公开(公告)号：US20240331968A1

公开(公告)日：2024-10-03

申请号：US18742934

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Albertus Victor Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1471 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24578

Abstract: A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array, and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.

公开(公告)号：US20240128043A1

公开(公告)日：2024-04-18

申请号：US18530109

申请日：2023-12-05

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST ,  Roy Ramon VEENSTRA ,  Erwin Paul SMAKMAN ,  Tom VAN ZUTPHEN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/12 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/147 ,  H01J2237/2448

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

公开(公告)号：US20180373159A1

公开(公告)日：2018-12-27

申请号：US16064366

申请日：2016-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin Paul SMAKMAN ,  Coen Adrianus VERSCHUREN

IPC: G03F7/20 ,  B22F3/105 ,  G21B3/00

Abstract: A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.

公开(公告)号：US20240339294A1

公开(公告)日：2024-10-10

申请号：US18743011

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Yan REN ,  Erwin Paul SMAKMAN ,  Jurgen VAN SOEST

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/1474 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28

Abstract: A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising: a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector; wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.

公开(公告)号：US20230048580A1

公开(公告)日：2023-02-16

申请号：US17790097

申请日：2021-01-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS ,  Maikel Robert GOOSEN ,  Erwin Paul SMAKMAN ,  Yan REN

IPC: H01J37/153

Abstract: An apparatus comprising a set of pixels configured to shape a beamlet approaching the set of pixels and a set of pixel control members respectively associated with each of the set of pixels, each pixel control member being arranged and configured to apply a signal to the associated pixel for shaping the beamlet.

公开(公告)号：US20220148842A1

公开(公告)日：2022-05-12

申请号：US17430307

申请日：2020-02-04

Applicant: ASML Netherlands B.V.

Inventor： Shakeeb Bin HASAN ,  Yan REN ,  Maikel Robert GOOSEN ,  Albertus Victor Gerardus MANGNUS ,  Erwin Paul SMAKMAN

IPC: H01J37/04

Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.

公开(公告)号：US20210375581A1

公开(公告)日：2021-12-02

申请号：US17403006

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo KASTRUP ,  Johannes Catharinus Hubertus MULKENS ,  Marinus Aart VAN DEN BRINK ,  Jozef Petrus Henricus BENSCHOP ,  Erwin Paul SMAKMAN ,  Tamara DRUZHININA ,  Coen Adrianus VERSCHUREN

IPC: H01J37/26 ,  H01J37/15 ,  H01J37/02 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US20210055660A1

公开(公告)日：2021-02-25

申请号：US16977503

申请日：2019-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexey Olegovich POLYAKOV ,  Erwin Paul SMAKMAN ,  Andrey NIKIPELOV ,  Albertus Victor Gerardus MANGNUS

IPC: G03F7/20 ,  G01N23/2251 ,  H01L21/67

Abstract: An inspection system that include a selective deposition tool configured to receive a sample and selectively deposit a material onto the sample, an inspection tool configured to perform an inspection process on the sample provided with the deposited material, and an enclosure configured to enclose the selective deposition tool and the inspection tool.

公开(公告)号：US20200312619A1

公开(公告)日：2020-10-01

申请号：US16830204

申请日：2020-03-25

Applicant: ASML Netherlands B.V.

Inventor： Albertus Victor Gerardus MANGNUS ,  Maikel Robert GOOSEN ,  Erwin Paul SMAKMAN

IPC: H01J37/317 ,  H01J37/244 ,  H01J37/24 ,  H01J37/304

Abstract: Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.

公开(公告)号：US20200249181A1

公开(公告)日：2020-08-06

申请号：US16652231

申请日：2018-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin Paul SMAKMAN ,  Albertus Victor Gerardus MANGNUS ,  Thomas Jarik HUISMAN

IPC: G01N23/2251 ,  G01B15/00 ,  H01J37/065 ,  H01J37/073 ,  H01J37/22 ,  H01J37/28 ,  G03F7/20

Abstract: An inspection method for a substrate, the inspection method including: providing an electron beam having a first polarization state to a sample of the semiconductor substrate; detecting a first response signal of the sample caused by interaction of the electron beam having the first polarization state with the sample; providing an electron beam having a second polarization state to the sample of the semiconductor substrate; detecting a second response signal of the sample caused by interaction of the electron beam having the second polarization state with the sample; and determining a geometric or material property of the sample, based on the first response signal and the second response signal.