公开(公告)号：WO2005064401A3

公开(公告)日：2005-09-29

申请号：PCT/NL2004000928

申请日：2004-12-31

Applicant: ASML NETHERLANDS BV ,  BANINE VADIM YEVGENYEVICH ,  BAKKER LEVINUS PIETER ,  MOORS JOHANNES HUBERTUS JOSEPH ,  IVANOV VLADIMIR VITALEVITCH ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  VEEFKIND ABRAHAM

Inventor： BANINE VADIM YEVGENYEVICH ,  BAKKER LEVINUS PIETER ,  MOORS JOHANNES HUBERTUS JOSEPH ,  IVANOV VLADIMIR VITALEVITCH ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  VEEFKIND ABRAHAM

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70983

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

Abstract translation: 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分 光刻设备 碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。

公开(公告)号：DE60116967T2

公开(公告)日：2006-09-21

申请号：DE60116967

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER WERF JAN EVERT ,  KROON MARK ,  KEUR WILHELMUS CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  VAN DER LAAN HANS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LOOPSTRA EROK ROELOF

IPC: G03F7/20 ,  G21K5/00 ,  G01T1/20 ,  G01T1/28 ,  G21K5/02 ,  H01L21/027

Abstract: A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength lambda1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

公开(公告)号：WO2008044924A3

公开(公告)日：2008-08-07

申请号：PCT/NL2007050468

申请日：2007-09-25

Applicant: ASML NETHERLANDS BV ,  CARL ZEIS SMT AG ,  EHM DIRK HEINRICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  MEIJERINK MARCUS GERHARDUS HEN ,  STEIN THOMAS

Inventor： EHM DIRK HEINRICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  MEIJERINK MARCUS GERHARDUS HEN ,  STEIN THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.

Abstract translation: 一种清洁装置的光学元件的方法，该装置被配置为将辐射束投射到基板的目标部分上，该装置包括依次布置在辐射束的路径中的多个光学元件，其中清洁 方法包括：清洁序列的一个或多个第二光学元件，其在装置的操作期间接收一个或多个相对低的第二辐射剂量，利用比接收一个或多个序列的序列的一个或多个第一光学元件更短的清洁周期 在装置运行期间的第一辐射剂量，第二辐射剂量低于每个相对高的第一辐射剂量。

公开(公告)号：WO2008007952A2

公开(公告)日：2008-01-17

申请号：PCT/NL2007050318

申请日：2007-06-28

Applicant: ASML NETHERLANDS BV ,  VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SOER WOUTER ANTHON

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SOER WOUTER ANTHON

IPC: G03F7/20 ,  B08B7/00

CPC classification number: G03F7/70925 ,  G03F7/70916

Abstract: A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.

Abstract translation: 光刻设备包括辐射源和具有构造成保持金属污染物的第一表面的物体。 该表面具有吸气剂的功能。 在光刻处理期间，第一表面基本上布置在由辐射源产生的辐射束穿过的区域的外侧。 第一表面可以进一步用于保持在清洁方法中产生的挥发性污染物。

公开(公告)号：WO2005057280A3

公开(公告)日：2006-02-02

申请号：PCT/NL2004000826

申请日：2004-11-29

Applicant: ASML NETHERLANDS BV ,  VAN ZWET ERWIN JOHN ,  VAN ELP JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  NEERHOF HENDRIK ANTONY JOHANNE ,  OTTENS JOOST JEROEN ,  DE GROOF ADRIANUS MATHIJS MARI ,  KUIPERS LEO WILHELMUS MARIA ,  GIESEN PETER THEODORUS MARIA ,  LE KLUSE MARCO

Inventor： VAN ZWET ERWIN JOHN ,  VAN ELP JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  NEERHOF HENDRIK ANTONY JOHANNE ,  OTTENS JOOST JEROEN ,  DE GROOF ADRIANUS MATHIJS MARI ,  KUIPERS LEO WILHELMUS MARIA ,  GIESEN PETER THEODORUS MARIA ,  LE KLUSE MARCO

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H02N13/00

CPC classification number: H01L21/67259 ,  G03F7/707 ,  G03F7/70741 ,  G03F7/7075

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.

Abstract translation: 公开了一种光刻设备。 光刻设备包括用于在要放置在辐射束的光束路径中的平坦物品上提供辐射束的照明系统，以及用于在放置或移除物品期间处理物品的物品处理器。 物品处理器包括电极和电介质层，以便形成用于静电夹紧物品的静电夹。

公开(公告)号：WO2008078993A3

公开(公告)日：2008-08-21

申请号：PCT/NL2007050661

申请日：2007-12-18

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG ,  STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  EHM DIRK HEINRICH

Inventor： STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  EHM DIRK HEINRICH

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70058 ,  G03F7/70916

Abstract: A lithographic apparatus that includes an illumination system configured to condition a radiation beam. The illumination system includes a plurality of optical components. The apparatus also includes a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system includes a plurality of optical components. The apparatus also includes a contamination measurement unit for measuring contamination of a surface of at least one of the optical components. The contamination measurement unit is provided with a radiation sensor constructed and arranged to measure an optical characteristic of radiation received from the surface.

Abstract translation: 一种光刻设备，包括配置成调节辐射束的照明系统。 照明系统包括多个光学部件。 该装置还包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 该装置还包括被构造成保持基板的基板台，以及配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统包括多个光学部件。 该装置还包括用于测量至少一个光学部件的表面的污染物的污染测量单元。 污染测量单元设置有辐射传感器，其被构造和布置成测量从表面接收的辐射的光学特性。

公开(公告)号：WO2008034582A2

公开(公告)日：2008-03-27

申请号：PCT/EP2007008113

申请日：2007-09-18

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV ,  EHM DIRK HEINRICH ,  MUELLENDER STEPHAN ,  STEIN THOMAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  KRAUS DIETER ,  VERSLUIS RICHARD ,  MEIJERINK MARCUS GERHARDUS HEN

Inventor： EHM DIRK HEINRICH ,  MUELLENDER STEPHAN ,  STEIN THOMAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  KRAUS DIETER ,  VERSLUIS RICHARD ,  MEIJERINK MARCUS GERHARDUS HEN

IPC: G03F7/20

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: The invention relates to an optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, comprising: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract translation: 用于EUV光刻的投影曝光装置技术领域本发明涉及一种用于EUV光刻的光学装置，尤其是投影曝光装置（1），包括：包围内部空间（15）的壳体（2）; （2）中布置的至少一个，特别是反射性光学元件（4至10,12,14.1至14.6）; 至少一个真空发生单元（3），用于在壳体（2）的内部空间（15）中产生真空; 和至少一个布置在壳体（2）的内部空间（15）中并至少包围光学元件（4）的光学表面（17,17.1,17.2）的真空壳体（18,18.1至18.10） 其中污染减少单元与真空壳体（18.1至18.10）相关联，所述污染减少单元至少降低污染物质，特别是水和/或烃的分压 相对于所述内部空间（15）中的污染物质的分压紧邻所述光学表面（17,17.1,17.2）。

公开(公告)号：WO2006135230A3

公开(公告)日：2007-03-15

申请号：PCT/NL2006000291

申请日：2006-06-13

Applicant: ASML NETHERLANDS BV ,  VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  KLUNDER DERK JAN WILFRED

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  KLUNDER DERK JAN WILFRED

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed. The apparatus includes a source (5) for supplying hydrogen radicals (1), a guide (2) for use in conjunction with the source, for directing hydrogen radicals to an application surface (4) to be targeted by the hydrogen radicals. The guide is provided with a coating (8) having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

Abstract translation: 公开了一种光刻设备。 该设备包括用于供应氢原子的源（5），用于与源结合使用的引导件（2），用于将氢自由基引导到由氢基团靶向的施加表面（4）。 引导件设置有具有小于0.2的氢自由基复合常数的涂层（8）。 以这种方式，可以以较少的损失运输自由基，并且能够更好地与应用表面（例如镜面）上的剩余污染物相互作用。

公开(公告)号：WO2005071486A3

公开(公告)日：2005-09-09

申请号：PCT/NL2005000042

申请日：2005-01-21

Applicant: ASML NETHERLANDS BV ,  MOORS JOHANNES HUBERTUS JOSEPH ,  MICKAN UWE

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  MICKAN UWE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

Abstract: In a lithographic apparatus a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exhangeable aperture screen (22A) is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A test surface (28) is provided on the aperture screen, so that the test surface receives a part of the beam that is not passed along the remainder of the beam path. The test surface is made of a material that is sensitive, under influence of radiation from the beam, to chemical alterations that also affect the optical element (24) under influence of radiation from the beam. The test surface is later analyzed for chemical alterations after exposure to the beam.

Abstract translation: 在光刻设备中，辐射束沿着光束路径传递到衬底，用于将图案化照明施加到衬底。 一个可变的孔径屏幕（22A）插入到光束路径中，以将波束从路径的剩余部分中部分地阻挡到基板上。 测试表面（28）设置在孔眼屏幕上，使得测试表面接收不沿着光束路径的其余部分通过的光束的一部分。 测试表面由在光束辐射的影响下是敏感的材料制成，在来自光束的辐射的影响下也影响光学元件（24）的化学变化。 随后分析测试表面暴露于梁后的化学变化。

公开(公告)号：NL1036614A1

公开(公告)日：2009-09-22

申请号：NL1036614

申请日：2009-02-23

Applicant: ASML NETHERLANDS BV

Inventor： KRIVTSUN VLADIMIR MIHAILOVITCH ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

IPC: H05G2/00 ,  G03F7/20