公开(公告)号：CA3008474A1

公开(公告)日：2017-06-22

申请号：CA3008474

申请日：2016-12-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  DE GRAAF DENNIS ,  JANSSEN PAUL ,  PETER MARIA ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER ZANDE WILLEM JOAN ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM-PIETER

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine

公开(公告)号：CA2997135A1

公开(公告)日：2017-03-09

申请号：CA2997135

申请日：2016-08-26

Applicant: ASML NETHERLANDS BV

Inventor： HOUWELING ZOMER SILVESTER ,  CASIMIRI ERIC WILLEM FELIX ,  DRUZHININA TAMARA ,  JANSSEN PAUL ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  OOSTERHOFF SICCO ,  PETER MARIA ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM-PIETER

IPC: G03F1/62

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.