公开(公告)号：WO02088077A3

公开(公告)日：2003-02-27

申请号：PCT/US0212885

申请日：2002-04-22

Applicant: IBM

Inventor： PUSHKARA RAO VARANASI ,  LAWSON MARGARET C ,  LI WENJIE

IPC: G03F7/039 ,  H01L21/027 ,  G03F7/004 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

CPC classification number: G03F7/0395 ,  G03F7/0392 ,  Y10S430/106

Abstract: Acid-catalyzed positive resist compositions which are imageable with 193nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a monomer with a pendant group containing plural acid labile moieties. Preferred pendant groups containing plural acid labile moieties are characterized by the presence of a bulky end group.

Abstract translation: 可通过193nm辐射和/或可能的其它辐射成像并且可显影以形成改进的显影特性和改善的耐蚀刻性的抗蚀剂结构的酸催化的正性抗蚀剂组合物通过使用含有具有带侧基的单体的成像聚合物的抗蚀剂组合物 该基团含有多个酸不稳定部分。 含有多个酸不稳定部分的优选侧基的特征在于存在大体积端基。

公开(公告)号：AU2002351269A1

公开(公告)日：2004-06-30

申请号：AU2002351269

申请日：2002-12-05

Applicant: IBM

Inventor： HUANG WU-SONG ,  LI WENJIE ,  MOREAU WAYNE ,  MEDEIROS DAVID E ,  PETRILLO KAREN E ,  LANG ROTBERT N ,  ANGELOPOULOS MARIE

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30

公开(公告)号：AU2002305222A1

公开(公告)日：2002-11-11

申请号：AU2002305222

申请日：2002-04-22

Applicant: IBM

Inventor： LI WENJIE ,  PUSHKARA RAO VARANASI ,  LAWSON MARGARET C

IPC: G03F7/039 ,  H01L21/027 ,  G03F7/004 ,  G03F7/40 ,  G03F7/32 ,  G03F7/38

Abstract: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a monomer with a pendant group containing plural acid labile moieties. Preferred pendant groups containing plural acid labile moieties are characterized by the presence of a bulky end group.

公开(公告)号：DE60237318D1

公开(公告)日：2010-09-23

申请号：DE60237318

申请日：2002-12-05

Applicant: IBM

Inventor： HUANG WU-SONG ,  LI WENJIE ,  MOREAU WAYNE ,  MEDEIROS DAVID E ,  PETRILLO KAREN E ,  LANG ROTBERT N ,  ANGELOPOULOS MARIE

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30

公开(公告)号：AT477517T

公开(公告)日：2010-08-15

申请号：AT02786917

申请日：2002-12-05

Applicant: IBM

Inventor： HUANG WU-SONG ,  LI WENJIE ,  MOREAU WAYNE ,  MEDEIROS DAVID ,  PETRILLO KAREN ,  LANG ROTBERT N ,  ANGELOPOULOS MARIE

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30