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公开(公告)号：US20170023870A1
公开(公告)日：2017-01-26
申请号：US15287524
申请日：2016-10-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70866
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。
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公开(公告)号：US09360765B2
公开(公告)日：2016-06-07
申请号：US14816997
申请日：2015-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20150168850A1
公开(公告)日：2015-06-18
申请号：US14624167
申请日：2015-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
Abstract translation: 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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24.发明申请ACTIVE DRYING STATION AND METHOD TO REMOVE IMMERSION LIQUID USING GAS FLOW SUPPLY WITH GAS OUTLET BETWEEN TWO GAS INLETS 有权主动干燥站和使用两个气体入口之间的气体出口的气体流量去除浸没液的方法公开(公告)号：US20140224173A1
公开(公告)日：2014-08-14
申请号：US14162435
申请日：2014-01-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
IPC: B05C9/12
CPC classification number: G03F7/70875 , B05C9/12 , G03F7/70341
Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
Abstract translation: 公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。
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公开(公告)号：US11875966B2
公开(公告)日：2024-01-16
申请号：US17403006
申请日：2021-08-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bernardo Kastrup , Johannes Catharinus Hubertus Mulkens , Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erwin Paul Smakman , Tamara Druzhinina , Coen Adrianus Verschuren
CPC classification number: H01J37/263 , H01J37/023 , H01J37/15 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/0245 , H01J2237/2817
Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
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Patent Agency Ranking
公开(公告)号：US11080459B2
公开(公告)日：2021-08-03
申请号：US16804048
申请日：2020-02-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Christophe David Fouquet , Bernardo Kastrup , Arie Jeffrey Den Boef , Johannes Catharinus Hubertus Mulkens , James Benedict Kavanagh , James Patrick Koonmen , Neal Patrick Callan
IPC: G06F30/398 , H01L21/66 , G03F7/20 , G06F30/20 , G06N7/00
Abstract: A defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method including: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.
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公开(公告)号：US11048174B2
公开(公告)日：2021-06-29
申请号：US16076231
申请日：2017-02-16
Applicant: ASML NETHERLANDS B.V. , Lam Research Corporation
Inventor： Michael Kubis , Marinus Jochemsen , Richard Stephen Wise , Nader Shamma , Girish Anant Dixit , Liesbeth Reijnen , Ekaterina Mikhailovna Viatkina , Melisa Luca , Johannes Catharinus Hubertus Mulkens
Abstract: A method, and associated apparatus and computer program, to determine corrections for a parameter of interest, such as critical dimension, of a patterning process. The method includes determining an exposure control correction for an exposure control parameter and, optionally, determining a process control correction for a process control parameter, based upon a measurement of the parameter of interest of a structure, and an exposure control relationship and a process control relationship. The exposure control relationship describes the dependence of the parameter of interest on the exposure control parameter and the process control relationship describes the dependence of the parameter of interest on the process control parameter. The exposure control correction and process control correction may be co-optimized to minimize variation of the parameter of interest of subsequent exposed and processed structures relative to a target parameter of interest.
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公开(公告)号：US10338478B2
公开(公告)日：2019-07-02
申请号：US14800493
申请日：2015-07-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
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公开(公告)号：US09990462B2
公开(公告)日：2018-06-05
申请号：US15339669
申请日：2016-10-31
Applicant: ASML NETHERLANDS B.V.
Inventor： Christophe David Fouquet , Bernardo Kastrup , Arie Jeffrey Den Boef , Johannes Catharinus Hubertus Mulkens , James Benedict Kavanagh , James Patrick Koonmen , Neal Patrick Callan
CPC classification number: G06F17/5081 , G03F7/705 , G03F7/70525 , G03F7/7065 , G06F17/5009 , G06N7/005 , H01L22/20
Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.
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公开(公告)号：US09952515B2
公开(公告)日：2018-04-24
申请号：US14839633
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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