Micropump and micropump system
    204.
    发明专利
    Micropump and micropump system 有权
    MICROPUMP和MICROPUMP系统

    公开(公告)号:JP2007009726A

    公开(公告)日:2007-01-18

    申请号:JP2005188373

    申请日:2005-06-28

    Inventor: KOSHIRO YOSHIAKI

    CPC classification number: F04B43/043 B81B2201/036

    Abstract: PROBLEM TO BE SOLVED: To provide a micropump having a construction simplified and reduced in size as compared with a conventional micropump and to provide a micropump system.
    SOLUTION: In the micropump 1 of the invention, a flow path substrate 2 is provided with a pressure chamber 3 having one end and another end and storing liquid inside, the one end of the pressure chamber 3 is connected with a flow path 4 having flow path resistances different according to a direction in which the liquid flows, the other end of the pressure chamber is opened, and an actuator 6 is provided for generating a pressure wave to the liquid in the pressure chamber 3, which is propagated between the one end and the other end.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种与常规微型泵相比具有简化和尺寸减小的结构的微型泵,并提供微型泵系统。 解决方案:在本发明的微型泵1中,流路基板2设置有一端和另一端的压力室3,并在其内部储存液体,压力室3的一端与流路 4,具有根据液体流动方向不同的流路阻力,压力室的另一端打开,并且设置致动器6,用于向压力室3中的液体产生压力波,该压力波在 一端和另一端。 版权所有(C)2007,JPO&INPIT

    MEMS Device and Apparatus Having Such a MEMS Device

    公开(公告)号:US20230406694A1

    公开(公告)日:2023-12-21

    申请号:US18334468

    申请日:2023-06-14

    Abstract: A MEMS device includes a substrate having a cavity and a membrane structure mechanically connected to the substrate and configured for deflecting out-of-plane with regard to a substrate plane and with a frequency in an ultrasonic frequency range to cause a fluid motion of the fluid in the cavity. The MEMS device includes a valve structure sandwiching the cavity together with the membrane structure, wherein the valve structure includes a planar perforated structure and a shutter structure opposing the perforated structure and arranged movably in-plane and with a frequency in the ultrasonic frequency range and with regard to the substrate plane and between a first position and a second position. The shutter structure is arranged to provide a first fluidic resistance for the fluid in the first position and a second, higher fluidic resistance for the fluid in the second position.

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