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1.发明专利Supporting structure, lithographic projection apparatus, and method of manufacturing device 有权支撑结构，光刻投影装置和制造装置的方法
公开(公告)号：JP2007329506A
公开(公告)日：2007-12-20
申请号：JP2007218716
申请日：2007-08-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC: B08B1/00 , H01L21/677 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/683 , H02N13/00
CPC classification number: G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。 解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18） 或垂直位移。 支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁 。 版权所有（C）2008，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2004343076A
公开(公告)日：2004-12-02
申请号：JP2004102395
申请日：2004-03-31
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC: B08B1/00 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/677 , H01L21/683 , H02N13/00 , H01L21/68
CPC classification number: G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
Abstract: PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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3.发明申请CHUCK SYSTEM, LITHOGRAPHIC APPARATUS USING THE SAME AND DEVICE MANUFACTURING METHOD 审中-公开卡盘系统，使用它的平面设备和设备制造方法
公开(公告)号：WO2005064400A3
公开(公告)日：2006-03-09
申请号：PCT/EP2004014481
申请日：2004-12-20
Applicant: ASML NETHERLANDS BV , SMITS PETER , SMULDERS PATRICK JOHANNES CORN , ZAAL KOEN JACOBUS JOHANNES MAR , COX HENRIKUS HERMAN MARIE , OTTENS JOOST JEROEN , GILISSEN NOUD JAN , STARREVELD JEROEN
Inventor： SMITS PETER , SMULDERS PATRICK JOHANNES CORN , ZAAL KOEN JACOBUS JOHANNES MAR , COX HENRIKUS HERMAN MARIE , OTTENS JOOST JEROEN , GILISSEN NOUD JAN , STARREVELD JEROEN
CPC classification number: G03F7/70783
Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system (100) for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck (120) for supporting the object, a frame (110) for supporting the chuck, and a chuck support structure (114) for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element (130), which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.
Abstract translation: 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 光刻设备包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置具有用于在光刻设备中支撑诸如基板或图案形成装置的物体的卡盘系统（100）。 卡盘系统包括用于支撑物体的卡盘（120），用于支撑卡盘的框架（110）和用于相对于框架支撑卡盘的卡盘支撑结构（114）。 卡盘支撑结构包括至少一个挠曲元件（130），该挠曲元件在至少一个自由度上是柔性的并且联接到卡盘和框架。
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公开(公告)号：DE602005001835D1
公开(公告)日：2007-09-13
申请号：DE602005001835
申请日：2005-12-01
Applicant: ASML NETHERLANDS BV
Inventor： HENNUS PIETER RENAAT MARIA , MERTENS JEROEN JOHANNES SOPHIA , SMULDERS PATRICK JOHANNES CORN , SMITS PETER
IPC: G03F7/20
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公开(公告)号：SG125948A1
公开(公告)日：2006-10-30
申请号：SG200401666
申请日：2004-03-26
Applicant: ASML NETHERLANDS BV
Inventor： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , ELP VAN JAN , HOOGKAMP JAN FREDERIK , MEER VAN ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPNAJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , BERG VAN DEN JOHANNES CHARLES , SANDE VAN DE HENRICUS JOHANNES , VERVOORT THIJS
IPC: B08B1/00 , B25J13/08 , B25J15/00 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/677 , H01L21/68 , H01L21/683 , H02N13/00
Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure maybe a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus maybe cleaned with one single substrate only.
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