公开(公告)号：AU5910401A

公开(公告)日：2001-11-07

申请号：AU5910401

申请日：2001-04-19

Applicant: KLA TENCOR CORP

Inventor： NIKOONAHAD MEHRDAD ,  SETHURAMAN ANANTHA R ,  ZHAO GUOHENG

IPC: G01N15/02 ,  B24B37/005 ,  B24B49/12 ,  B24D7/12 ,  G01B11/00 ,  G01B11/06 ,  G01N1/32 ,  G01N1/34 ,  G01N21/00 ,  G01N21/15 ,  G01N21/21 ,  G01N21/45 ,  G01N21/47 ,  G01N21/94 ,  G01N21/956 ,  H01L21/304 ,  H01L21/66 ,  G01N21/55

Abstract: Disclosed is a system for detecting anomalies associated with a sample. The system includes an objective arranged proximate to a sample while the sample is undergoing chemical mechanical polishing and a beam source arranged to generate an incident beam and direct the incident beam through the objective and toward the sample while the sample is undergoing chemical mechanical polishing. The system also includes a sensor arranged to detect a scattered beam reflected from at least one anomaly associated with the sample while the sample is undergoing chemical mechanical polishing, the scattered beam being in response to the incident beam. The scattered beam indicates a characteristic of the anomaly, such as particle size.

公开(公告)号：SG10201912769PA

公开(公告)日：2020-02-27

申请号：SG10201912769P

申请日：2016-11-04

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

公开(公告)号：DE69828827D1

公开(公告)日：2005-03-03

申请号：DE69828827

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66 ,  G01N21/86 ,  G01B11/24 ,  G01B7/34

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.

公开(公告)号：DE69819929T2

公开(公告)日：2004-11-11

申请号：DE69819929

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66 ,  G01N21/86 ,  G01B11/24 ,  G01B7/34

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.

公开(公告)号：AU3965402A

公开(公告)日：2002-07-01

申请号：AU3965402

申请日：2001-12-18

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  GROSS KENNETH P ,  SMEDT RODNEY ,  NIKOONAHAD MEHRDAD

IPC: G01B11/00

Abstract: A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals. At least one of the orientations of the plane of polarization is substantially stationary when the detection takes place. To have as small a footprint as possible, one employs an optical device that includes a first element directing a polychromatic beam of electromagnetic radiation to the structure and a second optical element collecting radiation from the structure where the two elements form an integral unit or are attached together to form an integrated unit. To reduce the footprint, the measurement instrument and the wafer are both moved. In one embodiment, both the apparatus and the wafer undergo translational motion transverse to each other. In a different arrangement, one of the two motions is translational and the other is rotational. Any one of the above-described embodiments may be included in an integrated processing and detection apparatus which also includes a processing system processing the sample, where the processing system is responsive to the output of any one of the above embodiments for adjusting a processing parameter.

公开(公告)号：ES2908695T3

公开(公告)日：2022-05-03

申请号：ES16889639

申请日：2016-11-04

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

IPC: G01N21/956 ,  G01B11/25 ,  G01N21/39

Abstract: Un procedimiento para la medición topográfica tridimensional óptica de una superficie (21) de un objeto (2), el procedimiento comprendiendo las etapas de: proyectar iluminación con patrón a través de un objetivo (5) sobre la superficie del objeto (21); realizar un movimiento relativo entre el objeto (2) y el objetivo (5), donde una dirección del movimiento relativo incluye un ángulo oblicuo (23) con un eje óptico (51) del objetivo, y donde la superficie pasa a través de un plano focal (52) del objetivo durante el movimiento relativo; y donde la superficie del objeto (21) define un plano de referencia que es paralelo al plano focal (52) del objetivo (5); registrar una pluralidad de imágenes de la superficie a través del objetivo (5) durante el movimiento relativo; derivar la información de altura para una posición respectiva sobre la superficie del objeto de la variación de la intensidad registrada desde la posición respectiva en la pluralidad de imágenes; donde la iluminación con patrón es generada por iluminación incoherente de una máscara de patrón (33), donde la máscara de patrón es una rejilla, donde la rejilla es una rejilla flameada; y donde, para la iluminación con patrón, se usan solamente un orden de difracción 0 y un orden difractado, que surge de la máscara del patrón, ambos órdenes de difracción teniendo la misma intensidad.

公开(公告)号：PH12018501598A1

公开(公告)日：2019-04-08

申请号：PH12018501598

申请日：2018-07-26

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

IPC: G01N21/956 ,  G01N21/39 ,  G02B27/22

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

公开(公告)号：DE112015004550T5

公开(公告)日：2017-06-14

申请号：DE112015004550

申请日：2015-10-02

Applicant: KLA TENCOR CORP

Inventor： VAZHAEPARAMBIL JIJEN ,  ZHAO GUOHENG ,  KAVALDJIEV DANIEL IVANOV ,  ROMANOVSKY ANATOLY ,  WOLTERS CHRISTIAN ,  KREN GEORGE ,  BIELLAK STEPHEN ,  WHITESIDE BRET ,  PETTIBONE DONALD ,  MALEEV IVAN

IPC: H01L21/66

Abstract: Ein Wafer-Abtastsystem umfasst eine abbildende Sammeloptik, um die effektive Spotgröße zu reduzieren. Eine kleinere Spotgröße verringert die Anzahl der Photonen, die durch die Oberfläche proportional zur Fläche des Spots gestreut sind. Die Luftstreuung wird ebenfalls reduziert. TDI wird verwendet, um ein Waferbild zu erzeugen, das auf einer Vielzahl von Bildsignalen basiert, die über die Richtung der Linearbewegung des Wafers integriert sind. Ein Beleuchtungssystem überflutet den Wafer mit Licht, und die Aufgabe, den Spot zu erzeugen, wird der bildgebenden Sammeloptik zugeordnet.

公开(公告)号：DE69819159D1

公开(公告)日：2003-11-27

申请号：DE69819159

申请日：1998-07-28

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  STOKOWSKI STANLEY ,  VAEZ-IRAVANI MEHDI

IPC: G01B11/30 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01N21/88

Abstract: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

公开(公告)号：SG11201805467TA

公开(公告)日：2018-08-30

申请号：SG11201805467T

申请日：2016-11-04

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

IPC: G01N21/39 ,  G01N21/956 ,  G02B27/22

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.