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    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, electronic device, and compound
    15.
    发明专利
    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, electronic device, and compound 有权
    图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法，电子器件和化合物

    公开(公告)号：JP2014194534A

    公开(公告)日：2014-10-09

    申请号：JP2014030830

    申请日：2014-02-20

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  FUKUHARA TOSHIAKI ,  FURUYA SO ,  SHIRAKAWA MICHIHIRO

    IPC: G03F7/004 ,  C07C311/51 ,  C08F20/18 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

    CPC classification number: G03F7/038 ,  C07C25/18 ,  C07C233/04 ,  C07C235/88 ,  C07C311/03 ,  C07C311/06 ,  C07C311/51 ,  C07C311/53 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D327/06 ,  C07D333/46 ,  C07D333/76 ,  C07D411/06 ,  C08F220/26 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325 ,  H01L21/0275

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method, a photosensitive or radiation-sensitive resin composition, a resist film and a compound, a method for manufacturing an electronic device, and an electronic device, which exhibit high roughness performance and defocusing performance in the formation of an ultrafine pattern (particularly a trench pattern or a hole pattern in a size of 50 nm or less), and excellent resolution and exposure latitude.SOLUTION: The pattern forming method includes steps of (1) forming a film comprising the following photosensitive or radiation-sensitive resin composition, (2) exposing the film, and (3) developing the film with an organic solvent-containing developer to form a negative pattern. The photosensitive or radiation-sensitive resin composition comprises a compound (A) expressed by general formula (I-1), a compound (B) which is different from the compound (A) and generates an acid by irradiation with actinic rays or radiation, and a resin (P) which does not react with an acid generated from the compound (A) but shows decrease in the solubility with an organic solvent-containing developer by an action of an acid from the compound (B). Also disclosed are the photosensitive or radiation-sensitive resin composition, a resist film, the compound (A), a method for manufacturing an electronic device, and an electronic device.

    Abstract translation: 要解决的问题：为了提供图案形成方法，感光性或辐射敏感性树脂组合物，抗蚀剂膜和化合物，电子器件的制造方法和电子器件，其具有高的粗糙度性能和散焦性能 超细图案（特别是50nm以下的沟槽图案或孔图案）的形成，以及优异的分辨率和曝光宽容度。图案形成方法包括以下步骤：（1）形成包含以下 感光或辐射敏感性树脂组合物，（2）曝光该膜，和（3）用含有机溶剂的显影剂显影该膜以形成负型图案。 光敏或辐射敏感性树脂组合物包含由通式（I-1）表示的化合物（A），与化合物（A）不同的化合物（B）），并通过用光化射线或辐射照射产生酸， 和不与化合物（A）产生的酸反应的树脂（P），但是通过化合物（B）的酸作用，与含有机溶剂的显影剂的溶解度降低。 还公开了光敏或辐射敏感性树脂组合物，抗蚀剂膜，化合物（A），电子器件的制造方法和电子器件。

    Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
    16.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
    化学敏感性或辐射敏感性树脂组合物和使用其的图案形成方法

    公开(公告)号：JP2013210636A

    公开(公告)日：2013-10-10

    申请号：JP2013084294

    申请日：2013-04-12

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TANGO NAOHIRO ,  SHIRAKAWA MICHIHIRO ,  FUJITA MITSUHIRO ,  YAMAGUCHI SHUHEI ,  SHIBUYA AKINORI ,  KATAOKA SHOHEI

    IPC: G03F7/039 ,  C07C381/12 ,  C08F20/26 ,  G03F7/004 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having effect in improvement of a trailing shape of a resist pattern and capable of forming a pattern with good LER performance, and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) resin increasing solubility of the resin in alkali developer by action of acid; and (B) a compound generating the acid by irradiation with an actinic ray or a radiation ray. The compound generating the acid by the irradiation with the actinic ray or the radiation ray is contained by an amount of 10 to 30 mass% on the basis of the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition. A pattern forming method uses the composition.

    Abstract translation: 要解决的问题：提供具有改善抗蚀剂图案的拖尾形状并且能够形成具有良好的LER性能的图案的光化射线敏感或辐射敏感性树脂组合物以及使用该组合物的图案形成方法。 解决方案：光化射线敏感或辐射敏感性树脂组合物包含：（A）树脂通过酸作用增加树脂在碱性显影剂中的溶解度; 和（B）通过用光化射线或辐射线照射产生酸的化合物。 基于光化射线敏感性或辐射敏感性树脂组合物的全部固体成分，通过用光化射线或放射线照射而产生酸的化合物的含量为10〜30质量％。 图案形成方法使用该组合物。

    Actinic ray-sensitive or radiation-sensitive resin composition, and pattern formation method using the same
    17.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, and pattern formation method using the same 审中-公开
    丙烯酸类敏感性或辐射敏感性树脂组合物和使用其的图案形成方法

    公开(公告)号：JP2013190497A

    公开(公告)日：2013-09-26

    申请号：JP2012055139

    申请日：2012-03-12

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： KATAOKA SHOHEI ,  FUKUHARA TOSHIAKI ,  SHIBUYA AKINORI ,  TANGO NAOHIRO

    IPC: G03F7/004 ,  C07C43/32 ,  C07C53/12 ,  C07C53/18 ,  C07C69/14 ,  C07C255/14 ,  C08F220/28 ,  G03F7/039

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition allowing both suppression of pattern collapse and formation of a pattern being excellent in storage stability upon water intrusion and having an excellent shape.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is characterized by containing (A) a resin comprising a repeating unit having a cyclic acid anhydride structure and a repeating unit generating an alkali-soluble group by decomposition with the action of an acid; (B) a compound generating an acid by irradiation with an actinic ray or radiation; and (C) a compound represented by any of the general formulas (C1-1) to (C1-4) and having a boiling point of 250°C or less at an atmospheric pressure of 1013 hPa.

    Abstract translation: 要解决的问题：提供光化学敏感或辐射敏感性树脂组合物，其允许抑制图案塌陷和形成在水侵入时储存稳定性优异且具有优异形状的图案。溶解度：光化学敏感 或辐射敏感性树脂组合物的特征在于含有（A）包含具有环状酸酐结构的重复单元的树脂和通过酸分解产生碱溶性基团的重复单元; （B）通过用光化射线或辐射照射产生酸的化合物; 和（C）在1013hPa的大气压下由通式（C1-1）至（C1-4）中任一个表示的且沸点为250℃或更低的化合物。

    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, and resist film
    18.
    发明专利
    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, and resist film 有权
    图案形成方法，丙烯酸敏感或辐射敏感性树脂组合物和耐腐蚀膜

    公开(公告)号：JP2013057923A

    公开(公告)日：2013-03-28

    申请号：JP2012035633

    申请日：2012-02-21

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TAKAHASHI HIDETOMO ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO ,  SAITO SHOICHI

    IPC: G03F7/039 ,  C08F20/16 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32 ,  H01L21/027

    CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method having excellent roughness performance such as line width roughness, uniformity in a local pattern dimension and exposure latitude and suppressing reduction in a film thickness, so-called film loss, in a pattern formed by exposure, and to provide an actinic ray-sensitive or radiation-sensitive resin composition and a resist film used for the method.SOLUTION: The pattern forming method includes the steps of: (1) forming a film of an actinic ray-sensitive or radiation-sensitive resin composition comprising resin (P) having a repeating unit (a) expressed by a general formula (I) and a compound (B) generating an organic acid upon irradiation with actinic rays or radiation; (2) exposing the film; and (3) developing the film by using a developing solution containing an organic solvent to form a negative pattern. In the general formula (I), Rrepresents a hydrogen atom or a methyl group; and R, R, and Reach independently represent a straight-chain or branched alkyl group.

    Abstract translation: 要解决的问题：提供一种图案形成方法，其具有优异的粗糙度性能，例如线宽粗糙度，局部图案尺寸和曝光宽容度的均匀性，并且抑制图案中所谓的膜损失 通过曝光形成，并提供用于该方法的光化射线敏感或辐射敏感性树脂组合物和抗蚀剂膜。 图案形成方法包括以下步骤：（1）形成具有由通式（a）表示的重复单元（a）的树脂（P）的光化射线敏感性或辐射敏感性树脂组合物的膜， I）和在用光化射线或辐射照射时产生有机酸的化合物（B）; （2）曝光胶片; 和（3）通过使用含有有机溶剂的显影溶液显影以形成负图案。 在通式（I）中，R 0 表示氢原子或甲基; 和R 1 ，R 2 ，并且R 3 各自独立地表示 直链或支链烷基。 版权所有（C）2013，JPO＆INPIT

    Pattern forming method, chemically amplified resist composition, and resist film
    20.
    发明专利
    Pattern forming method, chemically amplified resist composition, and resist film 有权
    图案形成方法，化学放大电阻组合物和电阻膜

    公开(公告)号：JP2012008500A

    公开(公告)日：2012-01-12

    申请号：JP2010146787

    申请日：2010-06-28

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： IWATO KAORU ,  KATAOKA SHOHEI

    IPC: G03F7/039 ,  G03F7/038 ,  G03F7/32 ,  H01L21/027

    CPC classification number: G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325 ,  Y10S430/108

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method, a chemically amplified resist composition and a resist film, with high resolution and excellent pattern shape, capable of reducing LWR.SOLUTION: A pattern forming method includes: (1) a step for forming a film from a chemically amplified resist composition containing (A) a resin in which polarity is increased and solubility in a developer containing an organic solvent is reduced by action of acid, (B) a compound that generates acid by irradiating active light or radiation, and (C) a solvent; (2) a step for exposing the film; and (3) a step for developing using the developer containing the organic solvent. The resin (A) has a structure in which polar groups are protected with a leaving group that leaves when decomposed by action of acid; and the leaving group includes a fluorine atom.

    Abstract translation: 要解决的问题：提供能够降低LWR的图案形成方法，化学放大型抗蚀剂组合物和抗蚀剂膜，具有高分辨率和优异的图案形状。 解决方案：图案形成方法包括：（1）从化学放大型抗蚀剂组合物形成膜的步骤，该组合物含有（A）极性增加的树脂，并且通过作用减少在含有有机溶剂的显影剂中的溶解度 的酸，（B）通过照射活性光或辐射而产生酸的化合物和（C）溶剂; （2）曝光胶片的步骤; 和（3）使用含有有机溶剂的显影剂显影的步骤。 树脂（A）具有其中极性基团被离去基团保护的结构，当离子基团通过酸的作用而分解时; 离去基团包含氟原子。 版权所有（C）2012，JPO＆INPIT

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