量活塞的体积和压力的步骤（S100） 步骤（S200），其将样品装载在室中并测量室内的初始压力; 步骤（S300），其向腔室流入恒定的流量; 以及测量室的压力并提取样品体积的步骤（S400）。 通过使用boyle-charles定律提取样品的体积。 流量通过活塞或质量流量控制器流入腔室。 通过将样品装载到室中来测量初始压力的步骤包括在参考压力下排出室的步骤和停止耗尽并测量初始压力的步骤。
-
公开(公告)号：KR1020090014798A
公开(公告)日：2009-02-11
申请号：KR1020070079049
申请日：2007-08-07
Applicant: 한국표준과학연구원
Abstract: An infrared spectrometer capable of performing real-time process diagnosis is provided to perform spectrum analysis in a vacuum state using infrared rays to correctly measure beam intensity to thereby improve measurement sensitivity. An infrared spectrometer capable of real-time process diagnosis includes an incident window(11), a receiving part(12), a projecting window(13), a reactor(10), a detector(20), and an analyzer(30). A beam is inputted to the incident window. The receiving part receives the incident beam. The projecting window projects a beam obtained when the incident beam is refracted and scattered according to reaction by-product or reactant. The reactor includes a reflecting mirror(14) and has a vacuum state. The reflecting mirror reflects the beam inputted to the incident window such that the beam reciprocates in the receiving part at least once and is projected through the projecting window. The detector detects the beam projected from the reactor. The analyzer performs quantitative and qualitative analysis of a sample by using the intensity of the detected beam.
Abstract translation: 提供能够执行实时过程诊断的红外光谱仪，以使用红外线在真空状态下进行光谱分析，以正确地测量光束强度，从而提高测量灵敏度。 能够进行实时处理诊断的红外光谱仪包括入射窗（11），接收部（12），投影窗（13），反应器（10），检测器（20）和分析器（30） 。 光束被输入到入射窗口。 接收部分接收入射光束。 当入射光束根据反应副产物或反应物折射和散射时，投影窗投射出所获得的光束。 反应器包括反射镜（14）并且具有真空状态。 反射镜反射输入到入射窗的光束，使得光束在接收部分中往复运动至少一次，并通过投影窗口投影。 检测器检测从反应器投射的光束。 分析仪通过使用检测到的光束的强度来对样品进行定量和定性分析。
-
公开(公告)号：KR100833646B1
公开(公告)日：2008-05-30
申请号：KR1020060126324
申请日：2006-12-12
Applicant: 한국표준과학연구원
IPC: H01L21/3065
CPC classification number: H01J37/32935 , H01J37/32954
Abstract: An apparatus and a method for monitoring pulse plasma electron density and electron temperature are provided to simplify a measuring process and a monitoring process by using a natural frequency detection method. A trigger signal output unit outputs a trigger signal. An electromagnetic wave generator(300) transmits electromagnetic waves of a successive frequency band. An electromagnetic wave transceiver(200) is contacted with pulse plasma within a pulse plasma reaction receptacle(100) so that a frequency of the transmitting electromagnetic wave has a mutual relation to pulse plasma electron density and electron temperature. A frequency analyzer(400) is electrically connected to the electromagnetic wave transceiver in order to be synchronized with the trigger signal of the trigger signal output unit. A computer(500) is electrically connected to the electromagnetic wave generator in order to analyze the electron temperature and the electron density by extracting a cutoff frequency. The electromagnetic wave generator and the frequency analyzer are used for determining the cutoff frequency when a pulse of the pulse plasma is equal to or more than 200Hz. A network analyzer is used for determining the frequency according to the time variation when the pulse of the pulse plasma is equal to or less than 200Hz.
Abstract translation: 提供了用于监测脉冲等离子体电子密度和电子温度的装置和方法，以通过使用固有频率检测方法来简化测量过程和监视过程。 触发信号输出单元输出触发信号。 电磁波发生器（300）发射连续频带的电磁波。 电磁波收发器（200）与脉冲等离子体反应容器（100）内的脉冲等离子体接触，使得发射电磁波的频率与脉冲等离子体电子密度和电子温度有相互关系。 频率分析器（400）电连接到电磁波收发器，以便与触发信号输出单元的触发信号同步。 计算机（500）电连接到电磁波发生器，以通过提取截止频率来分析电子温度和电子密度。 当脉冲等离子体的脉冲等于或大于200Hz时，电磁波发生器和频率分析器用于确定截止频率。 当脉冲等离子体的脉冲等于或小于200Hz时，网络分析仪用于根据时间变化来确定频率。
-
公开(公告)号：KR1020080002308A
公开(公告)日：2008-01-04
申请号：KR1020060061055
申请日：2006-06-30
Applicant: 한국표준과학연구원
IPC: H01L21/02 , H01L21/66 , H01L21/3065
CPC classification number: H05H1/0062
Abstract: A device for monitoring an electron density and an electron temperature in a plasma state and a method for monitoring the same are provided to check simultaneously a state of a process device and be utilized as the process device with reliability by being used as a real-time monitoring device for a plasma state. A device for monitoring an electron density and an electron temperature in a plasma state includes an electromagnetic generator(300), an electromagnetic transmitter/receiver(200), a frequency analyzer(400), and a computer(500). The electromagnetic generator continuously transmits an electromagnetic wave of a sequence of a frequency band. The electromagnetic wave is related to the plasma state in a reaction chamber so as to have a correlation between the plasma electron density and the electron temperature, and transmits the electromagnetic wave electrically connected to the electromagnetic generator. The frequency analyzer is electrically connected to the electromagnetic transmitter/receiver so as to analyze the frequency of the electromagnetic wave received from the electromagnetic transmitter/receiver.
Abstract translation: 提供了一种用于监测等离子体状态下的电子密度和电子温度的装置及其监视方法，用于同时检查处理装置的状态，并通过用作实时的可靠性被用作处理装置 用于等离子体状态的监视装置。 用于监测等离子体状态的电子密度和电子温度的装置包括电磁发生器（300），电磁发射器/接收器（200），频率分析器（400）和计算机（500）。 电磁发电机连续发送频带序列的电磁波。 电磁波与反应室中的等离子体状态有关，以使等离子体电子密度与电子温度具有相关性，并且传输与电磁发生器电连接的电磁波。 频率分析仪电连接到电磁发射器/接收器，以分析从电磁发射器/接收器接收的电磁波的频率。
-
公开(公告)号：KR100724103B1
公开(公告)日：2007-06-04
申请号：KR1020050092789
申请日：2005-10-04
Applicant: 한국표준과학연구원
IPC: G01L11/02
Abstract: 본 발명은 적외선 카메라를 이용한 진공용기의 압력 측정 시스템에 관한 것이다. 이를 위해, 내부에 소정의 진공이 형성된 진공용기(10); 진공용기(10) 내에 구비되는 금속 시편(62); 진공용기(10)의 투시창에 밀착되어 진공용기(10) 내부의 시편(62)을 향해 적외선(60)을 조사하는 적외선 조사수단; 시편(62)으로부터 반사되는 적외선(60)을 영상으로 촬영하기 위한 적외선 카메라(40); 적외선 카메라(40)가 촬영한 영상에 기초하여 진공용기(10) 내의 압력변화에 따른 시편의 온도변화를 산출하는 온도 산출수단; 및 온도 산출수단에 의해 산출된 온도변화에 기초하여 진공용기(10) 내의 압력을 산출하는 압력 산출수단;으로 구성되는 것을 특징으로 하는 적외선 카메라를 이용한 진공용기의 압력 측정장치가 제공된다.
진공, 압력, 측정, 센서, 적외선, 카메라, 영상, 산출, 표시, 용기
-
-
-
-
-
-
-
-
-
Search Results
117
records
(took 0.025 seconds)
