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    LITHOGRAPHIC APPARATUS AND METHOD
    31.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开

    公开(公告)号：WO2018228820A1

    公开(公告)日：2018-12-20

    申请号：PCT/EP2018/064330

    申请日：2018-05-31

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  SMEETS, Bart ,  TOMA, Cristina, Ioana

    IPC: G03F7/20

    Abstract: A method for quantifying the effect of pupil function variations on a lithographic effect within a lithographic apparatus is disclosed. The method comprises: determining a discrete, two-dimensional sensitivity map in a pupil plane of the lithographic apparatus, wherein the lithographic effect is given by the inner product of said sensitivity map with a discrete, two-dimensional pupil function variation map of a radiation beam in the pupil plane. The pupil plane of a lithographic apparatus generally refers to the exit pupil of a projection system of the lithographic apparatus. Pupil function variations may comprise: relative phase variations within the pupil plane and/or relative intensity variations within the pupil plane.

    LITHOGRAPHIC APPARATUS AND METHOD
    32.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    光刻设备和方法

    公开(公告)号：WO2018077587A1

    公开(公告)日：2018-05-03

    申请号：PCT/EP2017/075382

    申请日：2017-10-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus

    IPC: G03F7/20 ,  G03F9/00

    CPC classification number: G03F7/70641 ,  G03F9/7026

    Abstract: A scanning exposure of a plurality of target regions on a substrate is performed such that an image of each of a plurality of markers is formed on each of the plurality of target regions. Each of the plurality of markers is of a form such that a property of the image of the marker is dependent on the contrast in a known manner. During the scanning exposure the substrate is moved in a scanning direction and at least one of: a difference between a rotation angle of the substrate and a rotation angle of a plane of best focus, about a first axis perpendicular to the scanning direction, a difference between a rotation angle of the substrate and a rotation angle of the plane of best focus about a second axis perpendicular to the first axis and perpendicular to the scanning direction, and a speed of the substrate in the scanning direction relative to the plane of best focus, is selected to be different for the scanning exposures of at least two of the plurality of target regions. Next the property of the image of each of the plurality of markers is determined.

    Abstract translation: 执行对衬底上的多个目标区域的扫描曝光，使得多个标记中的每一个的图像形成在多个目标区域中的每一个上。 多个标记中的每一个都具有使得标记的图像的特性以已知方式依赖于对比度的形式。 在扫描曝光期间，基板在扫描方向上移动，以及以下至少一个：基板的旋转角度与最佳焦点平面的旋转角度之间的差，围绕垂直于扫描方向的第一轴，差值 在所述基板的旋转角度与围绕垂直于所述第一轴线且垂直于所述扫描方向的第二轴线的最佳焦点平面的旋转角度之间，以及所述基板在所述扫描方向上相对于最佳焦点平面的速度 被选择为对于多个目标区域中的至少两个的扫描曝光不同。 接下来确定多个标记中的每一个的图像的属性。

    LITHOGRAPHIC METHOD AND APPARATUS
    34.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开
    光刻方法和装置

    公开(公告)号：WO2016169890A1

    公开(公告)日：2016-10-27

    申请号：PCT/EP2016/058544

    申请日：2016-04-18

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  DE BUCK, Pieter, Bart, Aloïs ,  VANROOSE, Nico ,  IMPONENTE, Giovanni ,  STAS, Roland, Johannes, Wilhelmus ,  KAUR, Chanpreet ,  DOWNES, James, Robert

    IPC: G03F7/20 ,  G01M11/02

    CPC classification number: G03F7/706 ,  G01M11/0242 ,  G01M11/0257 ,  G03F7/70866

    Abstract: A method comprising illuminating a patterning device (ΜΑ') comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.

    Abstract translation: 一种方法，包括照亮包括多个图案化区域（15a-15c）的图案形成装置（15a-15c），图案形成区域（15a-15c）中的每一个图案化测量光束（17a-17c），用投影系统（PL）将测量光束投射到 传感器装置（21），包括多个检测器区域（25a-25c），当图案形成装置和传感器装置位于第一相对构造中时，进行辐射的第一测量，移动图案形成装置和传感器中的至少一个 设备，以便将图案形成装置的相对配置改变为第二相对配置，当图案形成装置和传感器装置位于第二相对配置中时，对辐射进行第二测量，其中多个检测器区域 接收不同的测量光束到在第一相对配置中在相应检测器区域接收的测量光束并确定 由投影系统引起的像差。

    LITHOGRAPHIC METHOD AND APPARATUS
    35.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开
    光刻方法和装置

    公开(公告)号：WO2016008656A1

    公开(公告)日：2016-01-21

    申请号：PCT/EP2015/063088

    申请日：2015-06-11

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  DE BOEIJ, Wilhelmus, Petrus

    IPC: G03F9/00 ,  G03F1/42 ,  G03F7/20

    CPC classification number: G03F7/70516 ,  G03F1/42 ,  G03F7/70191 ,  G03F7/70775 ,  G03F9/7019 ,  G03F9/7049 ,  G03F9/7088

    Abstract: A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.

    Abstract translation: 一种测量方法，包括使用多个辐射极来照射光刻设备的投影系统的掩模面上的掩模上的衍射光栅，通过投影系统将每个照明杆的至少两个不同的衍射衍射级耦合到投影系统， 将衍射级投影到晶片上的光栅上，使得通过衍射级的衍射形成一对组合衍射级，将组合衍射级通过投影系统耦合到被配置为测量组合衍射级的强度的检测器， 并且使用测量的组合衍射级的强度来测量晶片光栅的位置。

    A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS
    36.
    发明申请
    A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS 审中-公开
    一种平面设备和一种制造光刻设备的方法

    公开(公告)号：WO2016000903A1

    公开(公告)日：2016-01-07

    申请号：PCT/EP2015/062525

    申请日：2015-06-04

    Applicant: ASML NETHERLANDS B.V.

    Inventor： PIETERSE, Gerben ,  POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70341

    Abstract: An immersion lithographic apparatus comprising: a projection system for projecting a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table, the final lens element having an exposed bottom surface; a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface formed of at least one of the substrate and substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly with respect to an optical axis of the projection system at least to an edge of the exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

    Abstract translation: 一种浸没式光刻设备，包括：投影系统，用于将图案化的辐射束通过投影系统的最终透镜元件的光学活性部分朝向由衬底台支撑的衬底投射，最终透镜元件具有暴露的底表面; 液体限制结构，被配置为将浸没液体供应并限制在投影系统的最终透镜元件与由至少一个基板和基板台形成的表面之间的浸没空间中; 以及在所述投影系统和所述液体限制结构之间的通道形成器以及所述通道形成器和所述最终透镜元件的光学活性部分之间的通道，所述通道经由具有所述浸没空间的开口与所述浸没空间液体连通并且径向延伸 至少相对于最终透镜元件的暴露的底部表面的边缘而相对于投影系统的光轴向外侧并且被构造和构造使得在使用中通过毛细管作用从浸没空间填充液体。

    IMPROVED BROADBAND RADIATION GENERATION IN PHOTONIC CRYSTAL OR HIGHLY NON-LINEAR FIBRES
    39.
    发明公开
    IMPROVED BROADBAND RADIATION GENERATION IN PHOTONIC CRYSTAL OR HIGHLY NON-LINEAR FIBRES 审中-公开

    公开(公告)号：EP4141531A1

    公开(公告)日：2023-03-01

    申请号：EP22189180.7

    申请日：2022-08-08

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： AJGAONKAR, Mahesh, Upendra ,  ABDOLVAND, Amir ,  PONGERS, Willem, Richard ,  BASELMANS, Johannes, Jacobus, Matheus ,  NI, Yongfeng

    IPC: G02F1/365

    Abstract: Radiation source assembly and method for generating broadband radiation by spectral broadening. The radiation source assembly comprises a pump assembly configured to provide broadband input radiation. The pump assembly comprises a pump source configured to provide first radiation at a pump wavelength, and a broadband assembly configured to provide second radiation comprising a continuous wavelength range, wherein the first radiation and the second radiation form the broadband input radiation. The radiation source assembly further comprises an optical fibre configured to receive the broadband input radiation. The optical fibre comprises a core configured along at least a part of the length of the fibre to guide the received broadband input radiation during propagation through the fibre, so as to generate broadband radiation by spectral broadening to be output by the fibre.

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