公开(公告)号：EP2450935A2

公开(公告)日：2012-05-09

申请号：EP11187989.6

申请日：2011-11-07

Applicant: FEI Company

Inventor： Novak, Libor ,  Uncovsky, Marek ,  Toth, Milos ,  Cafourek, Martin ,  Parker, N. William

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/244

CPC classification number: H01J37/20 ,  H01J37/18 ,  H01J37/244 ,  H01J2237/024 ,  H01J2237/2001 ,  H01J2237/2003 ,  H01J2237/2445

Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.

Abstract translation: 用于带电粒子束系统的环境单元允许安装在X-Y平台上的单元和聚焦柱的光轴之间的相对运动，从而消除对单元内的子级的需要。 柔性电池配置，例如可伸缩盖，允许多种工艺，包括光束诱导和热诱导工艺。 在带电粒子束系统中进行的光子产率光谱和使用光电子的气体级联放大，可以分析细胞中的物质并监测细胞中的处理。 也可以使用可伸缩镜进行发光分析。

公开(公告)号：EP2284524A3

公开(公告)日：2011-06-01

申请号：EP10171817.9

申请日：2010-08-04

Applicant: FEI Company

Inventor： Toth, Milos ,  Scheinfein, Michael ,  Narum, David ,  Silver, Eric

IPC: G01N23/20 ,  G01N23/225 ,  H01J37/244 ,  H01J37/256

CPC classification number: G01N23/20033 ,  H01J37/244 ,  H01J37/256 ,  H01J2237/2442

Abstract: An improved microcalorimeter-type energy dispersive x-ray spectrometer provides sufficient energy resolution and throughput for practical high spatial resolution x-ray mapping of a sample at low electron beam energies. When used with a dual beam system that provides the capability to etch a layer from the sample, the system can be used for three-dimensional x-ray mapping. A preferred system uses an x-ray optic having a wide-angle opening to increase the fraction of x-rays leaving the sample that impinge on the detector and multiple detectors to avoid pulse pile up.

公开(公告)号：EP2226830A3

公开(公告)日：2011-04-06

申请号：EP10155688.4

申请日：2010-03-05

Applicant: FEI Company

Inventor： Toth, Milos ,  Young, Richard ,  Henstra, Alexander ,  De Jong, Alan ,  Mulders, Johannes

IPC: H01J37/04 ,  H01J37/30 ,  H01J37/302

CPC classification number: H01J37/3056 ,  B81C99/0095 ,  H01J37/045 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/04756 ,  H01J2237/2001 ,  H01J2237/24535 ,  H01J2237/30472

Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate (54). The beam (12,13) preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.

公开(公告)号：EP2182546A2

公开(公告)日：2010-05-05

申请号：EP09174824.4

申请日：2009-11-03

Applicant: FEI COMPANY

Inventor： Knowles, William ,  Toth, Milos

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2002 ,  H01J2237/2444 ,  H01J2237/24445 ,  H01J2237/2449 ,  H01J2237/2605 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope (100) operated with the sample (114) in a high pressure environment (116). A preferred detector (120,122) uses gas amplification by converting either scattered or unscattered transmitted electrons to secondary electrons for efficient gas amplification.

Abstract translation: 扫描透射电子显微镜（100），其在高压环境（116）中与样品（114）一起操作。 优选的检测器（120,122）通过将散射或未散射的透射电子转换成二次电子来进行气体放大，以有效地进行气体放大。

公开(公告)号：EP2107591A1

公开(公告)日：2009-10-07

申请号：EP09156789.1

申请日：2009-03-31

Applicant: FEI Company

Inventor： Marek, Uncovsky ,  Toth, Milos ,  Knowles, Ralph

IPC: H01J37/244 ,  H01J37/28 ,  H01J47/06

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J47/06 ,  H01J2237/24445 ,  H01J2237/2448 ,  H01J2237/2605

Abstract: A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.

Abstract translation: 一种用于带电粒子束系统的新型检测器，其包括多个气体放大级。 这些级通常由相对于样品施加电压的导体或前一级定义。 通过在多级中产生二级电子级联，可以增加增益，而不会引起气体的介质击穿。

公开(公告)号：EP2006249A2

公开(公告)日：2008-12-24

申请号：EP08158646.3

申请日：2008-06-20

Applicant: FEI COMPANY

Inventor： Toth, Milos ,  Smith, Noel

IPC: B81C1/00

CPC classification number: B05C21/005 ,  B81C1/00531 ,  B81C2201/0132 ,  B81C2201/0143 ,  H01J37/3053 ,  H01J37/317 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01J2237/31749

Abstract: A method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process.

Abstract translation: 应用一种制造微结构的方法，该方法使用光束过程，例如光束诱导的前体分解，以精确图案沉积掩模，然后选择性等离子束，包括以下步骤：首先产生保护掩模 使用诸如电子束，聚焦离子束（FIB）或激光工艺的光束过程在衬底的表面部分上，并且使用选择性等离子体束蚀刻工艺二次蚀刻未掩模的衬底部分。 可选地，包括去除保护掩模的第三步骤可以用第二种，实质上相对选择的等离子体束工艺进行。

公开(公告)号：EP3243931B1

公开(公告)日：2020-04-15

申请号：EP16187654.5

申请日：2016-09-07

Applicant: FEI Company

Inventor： Kianinia, Mehran ,  Shimoni, Olga ,  Aharonovich, Igor ,  Lobo, Charlene ,  Toth, Milos ,  Randolph, Steven ,  Chandler, Clive

IPC: C23F4/02 ,  C25D5/02 ,  H01J37/18 ,  H01J37/30 ,  B82Y40/00 ,  G01N33/543 ,  H01J37/317

公开(公告)号：EP2700470B1

公开(公告)日：2016-12-28

申请号：EP13193643.7

申请日：2010-08-04

Applicant: FEI COMPANY

Inventor： Toth, Milos ,  Straw, Marcus

IPC: B23K26/12 ,  B23K26/16 ,  B23K26/36 ,  B23K26/06

CPC classification number: B29C35/08 ,  B23K26/0624 ,  B23K26/12 ,  B23K26/126 ,  B23K26/127 ,  B23K26/16 ,  B23K26/36 ,  B41M5/24

公开(公告)号：EP3096343A1

公开(公告)日：2016-11-23

申请号：EP16169828.7

申请日：2016-05-17

Applicant: FEI Company

Inventor： Shanley, Toby ,  Scott, John ,  Toth, Milos

IPC: H01J37/244

CPC classification number: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801 ,  H01J2237/2806

Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.

Abstract translation: 使用气体放大具有改善的气体的成像提供带电粒子束成像和测量系统。 该系统包括用于将带电粒子束到工件，用于聚焦带电粒子到工件上的聚焦透镜，和在电极用于加速由所述带电实践束从工件照射而产生的二次电子的带电粒子束源， 或其它气体级联检测方案。 气体成像在高压扫描电子显微镜（HPSEM）室中进行用于封闭所述改进的成像气体包括CH 3 CH 2 OH（乙醇）的蒸气。 电极加速二次电子虽然CH 3 CH 2 OH通过电离级联电离CH 3 CH 2 OH以放大探测二次电子的数量。 的最优配置提供了一种用于使用改进的成像气体的，并且提供的技术来进行的有机液体和溶剂，以及其他CH 3 CH 2 OH基的流程成像研究。

公开(公告)号：EP2814050A3

公开(公告)日：2015-02-25

申请号：EP14171293.5

申请日：2014-06-05

Applicant: FEI Company

Inventor： Martin, Aiden ,  Toth, Milos

IPC: H01J37/244 ,  H01J37/305

CPC classification number: H01J37/3053 ,  C23F4/02 ,  H01J37/3002 ,  H01J2237/0206 ,  H01J2237/2001 ,  H01J2237/24445 ,  H01J2237/2608 ,  H01J2237/31732 ,  H01J2237/31749 ,  H01L21/3065 ,  H01L21/465

Abstract: In one embodiment, electron-beam or ion-beam induced etching of a work piece at a temperature below room temperature in a precursor gas is disclosed. The beam-induced etching may use a work piece maintained at a temperature near the boiling point of a precursor material, e.g. NF 3 , but the temperature is sufficiently high to desorb reaction byproducts.
In another embodiment, NF 3 is used for generating a ionization cascade to amplify the number of secondary electrons for detection in a charged particle beam system for processing a work piece.