Abstract:
A process for manufacturing a TEM-lamella includes mounting (51) a plate shaped substrate having a thickness in a support, manufacturing (53) a first strip-shaped recess on a first side of the substrate under a first angle to the support by means of a particle beam, and manufacturing (55) a second strip-shaped recess on a second side of the substrate under a second angle to the support by means of a particle beam, such that the first and the second strip-shaped recess mutually form an acute or right angle, and between them form an overlap region of lesser thickness. The lamella has a thicker rim region and a thinner central region, with a first strip-shaped recess on a first side of the lamella and a second strip-shaped recess on a second side of the lamella, wherein the first and the second strip-shaped recess mutually form an acute or right angle, and between them form an overlap region having a thickness of below 100 nm. An apparatus for executing the process or manufacturing the lamella includes a lamella support pivotable about a transverse axis and a longitudinal axis inclined to the vertical direction, a device for rotating about the longitudinal axis, and stop means for limiting a tilt of the lamella support about the transverse axis.
Abstract:
A transmission electron microscope apparatus, a sample holder and a sample stage and a method for acquiring spectral images as well are provided which can acquire spectral images at a time from a plurality of samples and measure highly accurate chemical shifts from electron energy loss spectra extracted from the spectral images. A transmission electron microscope apparatus comprises an electron gun for emitting an electron beam, a condenser lens for converging the emitted electron beam, a plurality of sample stages radiated with a converged electron beam and adapted to mount samples, a sample movement control unit for moving the sample stages, image-forming lenses for forming an image of an electron beam having transmitted through the plural samples, an electron spectrometer adapted to perform spectrometry of the electron beam in accordance with energy amounts the image-formed electron beam has and deliver spectral images obtained at convergence positions which are different in energy dispersion axis direction and in a direction orthogonal to the energy dispersion axis direction to thereby acquire spectral images from the plural samples at a time, and an image display unit for displaying acquired spectral images.
Abstract:
Protein layers (1) repeating regularly in two dimensions comprise protein protomers (2) which each comprise at least two monomers (5), (6) genetically fused together. The monomers (5), (6) are monomers of respective oligomer assemblies (3), (4) into which the monomers are assembled to assembly of the protein layer. The first oligomer assembly (3) belongs to a dihedral point group of order O, where O equals (3), (4) or (6) and has a set of O rotational symmetry axes of order (2). The second oligomer assembly (4) has a rotational symmetry axis of order (2). Due to the symmetry of the oligomer assemblies (3), (4), the rotational symmetry axes of each second oligomer assembly (4) is aligned with one of said set of O rotational symmetry axes of a first oligomer assembly (3) with (2) protomers being arranged symmetrically therearound. Thus, an 2-fold fusion between the oligomer assemblies (3), (4) is produced and the arrangements of the rotational symmetry axes of the oligomer assemblies (3), (4) cause the protein layer to repeat regularly. The protein layer has many uses, for example to support molecular entities for biosensing, x-ray crystallography or electron microscopy.
Abstract:
A sample holder (102,150,151,153-157,160-163) used in SEM (scanning electron microscopy) or TEM (transmission electron microscopy) permitting observation and inspection at higher resolution. The common feature to SEM and TEM sample holders is that a sample containing liquid and placed under atmospheric pressure can be observed or inspected after a small amount of the sample is passed through a filter or a medicine is mixed with the sample. The holder has a framelike member (102a,150a) provided with an opening (102b,150b) that is covered with a film (101,150c,231,411,495,496). The film has a first surface on which a sample (315,414) is held. The thickness D of the film and the length L of the portion of the film providing a cover over the opening in the framelike member satisfy a relationship given by L/D
Abstract translation:在SEM(扫描电子显微镜)或TEM(透射电子显微镜)中使用的样本保持器(102,150,151,153-157,160-163)允许观察和检查以更高的分辨率。 以SEM和TEM样品支架的共同特征是一个样品做了含液体并且在大气压下放置在样品的一个小的量通过过滤器或药物与样品混合之后可以进行观察或检查。 该保持器具有板状部件(102A,150A),其设有在开口(102B,150B)并覆盖有薄膜(101,150c,231411495496)的帧。 该薄膜具有在其上保持的样品(315.414)的第一表面。 该膜的厚度D和所述薄膜在以上状部件的框架中的开口提供覆盖的部分的长度L满足L / D <200000给定的关系。 的装置和用于观察或检查样品的方法是如此游离缺失盘。
Abstract:
A sample container assembly (100, 102) for use in a microscope including a sample enclosure, an electron permeable, fluid impermeable, membrane (110) sealing the sample enclosure from a volume outside the sample enclosure (108) and a pressure controller assembly (130) communicating between the sample enclosure and a volume outside the sample enclosure.
Abstract:
An ion implantation apparatus structure is provided that does not allow gas to accumulate in the vicinity of a wafer when implantation ions to the wafer. The ion implantation apparatus includes a rotating body (100) that rotates in a fixed direction, a vacuum chamber (302) that houses the rotating body, and an ion beam injecting portion (306) that injects an ion beam to a wafer placed on the rotating body. The rotating body comprises one or more wafer placement boards having a wafer placement face on one face, a driving portion that drives the wafer placement board, and a gas evacuation member provided protruding from one face of the wafer placement board having a gas evacuation wall face on the front in the direction of rotation, and functions such that due to rotation of the wafer placement board, the gas evacuation wall face collides with gas present on one face of the wafer placement board and the gas is evacuated upward or to the rear face of the wafer placement face.