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公开(公告)号：SG162690A1
公开(公告)日：2010-07-29
申请号：SG2009083841
申请日：2009-12-15
Applicant: ASML NETHERLANDS BV
Abstract: A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross- section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.
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公开(公告)号：NL2006969A
公开(公告)日：2012-01-24
申请号：NL2006969
申请日：2011-06-20
Applicant: ASML NETHERLANDS BV
Inventor： POSTMA SYTSE , KERKHOF MARCUS , MOEST BEARRACH , MATIAS SERRAO VASCO MIGUEL
IPC: G03F7/20
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23.发明专利
公开(公告)号：NL2005389A
公开(公告)日：2011-04-26
申请号：NL2005389
申请日：2010-09-23
Applicant: ASML NETHERLANDS BV
Inventor： KERKHOF MARCUS , VENEMA WILLEM , MOEST BEARRACH , MATIAS VASCO , BOMHOF CEDRAN
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公开(公告)号：DE602006000357D1
公开(公告)日：2008-02-07
申请号：DE602006000357
申请日：2006-02-17
Applicant: ASML NETHERLANDS BV
Inventor： KOK HAICO VICTOR , VAN DE KERKHOF MARCUS ADRIANUS , KRUIZINGA BORGERT , SENGERS TIMOTHEUS FRANCISCUS , MOEST BEARRACH , HAAST MARC ANTONIUS MARIA , WEISSBRODT PETER WERNER , SCHRENK MANFRED HELMUT GUSTAV , HARZENDORF TORSTEN
IPC: G03F7/20
Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
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