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Patent Agency Ranking
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公开(公告)号：NL2003470A
公开(公告)日：2010-04-08
申请号：NL2003470
申请日：2009-09-11
Applicant: ASML NETHERLANDS BV
Inventor： COMPEN RENE , LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS , VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS , JEUNINK ANDRE , LOOPSTRA ERIK , OTTENS JOOST , SMITS PETER , ABEELEN HENDRIKUS , MEULENDIJKS ANTONIUS , HOUBEN MARTIJN
IPC: G03F7/20
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公开(公告)号：DE602005009246D1
公开(公告)日：2008-10-02
申请号：DE602005009246
申请日：2005-12-01
Applicant: ASML NETHERLANDS BV
Inventor： HENNUS PIETER RENAAT MARIA , MERTENS JEROEN JOHANNES SOPHIA MARIA , SMULDERS PATRICK JOHANNES CORNELUS HENDRICK , SMITS PETER
IPC: G03F7/20
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公开(公告)号：SG145772A1
公开(公告)日：2008-09-29
申请号：SG2008063125
申请日：2005-12-05
Applicant: ASML NETHERLANDS BV
Inventor： HENNUS PIETER RENAAT MARIA , MERTENS JEROEN JOHANNES SOPHIA , SMULDERS PATRICK JOHANNES CORNELUS HENDRIK , SMITS PETER
Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
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公开(公告)号：DE602005001835T2
公开(公告)日：2008-04-17
申请号：DE602005001835
申请日：2005-12-01
Applicant: ASML NETHERLANDS BV
Inventor： HENNUS PIETER RENAAT MARIA , MERTENS JEROEN JOHANNES SOPHIA , SMULDERS PATRICK JOHANNES , SMITS PETER
IPC: G03F7/20
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