25.
    发明专利
    未知

    公开(公告)号:DE69402232D1

    公开(公告)日:1997-04-30

    申请号:DE69402232

    申请日:1994-01-14

    Applicant: IBM

    Abstract: Improved chemically amplified negative tone microlithographic resist compositions and methods for the use thereof are disclosed. The compositions comprise, in admixture, a crosslinking agent, a polymeric binder, and a compound that generates acid upon exposure of the resist composition to imaging radiation. The invention is particularly related to compositions having a crosslinking agent which does not plasticize the polymeric binder or alternatively does not reduce the glass transition temperature thereof. This minimizes the diffusion of the acid component from exposed regions of the resist to unexposed regions, and helps maintain relief image dimensional control.

    ROUGHENING SURFACE OF A SUBSTRATE
    29.
    发明专利

    公开(公告)号:CA1301698C

    公开(公告)日:1992-05-26

    申请号:CA496012

    申请日:1985-11-22

    Applicant: IBM

    Abstract: ROUGHENING SURFACE OF A SUBSTRATE The surface of a substrate is roughened by providing a substrate which comprises a resinous material and an inorganic particulate material; and etching a surface of the substrate to selectively etch the resinous material and thereby produce the roughened surface. The resinouse material can be thermoplastic or thermosetting, particularly those useful in preparing dielectric substrates employed in the preparation of integrated circuit modules. Inorganic particulate materials such as SiO2, CaCO3, Al2 O3, CaO2, SiC and CaF2, can be used, the preferred material being silica (SiO2). The preferred etching processes are the so-called "dry etching processes" such as plasma etching, sputter etching and reactive ion etching; which eliminate the need for wet chemical processing and all the attendant problems thereof. This roughening process results in greatly enhanced adhesion of the photosensitive materials to dielectric substrates.

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