WIRING BOARD
    223.
    发明公开
    WIRING BOARD 审中-公开

    公开(公告)号:US20240292533A1

    公开(公告)日:2024-08-29

    申请号:US18572428

    申请日:2022-06-13

    Inventor: Hidetoshi YUGAWA

    Abstract: A wiring board according to the present disclosure includes an insulation layer, and a wiring conductor positioned on the insulation layer. The wiring conductor includes a phosphorus-containing electroless copper-plating layer positioned on the insulation layer, a nickel-containing electroless copper-plating layer positioned on the phosphorus-containing electroless copper-plating layer, and an electrolytic copper-plating layer positioned on the nickel-containing electroless copper-plating layer.

    Circuit board and manufacturing method thereof
    224.
    发明授权
    Circuit board and manufacturing method thereof 有权
    电路板及其制造方法

    公开(公告)号:US09591753B2

    公开(公告)日:2017-03-07

    申请号:US14849614

    申请日:2015-09-10

    Abstract: A circuit board includes a substrate, a patterned copper layer, a phosphorous-containing electroless plating palladium layer, an electroless plating palladium layer and an immersion plating gold layer. The patterned copper layer is disposed on the substrate. The phosphorous-containing electroless plating palladium layer is disposed on the patterned copper layer, wherein in the phosphorous-containing electroless plating palladium layer, a weight percentage of phosphorous is in a range from 4% to 6%, and a weight percentage of palladium is in a range from 94% to 96%. The electroless plating palladium layer is disposed on the phosphorous-containing electroless plating palladium layer, wherein in the electroless plating palladium layer, a weight percentage of palladium is 99% or more. The immersion plating gold layer is disposed on the electroless plating palladium layer.

    Abstract translation: 电路板包括基板,图案化铜层,含磷化学镀钯层,无电镀钯层和浸镀金层。 图案化铜层设置在基板上。 含磷化学镀钯层设置在图案化的铜层上,其中,在含磷化学镀钯层中,磷的重量百分比为4〜6%,钯的重量百分比为 在94%至96%的范围内。 无电镀钯层配置在含磷化学镀钯层上,其中,在化学镀钯层中,钯的重量百分比为99%以上。 浸镀金层设置在化学镀钯层上。

    PACKAGE SUBSTRATE COMPRISING SURFACE INTERCONNECT AND CAVITY COMPRISING ELECTROLESS FILL
    226.
    发明申请
    PACKAGE SUBSTRATE COMPRISING SURFACE INTERCONNECT AND CAVITY COMPRISING ELECTROLESS FILL 有权
    包含表面互连和包含电镀膜的孔的包装基底

    公开(公告)号:US20150296616A1

    公开(公告)日:2015-10-15

    申请号:US14251486

    申请日:2014-04-11

    Abstract: Some novel features pertain to a substrate that includes a first dielectric layer, a first interconnect, a first cavity, and a first electroless metal layer. The first dielectric layer includes a first surface and a second surface. The first interconnect is on the first surface of the substrate layer. The first cavity traverses the first surface of the first dielectric layer. The first electroless metal layer is formed at least partially in the first cavity. The first electroless metal layer defines a second interconnect embedded in the first dielectric layer. In some implementations, the substrate further includes a core layer. The core layer includes a first surface and a second surface. The first surface of the core layer is coupled to the second surface of the first dielectric layer. In some implementations, the substrate further includes a second dielectric layer.

    Abstract translation: 一些新颖特征涉及包括第一介电层,第一互连,第一空腔和第一无电金属层的基板。 第一电介质层包括第一表面和第二表面。 第一互连在衬底层的第一表面上。 第一空腔穿过第一介电层的第一表面。 第一无电金属层至少部分地形成在第一腔中。 第一无电金属层限定嵌入在第一介电层中的第二互连。 在一些实施方案中,衬底还包括芯层。 芯层包括第一表面和第二表面。 芯层的第一表面耦合到第一介电层的第二表面。 在一些实施方案中,衬底还包括第二介电层。

    FLEXIBLE CIRCUIT BOARD AND METHOD FOR MANUFACTURING SAME
    230.
    发明申请
    FLEXIBLE CIRCUIT BOARD AND METHOD FOR MANUFACTURING SAME 审中-公开
    柔性电路板及其制造方法

    公开(公告)号:US20140014521A1

    公开(公告)日:2014-01-16

    申请号:US14029637

    申请日:2013-09-17

    Abstract: An object of the present invention is to provide a flexible circuit board that maintains high insulation reliability, exhibits high wiring adhesion, has low thermal expansion, and allows the formation of a fine circuit thereon. Specifically, the present invention provides a flexible circuit board, wherein at least a nickel plating layer is laminated on a polyimide film to form a polyimide film provided with a nickel plating layer and a wiring pattern is applied to the nickel plating layer thereof. The polyimide film has a thermal expansion coefficient of 0 to 8 ppm/° C. in the temperature range from 100 to 200° C., and the nickel plating layer has a thickness of 0.03 to 0.3 μm.

    Abstract translation: 本发明的目的是提供一种保持高绝缘可靠性,显示出高布线附着力,低热膨胀性并且允许在其上形成微细电路的柔性电路板。 具体地说,本发明提供一种挠性电路基板,其中,在聚酰亚胺膜上层叠有至少一层镍镀层,形成具有镀镍层的聚酰亚胺膜,并且对其镀镍层施加布线图案。 聚酰亚胺膜在100〜200℃的温度范围内的热膨胀系数为0〜8ppm /℃,镍镀层的厚度为0.03〜0.3μm。

Patent Agency Ranking