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公开(公告)号:ITMI20042244A1
公开(公告)日:2005-02-19
申请号:ITMI20042244
申请日:2004-11-19
Applicant: ST MICROELECTRONICS SRL
Inventor: FERLA GIUSEPPE , FRISINA FERRUCCIO , MAGRI ANGELO
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公开(公告)号:DE60005541D1
公开(公告)日:2003-10-30
申请号:DE60005541
申请日:2000-12-20
Applicant: ST MICROELECTRONICS SRL
Inventor: CAMALLERI CATENO MARCO , LORENTI SIMONA , CALI DENISE , VASQUEZ PATRIZIA , FERLA GIUSEPPE
IPC: H01L21/225 , H01L21/331 , H01L29/73
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公开(公告)号:DE69429915D1
公开(公告)日:2002-03-28
申请号:DE69429915
申请日:1994-07-04
Applicant: ST MICROELECTRONICS SRL , CONS RIC MICROELETTRONICA
Inventor: FERLA GIUSEPPE , FRISINA FERRUCCIO
IPC: H01L21/265 , H01L21/336 , H01L29/06 , H01L29/10 , H01L29/739 , H01L29/78
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公开(公告)号:DE69434268T2
公开(公告)日:2006-01-12
申请号:DE69434268
申请日:1994-07-14
Applicant: ST MICROELECTRONICS SRL , CONS RIC MICROELETTRONICA
Inventor: FERLA GIUSEPPE , FRISINA FERRUCCIO
IPC: H01L29/74 , H01L21/265 , H01L21/336 , H01L29/423 , H01L29/49 , H01L29/739 , H01L29/749 , H01L29/78
Abstract: A high-speed MOS-technology power device integrated structure comprises a plurality of elementary functional units formed in a lightly doped semiconductor layer (1) of a first conductivity type, the elementary functional units comprising channel regions (6) of a second conductivity type covered by a conductive insulated gate layer (8) comprising a polysilicon layer (5); the conductive insulated gate layer (8) also comprises a highly conductive layer (9) superimposed over said polysilicon (5) layer and having a resistivity much lower than the resistivity of the polysilicon layer (5), so that a resistance introduced by the polysilicon layer (5) is shunted with a resistance introduced by said highly conductive layer (9) and the overall resistivity of the conductive insulated gate (8) layer is lowered.
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公开(公告)号:DE69533134T2
公开(公告)日:2005-07-07
申请号:DE69533134
申请日:1995-10-30
Applicant: ST MICROELECTRONICS SRL , CONS RIC MICROELETTRONICA
Inventor: MAGRI ANGELO , FRISINA FERRUCCIO , FERLA GIUSEPPE
IPC: H01L21/336 , H01L29/06 , H01L29/08 , H01L29/10 , H01L29/78 , H01L29/739
Abstract: A MOS technology power device comprises a plurality of elementary functional units which contribute for respective fractions to an overall current of the power device and which are formed in a semiconductor material layer (2) of a first conductivity type. Each elementary functional unit comprises a body region (3) of a second conductivity type formed in the semiconductor material layer (2), the body region (3) having the form of a body stripe (3) elongated in a longitudinal direction on a surface of the semiconductor material layer (2). Each body stripe (3) includes at least one source portion (60) doped with dopants of the first conductivity type which is intercalated with a body portion (40) of the body stripe (3) wherein no dopants of the first conductivity type are provided.
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公开(公告)号:ITMI20042245A1
公开(公告)日:2005-02-19
申请号:ITMI20042245
申请日:2004-11-19
Applicant: ST MICROELECTRONICS SRL
Inventor: BAZZANO GAETANO , FERLA GIUSEPPE , FRISINA FERRUCCIO , GRIMALDI ANTONIO , MAGRI ANGELO
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27.
公开(公告)号:ITMI20042243A1
公开(公告)日:2005-02-19
申请号:ITMI20042243
申请日:2004-11-19
Applicant: ST MICROELECTRONICS SRL
Inventor: ARENA GIUSEPPE , CAMALLERI MARCO , FERLA GIUSEPPE
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公开(公告)号:DE69429913T2
公开(公告)日:2002-10-31
申请号:DE69429913
申请日:1994-06-23
Applicant: ST MICROELECTRONICS SRL , CONS RIC MICROELETTRONICA
Inventor: FERLA GIUSEPPE , FRISINA FERRUCCIO
IPC: H01L29/78 , H01L21/336 , H01L29/10 , H01L29/739
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公开(公告)号:DE69518653T2
公开(公告)日:2001-04-19
申请号:DE69518653
申请日:1995-12-28
Applicant: ST MICROELECTRONICS SRL , CONS RIC MICROELETTRONICA
Inventor: GRIMALDI ANTONIO , SCHILLACI ANTONINO , FRISINA FERRUCCIO , FERLA GIUSEPPE
IPC: H01L21/336 , H01L23/482 , H01L29/06 , H01L29/10 , H01L29/417 , H01L29/423 , H01L29/78 , H01L29/739
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公开(公告)号:DE69515876T2
公开(公告)日:2000-08-17
申请号:DE69515876
申请日:1995-11-06
Applicant: ST MICROELECTRONICS SRL , CONS RIC MICROELETTRONICA
Inventor: FRISINA FERRUCCIO , FERLA GIUSEPPE , RINAUDO SALVATORE
IPC: H01L21/336 , H01L29/08 , H01L29/78
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