公开(公告)号：DE68923576D1

公开(公告)日：1995-08-31

申请号：DE68923576

申请日：1989-05-11

Applicant: CANON KK

Inventor： HARA SHINICHI ,  UZAWA SHUNICHI

IPC: G12B5/00 ,  F16F15/02 ,  G03F7/20 ,  G05D19/02 ,  G12B9/08 ,  H01L21/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/687 ,  H01L41/04

Abstract: A workpiece supporting mechanism suitably usable in an exposure apparatus, is disclosed. The mechanism includes a workpiece (1) supporting member (2) which is provided with a displacement sensor such as a speed sensor or an acceleration sensor (6). A vibrator (7) such as a piezoelectric device is added to the supporting member or a stage which supports the supporting member. Any vibration of the workpiece or the supporting member is detected by the displacement sensor (6) and, in accordance with the detection, the vibrator (7) is energized to cancel the vibration of the workpiece and the workpiece supporting member.

公开(公告)号：DE68921033T2

公开(公告)日：1995-06-22

申请号：DE68921033

申请日：1989-09-11

Applicant: CANON KK

Inventor： MORI MAKIKO ,  OZAWA KUNITAKA ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI ,  SAKAMOTO FIJI

IPC: G03F1/76 ,  G03F7/20 ,  H01L21/027

Abstract: A method of exposing a wafer to exposure energy such as ultraviolet rays or X-rays through a mask to transfer a pattern of the mask onto the wafer, for example. The temperature of the mask and/or the wafer increases during the exposure operation by absorption of the exposure energy. During the wafer being exposed, the temperature of the mask and/or the wafer is detected. If the temperature is going to exceed the exposable temperature range determined on the basis of the line width of the pattern to be transferred, the exposure operation is interrupted. Then, the heat accumulated in the mask and/or the wafer is removed. Thereafter, the exposure operation is resumed. This is repeated until the predetermined or required amount of exposure is reached, for one shot. By this, the thermal expansion of the mask and the wafer during the exposure operation is prevented to assure the precision of the pattern transfer.

公开(公告)号：DE68921033D1

公开(公告)日：1995-03-23

申请号：DE68921033

申请日：1989-09-11

Applicant: CANON KK

Inventor： MORI MAKIKO ,  OZAWA KUNITAKA ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI ,  SAKAMOTO FIJI

IPC: G03F1/76 ,  G03F7/20 ,  H01L21/027

Abstract: A method of exposing a wafer to exposure energy such as ultraviolet rays or X-rays through a mask to transfer a pattern of the mask onto the wafer, for example. The temperature of the mask and/or the wafer increases during the exposure operation by absorption of the exposure energy. During the wafer being exposed, the temperature of the mask and/or the wafer is detected. If the temperature is going to exceed the exposable temperature range determined on the basis of the line width of the pattern to be transferred, the exposure operation is interrupted. Then, the heat accumulated in the mask and/or the wafer is removed. Thereafter, the exposure operation is resumed. This is repeated until the predetermined or required amount of exposure is reached, for one shot. By this, the thermal expansion of the mask and the wafer during the exposure operation is prevented to assure the precision of the pattern transfer.

公开(公告)号：GB2139038A

公开(公告)日：1984-10-31

申请号：GB8404878

申请日：1984-02-24

Applicant: CANON KK

Inventor： HATANAKA KATSUNORI ,  KURODA YASUO ,  UZAWA SHUNICHI

IPC: H04N1/028 ,  G06T1/00 ,  H01L27/146 ,  H04N1/40 ,  H04N5/14 ,  H04N3/14

Abstract: An elongated photoelectric converter unit having a good S/N characteristic but no crosstalk without using any blocking diode. The photoelectric converter comprising: a signal amplifying device having m photosensor groups each consisting of n photosensor elements and n signal amplifying elements connected to the photosensor elements in each group; first and second sample and hold device each having n sample and hold elements connected to the signal amplifying elements; first and second input signal selecting device connected to those first and second sample and hold device, respectively, each of the first and second input signal selecting device having n input signal selecting elements provided corresponding to the respective sample and hold elements of each sample and hold device; and an amplifying device for amplifying the difference between the values of the signals to be transferred from the respective first and second input signal selecting device as a signal and outputting.

公开(公告)号：GB2108801A

公开(公告)日：1983-05-18

申请号：GB8228796

申请日：1982-10-08

Applicant: CANON KK

Inventor： UZAWA SHUNICHI ,  MORI TETSUZO ,  KOUMURA NOBORU

IPC: H04N1/32 ,  H04B9/00 ,  B41L19/00

Abstract: An image transmission apparatus for light-signal image transmission is easy to install and relocate and ensures reliable transmission between a plurality of readers in remote locations and a central recorder. Each reader provides data signals and command signals for controlling the operation of the recorder from the quantized image data of an original. The amplified and frequency-modulated signals proceded by image or command header signals are transmitted to the recorder. A signal intensity from the reader may be discriminated to be above a minimum acceptable level before being recorded, with an indicator of a recorder provided to warn an operator of an unacceptable low level, thereby preventing low-quality recording; a recording state may be indicated to the operator by a lamp or a buzzer. The recorder may further have a transmission request register and a priority encoder for resolving a contention arising when two or more readers simultaneously request service, by generating and assigning priority codes to each reader. The priority codes may be either predetermined, for example, so as to give one reader emergency priority over all other readers, or may be arbitrarily set according to demand.

公开(公告)号：DE3237410A1

公开(公告)日：1983-04-28

申请号：DE3237410

申请日：1982-10-08

Applicant: CANON KK

Inventor： UZAWA SHUNICHI ,  MORI TETSUZO ,  KOUMURA NOBORU

IPC: H04N1/32 ,  H04N1/00

Abstract: An image transmission apparatus for light-signal image transmission is easy to install and relocate and ensures reliable transmission between a plurality of readers in remote locations and a central recorder. Each reader provides data signals and command signals for controlling the operation of the recorder from the quantized image data of an original. The amplified and frequency-modulated signals proceded by image or command header signals are transmitted to the recorder. A signal intensity from the reader may be discriminated to be above a minimum acceptable level before being recorded, with an indicator of a recorder provided to warn an operator of an unacceptable low level, thereby preventing low-quality recording; a recording state may be indicated to the operator by a lamp or a buzzer. The recorder may further have a transmission request register and a priority encoder for resolving a contention arising when two or more readers simultaneously request service, by generating and assigning priority codes to each reader. The priority codes may be either predetermined, for example, so as to give one reader emergency priority over all other readers, or may be arbitrarily set according to demand.

公开(公告)号：DE69033791T2

公开(公告)日：2002-05-23

申请号：DE69033791

申请日：1990-10-19

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI ,  AMEMIYA MITSUAKI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: An X-ray exposure apparatus, for transferring a pattern of the mask (13) to a wafer (15), includes an X-ray source accommodating chamber (50); a mask chuck (14) for supporting the mask; a wafer chuck (16) for supporting the wafer; a stage (18) for moving the wafer chuck; a stage accommodating chamber (19) for accommodating therein the mask chuck, the wafer chuck and the stage; a barrel (5) for coupling the X-ray source accommodating chamber with the stage accommodating chamber, to define an X-ray projection passageway (30); a blocking window (6) provided in the X-ray projection passageway, for isolating the ambience in the X-ray accommodating chamber and the ambience in the stage accommodating chamber from each other; and a gas supply port (3) contributable to fill the stage accommodating chamber with a gas ambience of low X-ray absorption. The gas supply port opens to the X-ray projection passageway at a position between the blocking window and the mask supported by the mask chuck.

公开(公告)号：DE69033499D1

公开(公告)日：2000-05-11

申请号：DE69033499

申请日：1990-09-28

Applicant: CANON KK

Inventor： OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  OHTA HIROSHI ,  MORI MAKIKO ,  NOSE NORIYUKI

IPC: G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30

Abstract: An alignment method for use in an exposure apparatus for printing a pattern of an original (2) onto different surface areas of a substrate (3), the alignment method comprising the steps of: providing alignment marks around the pattern of the original and placing the original on an original supporting stage (4); providing a reference mark (14) on an X-Y stage (24) for supporting the substrate and being movable in X and Y directions, and moving the X-Y stage so as to place the reference mark at those positions, in sequence, which correspond to the alignment marks of the original, respectively, and which are preset in respect to a stage coordinate system; detecting, in sequence, positional errors of the alignment marks of the original with respect to the corresponding set positions, respectively, by using the reference mark and through the movement of the X-Y stage, wherein the positional errors are detected by use of positional error detectors (12) which are provided to be associated with the alignment marks of the original, respectively; calculating a rotational error of the original with respect to the stage coordinate system, in theta direction, by using the positional errors; and rotationally moving the original supporting table in the theta direction so as to correct the rotational error.

公开(公告)号：DE69128207D1

公开(公告)日：1998-01-02

申请号：DE69128207

申请日：1991-03-12

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI ,  EBINUMA RYUICHI

IPC: G03F7/20 ,  G21K1/02 ,  H01L21/027

Abstract: A method of manufacture of semiconductor devices wherein a radiation beam is projected from a synchrotron orbit radiation source into an ambience maintained substantially at a vacuum, wherein a first beam which is a portion of the radiation beam is directed to a wafer through a window effective to isolate the ambience to thereby print a circuit pattern on an X-ray sensitive layer on the wafer with the first beam, wherein an opening is formed at least in a portion of a support for supporting the window, wherein a second beam which is another portion of the radiation beam is extracted through the opening, and wherein, by using the second beam, any deviation of the first beam with respect to the wafer is detected and corrected.

公开(公告)号：DE69126907T2

公开(公告)日：1997-12-04

申请号：DE69126907

申请日：1991-04-05

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  MIYACHI TAKESHI ,  FUKUDA YASUAKI ,  CHIBA YUJI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI

IPC: G03F1/22 ,  G03F1/60 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03F1/14

Abstract: An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein an stress releasing groove is formed in at least one of the mask substrate and the supporting frame.