24.
    发明专利
    未知

    公开(公告)号:DE69434268T2

    公开(公告)日:2006-01-12

    申请号:DE69434268

    申请日:1994-07-14

    Abstract: A high-speed MOS-technology power device integrated structure comprises a plurality of elementary functional units formed in a lightly doped semiconductor layer (1) of a first conductivity type, the elementary functional units comprising channel regions (6) of a second conductivity type covered by a conductive insulated gate layer (8) comprising a polysilicon layer (5); the conductive insulated gate layer (8) also comprises a highly conductive layer (9) superimposed over said polysilicon (5) layer and having a resistivity much lower than the resistivity of the polysilicon layer (5), so that a resistance introduced by the polysilicon layer (5) is shunted with a resistance introduced by said highly conductive layer (9) and the overall resistivity of the conductive insulated gate (8) layer is lowered.

    25.
    发明专利
    未知

    公开(公告)号:DE69533134T2

    公开(公告)日:2005-07-07

    申请号:DE69533134

    申请日:1995-10-30

    Abstract: A MOS technology power device comprises a plurality of elementary functional units which contribute for respective fractions to an overall current of the power device and which are formed in a semiconductor material layer (2) of a first conductivity type. Each elementary functional unit comprises a body region (3) of a second conductivity type formed in the semiconductor material layer (2), the body region (3) having the form of a body stripe (3) elongated in a longitudinal direction on a surface of the semiconductor material layer (2). Each body stripe (3) includes at least one source portion (60) doped with dopants of the first conductivity type which is intercalated with a body portion (40) of the body stripe (3) wherein no dopants of the first conductivity type are provided.

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