公开(公告)号：DE60034645D1

公开(公告)日：2007-06-14

申请号：DE60034645

申请日：2000-11-15

Applicant: CANON KK

Inventor： TANABE MASAYUKI ,  FUKUDA YASUAKI ,  TSUKAMOTO MASAMI

IPC: G03F7/20 ,  H01L21/027

Abstract: Disclosed is an exposure apparatus which includes an optical element (1), a gas supplying unit (4) for supplying a predetermined gas around the optical element (1), and an organic compound decomposition mechanism (7,8) for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element (1) without a necessity of using many filters in combination.

公开(公告)号：DE3752314D1

公开(公告)日：2000-06-08

申请号：DE3752314

申请日：1987-07-08

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  MINAMI SETSUO ,  OGURA SHIGETARO ,  FUKUDA YASUAKI ,  WATANABE YUTAKA ,  KAWAI YASUO ,  KARIYA TAKAO

IPC: G02B17/06 ,  G03F7/20 ,  G02B5/08 ,  G21K1/06

Abstract: An X-ray exposure apparatus includes a stage (1) for holding a reflection type mask (MS) having a multilayered reflection pattern for circuit manufacturing, a stage (50) for holding a wafer (WF) to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing a plurality of curved reflecting mirrors (M1, M2, M3) coated with multilayer films, for receiving X-rays from a mask (MS) and directing them to a wafer (WF) to expose the wafer to the pattern of the mask with the X-rays in a reduced scale.

公开(公告)号：DE69322345T2

公开(公告)日：1999-05-20

申请号：DE69322345

申请日：1993-09-13

Applicant: CANON KK

Inventor： AMEMIYA MITSUAKI ,  FUKUDA YASUAKI ,  WATANABE YUTAKA ,  MIYAKE AKIRA

IPC: B29C35/08 ,  G03F7/20

Abstract: An exposure method using X-rays from synchrotron radiation source including determining a relationship between an X-ray intensity distribution and exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter (7) for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.

公开(公告)号：DE69322345D1

公开(公告)日：1999-01-14

申请号：DE69322345

申请日：1993-09-13

Applicant: CANON KK

Inventor： AMEMIYA MITSUAKI ,  FUKUDA YASUAKI ,  WATANABE YUTAKA ,  MIYAKE AKIRA

IPC: B29C35/08 ,  G03F7/20

Abstract: An exposure method using X-rays from synchrotron radiation source including determining a relationship between an X-ray intensity distribution and exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter (7) for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.

公开(公告)号：SG43949A1

公开(公告)日：1997-11-14

申请号：SG1996006746

申请日：1988-09-20

Applicant: CANON KK

Inventor： MIYAKE AKIRA ,  KATO HIDEO ,  KUSHIBIKI NOBUO ,  FUKUDA YASUAKI

IPC: G03F1/22 ,  G03F7/20 ,  G03F1/00

Abstract: an X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10 K or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10 K and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s.

公开(公告)号：DE3855834T2

公开(公告)日：1997-10-16

申请号：DE3855834

申请日：1988-09-30

Applicant: CANON KK

Inventor： KUSHIBIKI NOBUO ,  KATO HIDEO ,  MIYAKE AKIRA ,  FUKUDA YASUAKI

IPC: G03F1/22 ,  G03F7/20 ,  G03F1/00

Abstract: an X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10 K or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10 K and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s.

公开(公告)号：DE68926373T2

公开(公告)日：1996-09-26

申请号：DE68926373

申请日：1989-09-29

Applicant: CANON KK

Inventor： MIYACHI TAKESHI ,  FUKUDA YASUAKI ,  CHIBA KEIKO

IPC: G03F1/22 ,  G03F1/14

Abstract: A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame comprises the step of patterning the X-ray absorber, including a drawing step that utlizes charged particles, and the step of thereafter providing the frame with a magnetic member. The frame and the support film are each comprised of a non-magnetic material.

公开(公告)号：DE69115156T2

公开(公告)日：1996-05-15

申请号：DE69115156

申请日：1991-07-31

Applicant: CANON KK

Inventor： WATANABE YUTAKA WATANABE YUTAK ,  UZAWA SHUNICHI ,  FUKUDA YASUAKI ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  AMEMIYA MITSUAKI

IPC: G21K5/00 ,  G21K5/04 ,  H01J35/18 ,  H01J47/00 ,  H01J5/18 ,  G21K1/00

Abstract: An X-ray transmitting window for use in X-ray lithography, for allowing transmission therethrough of X-rays from a vacuum ambience to a different ambience, is disclosed. The window includes an X-ray transmitting film; and a gasket material gas-tightly provided on at least one of opposite surfaces in a peripheral portion of the X-ray transmitting film, the gasket material having a Brinell hardness smaller than that of the X-ray transmitting film. The formed X-ray transmitting window is able to be sandwiched and fastened between a pair of flanges gas-tightly.

公开(公告)号：DE69026056D1

公开(公告)日：1996-04-25

申请号：DE69026056

申请日：1990-12-24

Applicant: CANON KK

Inventor： IIZUKA TAKASHI ,  WATANABE YUTAKA ,  FUKUDA YASUAKI

IPC: G02B5/08 ,  G02B5/28 ,  G02B26/10 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027

公开(公告)号：DE69016147T2

公开(公告)日：1995-05-24

申请号：DE69016147

申请日：1990-10-03

Applicant: CANON KK

Inventor： IIZUKA TAKASHI ,  FUKUDA YASUAKI ,  HAYASHIDA MASAMI ,  NIIBE MASAHITO

IPC: B08B7/00 ,  C23F4/00 ,  G02B27/00 ,  G03F7/20 ,  H05H13/04 ,  G02B23/00

Abstract: A method and apparatus for removing unclear matter on an optical element (7) used with a radiation beam, is disclosed. A filter (4) is used to introduce light of a desired wavelength into a chamber (6) in which the optical element is accommodated; and a gas (5) supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element (7); and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.