公开(公告)号：US20130063029A1

公开(公告)日：2013-03-14

申请号：US13666119

申请日：2012-11-01

Applicant: Keigo KASUYA ,  Takashi OHSHIMA ,  Souichi KATAGIRI ,  Shigeru KOKUBO ,  Hideo TODOKORO

Inventor： Keigo KASUYA ,  Takashi OHSHIMA ,  Souichi KATAGIRI ,  Shigeru KOKUBO ,  Hideo TODOKORO

IPC: H01J19/70 ,  H01J19/82

CPC classification number: H01J1/304 ,  H01J37/073 ,  H01J37/265 ,  H01J2237/022 ,  H01J2237/06325 ,  H01J2237/0653 ,  H01J2237/0656

Abstract: Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1×10−2sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

Abstract translation: 提供一种带电粒子束装置，其能够发射具有高亮度和窄能量宽度的稳定电子束。 带电粒子束装置包括场发射电子源，用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在1×10 -8 Pa以下的真空排气单元。 该装置构成为使用发射的电子束中心辐射角为1×10-2sr以下的电子束，并使用其电流，其二阶微分为负 或相对于时间为零，并以每小时10％或更少的速率减少。 带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。 重复加热场致发射电子源以使电子束的电流保持在规定值以上。

公开(公告)号：US08253315B2

公开(公告)日：2012-08-28

申请号：US13332732

申请日：2011-12-21

Applicant: Artush A. Abgaryan ,  Eli Levi

Inventor： Artush A. Abgaryan ,  Eli Levi

IPC: H01J29/46

CPC classification number: H01J29/62 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J35/14 ,  H01J37/063 ,  H01J37/065 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/0656 ,  H01J2237/28

Abstract: System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a housing having a first interior portion and a second interior portion electrically insulated from the first interior portion. The second interior portion has an electric field-free space. An electrode system is disposed in the first interior portion and includes a cathode assembly and at least one anode assembly. The cathode assembly generates an electron beam that passes through each anode assembly and then into the electric field-free space in the second interior portion. A position of a crossover point on a longitudinal axis maybe regulated by varying dimensions of a substantially cylindrical portion of the anode assembly and a substantially cylindrical portion of a near-cathode electrode assembly.

Abstract translation: 将静电区域中的电子束聚焦到具有均匀分布的电流密度和非常缩小的电子层流的系统包括具有与第一内部部分电绝缘的第一内部部分和第二内部部分的壳体。 第二内部部分具有无电场的空间。 电极系统设置在第一内部部分中并且包括阴极组件和至少一个阳极组件。 阴极组件产生通过每个阳极组件然后进入第二内部部分中的无电场空间的电子束。 横轴上的交叉点的位置可以通过阳极组件的基本圆柱形部分的大小和近阴极电极组件的基本上圆柱形的部分来调节。

公开(公告)号：US06763316B2

公开(公告)日：2004-07-13

申请号：US10103583

申请日：2002-03-21

Applicant: Louis Edward Evans

Inventor： Louis Edward Evans

IPC: G01K1130

CPC classification number: H01J37/243 ,  H01J37/02 ,  H01J2237/0656 ,  H01J2237/24514 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01J2237/30433 ,  H01J2237/31701

Abstract: A method determines ion beam emittance, i.e., the beam current density based on position and angle, in a charged particle transport system. The emittance is determined from variations in the current measured in a slot Faraday or sample cup as a straight-edged mechanism traverses the beam upstream of the sample cup in a direction perpendicular to the orientation of the slot Faraday and the straight-edged mechanism, which also can be the direction in which the emittance is determined. An expression in terms of the beam current density can be determined for the derivative of the sample current with respect to position of the mechanism. Depending on the angular spread of the beam reaching the sample cup, the density can be determined directly from the derivative, or can be determined using a least squares analysis of the derivative over a range of mechanism positions.

Abstract translation: 一种方法在带电粒子传输系统中基于位置和角度确定离子束发射率，即束电流密度。 发射率是根据在法拉第槽或样品杯中测量的电流的变化来确定的，因为直边机构沿垂直于槽法拉第方向和直边机构的方向穿过样品杯上游的光束，其中 也可以是确定发光度的方向。 关于束流电流密度的表达式可以针对机构位置的样本电流的导数来确定。 取决于到达样品杯的光束的角度扩展，密度可以直接从导数确定，或者可以使用衍生物在机械位置范围内的最小二乘法分析来确定。

公开(公告)号：EP2625306A2

公开(公告)日：2013-08-14

申请号：EP11831472.3

申请日：2011-10-04

Applicant: Veeco Instruments Inc.

Inventor： KAMEYAMA, Ikuya

IPC: C23C14/46 ,  C23C14/34

CPC classification number: C23C14/46 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/0656 ,  H01J2237/083 ,  H01J2237/3142 ,  H01J2237/3151 ,  H01J2237/31701

Abstract: Non-elliptical ion beams (508) and plumes (510) of sputtered material can yield a relatively uniform wear pattern on a destination target (504) and a uniform deposition of sputtered material on a substrate assembly (506). The non-elliptical ion beams (508) and plumes (510) of sputtered material impinge on rotating destination targets (504) and substrate assemblies (506). A first example ion beam grid (302) and a second example ion beam grid (304) each have patterns of holes with an offset between corresponding holes. The quantity and direction of offset determines the quantity and direction of steering individual beamlets passing through corresponding holes in the first and second ion beam grids (302, 304). The beamlet steering as a whole creates a non-elliptical current density distribution within a cross- section of an ion beam (508) and generates a sputtered material plume (510) that deposits a uniform distribution of sputtered material onto a rotating substrate assembly (506).

公开(公告)号：EP2425443A4

公开(公告)日：2012-12-05

申请号：EP10770340

申请日：2010-04-29

Applicant: ATTI INTERNAT SERVICES COMPANY INC

Inventor： ABGARYAN ARTUSH A ,  LEVI ELI

IPC: H01J29/58

CPC classification number: H01J29/62 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J35/14 ,  H01J37/063 ,  H01J37/065 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/0656 ,  H01J2237/28

Abstract: System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a housing having a first interior portion and a second interior portion electrically insulated from the first interior portion. The second interior portion has an electric field-free space. An electrode system is disposed in the first interior portion and includes a cathode assembly and at least one anode assembly. The cathode assembly generates an electron beam that passes through each anode assembly and then into the electric field-free space in the second interior portion. The system parameters may be calculated and created due to the CGMR conceptual method.

公开(公告)号：US09460888B2

公开(公告)日：2016-10-04

申请号：US15059199

申请日：2016-03-02

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Inventor： Moon Youn Jung ,  Dong Hoon Song ,  Jin Sun Kim

IPC: H01J37/06 ,  H01J37/244

CPC classification number: H01J37/06 ,  H01J3/024 ,  H01J2237/049 ,  H01J2237/061 ,  H01J2237/06325 ,  H01J2237/06366 ,  H01J2237/0656 ,  H01J2237/2482

Abstract: Provided may include an electron beam generator, an image apparatus including the same, and an optical apparatus. The optical apparatus includes a first and second laser apparatuses providing a first and second laser beams on a substrate, and a first optical system provided between the first and second laser apparatuses and the substrate to focus the first and second laser beams. The first and second laser beams overlap with each other generating an interference beam, thereby decreasing a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point.

Abstract translation: 可以提供电子束发生器，包括该电子束发生器的图像装置和光学装置。 光学装置包括在基板上提供第一和第二激光束的第一和第二激光装置，以及设置在第一和第二激光装置与基板之间的第一和第二激光束聚焦的第一光学系统。 第一和第二激光束彼此重叠，产生干涉光束，从而将干涉光束的光点尺寸减小为小于焦点处的第一和第二激光束的每一个的波长。

公开(公告)号：US08772735B2

公开(公告)日：2014-07-08

申请号：US13666119

申请日：2012-11-01

Applicant: Keigo Kasuya ,  Takashi Ohshima ,  Souichi Katagiri ,  Shigeru Kokubo ,  Hideo Todokoro

Inventor： Keigo Kasuya ,  Takashi Ohshima ,  Souichi Katagiri ,  Shigeru Kokubo ,  Hideo Todokoro

IPC: H01J1/304

CPC classification number: H01J1/304 ,  H01J37/073 ,  H01J37/265 ,  H01J2237/022 ,  H01J2237/06325 ,  H01J2237/0653 ,  H01J2237/0656

Abstract: A charged particle beam apparatus includes a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10−8 Pa or less. The apparatus uses electron beams emitted to have an electron-beam-center radiation angle of 1×10−2 sr or less, and uses the electric current thereof, the second order differentiation of which is negative or zero with respect to time, and which reduces at a rate of 10% or less per hour. A heating unit is provided for the field emission electron source, and a detection unit is provided for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

Abstract translation: 带电粒子束装置包括场致发射电子源，用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在1×10 -8 Pa以下的真空排气单元。 该装置使用发射的电子束具有1×10 -2 sr以下的电子束中心辐射角，并使用其电流，其二阶微分相对于时间为负或为零，其中 以每小时10％或更少的速度减少。 为场发射电子源提供加热单元，为电子束的电流提供检测单元。 重复加热场致发射电子源以使电子束的电流保持在规定值以上。

公开(公告)号：US20140097352A1

公开(公告)日：2014-04-10

申请号：US13573696

申请日：2012-10-04

Applicant: Mamoru Nakasuji

Inventor： Mamoru Nakasuji

IPC: G21K5/00

CPC classification number: G21K5/00 ,  H01J3/029 ,  H01J37/06 ,  H01J37/26 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0656

Abstract: Problems to be solved: To obtain higher brightness than Langmuir limit. Adjust brightness to the optimum value.Method of resolution: To obtain such beams, the following means and methods are effective. A charged particles beam apparatus consisting of a charged particle source, a beam drawing electrode, and a beam control electrode, wherein; after the charged particles beam source a condenser lens is designed, and brightness of the charged particles beam is adjusted by adjusting a magnification factor of said condenser lens.

Abstract translation: 要解决的问题：获得比朗缪尔限制更高的亮度。 将亮度调整到最佳值。 解决方法：要获得这​​样的梁，以下手段和方法是有效的。 一种带电粒子束装置，由带电粒子源，射束电极和光束控制电极组成，其中： 在带电粒子束源设计聚光透镜之后，通过调整所述聚光透镜的放大系数来调节带电粒子束的亮度。

公开(公告)号：US08084930B2

公开(公告)日：2011-12-27

申请号：US12957576

申请日：2010-12-01

Applicant: Artush A. Abgaryan ,  Eli Levi

Inventor： Artush A. Abgaryan ,  Eli Levi

IPC: H01J29/46

CPC classification number: H01J29/62 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J35/14 ,  H01J37/063 ,  H01J37/065 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/0656 ,  H01J2237/28

Abstract: System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a housing having a first interior portion and a second interior portion electrically insulated from the first interior portion. The second interior portion has an electric field-free space. An electrode system is disposed in the first interior portion and includes a cathode assembly and at least one anode assembly. The cathode assembly generates an electron beam that passes through each anode assembly and then into the electric field-free space in the second interior portion. The system parameters may be calculated and created due to the CGMR conceptual method.

Abstract translation: 将静电区域中的电子束聚焦到具有均匀分布的电流密度和非常缩小的电子层流的系统包括具有与第一内部部分电绝缘的第一内部部分和第二内部部分的壳体。 第二内部部分具有无电场的空间。 电极系统设置在第一内部部分中并且包括阴极组件和至少一个阳极组件。 阴极组件产生通过每个阳极组件然后进入第二内部部分中的无电场空间的电子束。 由于CGMR概念方法，系统参数可能会被计算和创建。

公开(公告)号：US20110089336A1

公开(公告)日：2011-04-21

申请号：US12999075

申请日：2009-06-10

Applicant: Keigo Kasuya ,  Takashi Ohshima ,  Souichi Katagiri ,  Shigeru Kokubo ,  Hideo Todokoro

Inventor： Keigo Kasuya ,  Takashi Ohshima ,  Souichi Katagiri ,  Shigeru Kokubo ,  Hideo Todokoro

IPC: H01J27/26 ,  H01J27/00

CPC classification number: H01J1/304 ,  H01J37/073 ,  H01J37/265 ,  H01J2237/022 ,  H01J2237/06325 ,  H01J2237/0653 ,  H01J2237/0656

Abstract: Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vaccume exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1 10−2 str or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

Abstract translation: 提供一种带电粒子束装置，其能够发射具有高亮度和窄能量宽度的稳定电子束。 带电粒子束装置包括场致发射电子源，用于向场致发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在10×10 8 Pa以下的疫苗排气单元。 该装置构成为使用发射的电子束中心辐射角为1×10 -2 str以下的电子束，并使用其电流，其二阶微分为负 或相对于时间为零，并以每小时10％或更少的速率减少。 带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。 重复加热场致发射电子源以使电子束的电流保持在规定值以上。